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Patent Searching and Data


Matches 851 - 900 out of 66,312

Document Document Title
WO/2018/052575A1
Transmission electron microscopes (TEMs) are being utilized more often in failure analysis labs as processing nodes decrease and alternative device structures, such as three dimensional, multi-gate transistors, e.g., FinFETs (Fin Field E...  
WO/2018/050758A1
The invention is directed to a plasma post-discharge deposition device (100) for depositing crystalline metal oxide derivative on a substrate (112), said device comprising a gas source (116) with a substrate inlet (102), a post-discharge...  
WO/2018/053487A1
Systems and methods for in situ hard mask removal are described. In an embodiment, a method includes receiving a semiconductor workpiece (400) comprising a substrate, an intermediary layer (402), a hard mask layer (404), and a photoresis...  
WO/2018/052614A1
A workpiece processing apparatus allowing independent control of the voltage applied to the shield ring and the workpiece is disclosed. The workpiece processing apparatus includes a platen. The platen includes a dielectric material on wh...  
WO/2018/050562A1
The invention is directed to a post-discharge plasma coating device (2) for a wired substrate (4) comprising an inner tubular electrode (6) on an inner tubular wall (3) for receiving the substrate (4) and a precursor (8) moving axially i...  
WO/2018/051595A1
Provided is an imaging device that is capable of mitigating or preventing positional shifting and changes in the orientation of an imaging unit even when a chamber is deformed due to depressurization inside the chamber. Specifically, thi...  
WO/2018/046079A1
The present invention refers to a device for generating charged particle beams with tunable orbital angular momentum. The device firstly includes one or more components for providing a charged particle beam. It is further characterized b...  
WO/2018/048889A1
A system and method for controlling an ion implantation system as a function of sampling ion beam current and uniformity thereof. The ion implantation system includes optical elements configured to selectively steer and/or shape the ion ...  
WO/2018/048376A1
An axial electron gun comprises a primary cathode (13) and a secondary cathode (20), and is characterized in that in order to maintain the stable position of the secondary cathode (20) relative to the electron-beam axis of the axial gun,...  
WO/2018/048566A1
A workpiece processing apparatus allowing independent control of the extraction angles of charged ions and reactive neutrals is disclosed. The apparatus includes an extraction plate having an extraction aperture through which charged ion...  
WO/2018/046293A1
A device for examining a non-gaseous sample interacting with gases in an electron- and/or ion-optical system is provided, wherein the sample is arranged in a sample chamber and the sample chamber furthermore has a diaphragm having a hole...  
WO/2018/047228A1
In order to provide an electron source having high luminance and a large current, provided is an electron source including a wire-shaped member (201) that has, on the leading end thereof, an electron emission surface having a convex curv...  
WO/2018/048949A1
A multi-beam scanning electron microscopy (SEM) system is disclosed. The system includes an electron beam source configured to generate a source electron beam. The system includes a set of electron-optical elements configured to generate...  
WO/2018/041744A2
Systems and methods are provided for dynamically compensating position errors of a sample. The system can comprise one or more sensing units configured to generate a signal based on a position of a sample and a controller. The controller...  
WO/2018/042531A1
Disclosed is a measuring device that measures a sample by irradiating the sample with a charged particle beam, said measuring device being provided with a particle source, an electron lens, a detector, a stage, a sensor that measures env...  
WO/2018/042897A1
The present invention relates to a charged particle beam device wherein a table deformation arising from the movement of a rolling element from a guide can be suppressed via a simple constitution. Provided in the sample stage containing ...  
WO/2018/040588A1
Disclosed are a magnetron element and a magnetron sputtering apparatus. The magnetron element comprises a closed magnetron (1) and a non-closed magnetron (2). A closed plasma path (13) is formed between an inner magnetic pole (11) and an...  
WO/2018/042505A1
The purpose of the present invention is to provide an electromagnetic deflector that reduces third order and fifth order aberration at a high level, and a charged particle ray device. In order to achieve the aforesaid purpose, there are ...  
WO/2018/040791A1
Provided are a surface-tunneling micro electron source and an array and a realization method thereof. The surface-tunneling micro electron source is a multi-region planar structure comprising an insulation substrate (1). One surface of t...  
WO/2018/037444A1
Provided is an electron microscope which irradiates a sample with an electron beam to perform observation, the electron microscope comprising: an edge element that is disposed in a diffraction plane, or a plane equivalent thereto, at whi...  
WO/2018/037474A1
In order to enable, in a charged particle beam device using a multipole-type aberration corrector, high-speed aberration corrector adjustment in an operation for adjusting the aberration corrector, this charged particle beam device is pr...  
WO/2018/038398A1
A pulse power compensation device is disclosed. The present invention can supply a pulse power with a constant voltage without charge droop to a load by additionally installing a pulse power compensation device of a simple circuit struct...  
WO/2018/038578A1
Disclosed is a method for the pretreatment and printing of a flexible substrate. The method comprises the steps of: fixing a first pattern mask for the printing of at least one of an electrode and a circuit on the flexible substrate; per...  
WO/2018/039578A1
Embodiments disclosed herein generally relate to a pumping system for a plasma processing apparatus. The pumping system includes a first pump path, a second pump path, a first valve, and a second valve. The first pump path couples an ope...  
WO/2018/039055A1
Vacuum chambers having inflatable slit valve opening seals are described herein. In one example, a vacuum chamber includes a chamber body, a first inflatable seal, and a first slit valve door. The chamber body has a top, a bottom, and si...  
WO/2018/039315A1
Embodiments of the present disclosure relate to a plasma screen used in a plasma processing chamber with improved flow conductance and uniformity. One embodiment provides a plasma screen. The plasma screen includes a circular plate havin...  
WO/2018/034690A1
Embodiments include a modular microwave source. In an embodiment, the modular microwave source comprises a voltage control circuit, a voltage controlled oscillator, where an output voltage from the voltage control circuit drives oscillat...  
WO/2018/034771A1
Embodiments presented herein relate to a pulse control system for a substrate processing system. The pulse control system includes a power source, a system controller, and a pulse shape controller. The pulse shape controller is coupled t...  
WO/2018/034715A1
Separation grids for plasma processing apparatus are provided. In some embodiments, a plasma processing apparatus includes a plasma chamber. The plasma processing apparatus includes a processing chamber. The processing chamber can be sep...  
WO/2018/032684A1
Provided are a chuck, a reaction chamber and a semiconductor processing equipment. The chuck comprises an insulating layer (5) and a substrate (7). The insulating layer (5) comprises a first bearing surface (51) for bearing a central are...  
WO/2018/034811A1
A deposited amorphous carbon film includes at least 95% carbon. A percentage of sp3 carbon-carbon bonds present in the amorphous carbon film exceeds 30%, and a hydrogen content of the amorphous carbon film is less than 5%. A process of d...  
WO/2018/034934A1
Process chambers having a tunable showerhead and a tunable liner are disclosed herein. In some embodiments, a processing chamber includes a showerhead; a chamber liner; a first impedance circuit coupled to the showerhead to tune an imped...  
WO/2018/031934A1
A method and means to produce a force for propulsion comprises a source of free electrons and a means to produce pseudoelectrons; whereas, a gravitating body such as the Earth provides a repulsive fifth force on the pseudoelectrons. Pseu...  
WO/2018/029018A1
Electron emitters and methods of fabricating the electron emitters are disclosed. According to certain embodiments, an electron emitter includes a tip with a planar region having a diameter in a range of approximately (0.05-10) micromete...  
WO/2018/031997A1
The present disclosure provides systems and methods for characterizing the interaction of free radicals with various materials and the use of known interactions to isolate free radical generation from free radical interaction with a targ...  
WO/2018/028872A1
A system (1) for gas phase deposition comprises a gas injector (30) configured to process gases to a substrate (10) for gas phase deposition onto the substrate (10). The gas injector (30) comprises a first flow path (31) and a second flo...  
WO/2018/028873A1
A system (100) and a corresponding method for simultaneous rotation and levitation of a substrate (130) during deposition and/or etching of the substrate are disclosed. The system (100) comprises a carrier (110) located below the substra...  
WO/2018/029778A1
To provide a charged particle beam device that can improve machining position precision in section processing using a shielding plate, the present invention is a charged particle beam device which has: an ion source (101); a sample stand...  
WO/2018/031200A1
A process kit ring for use in a plasma processing system is disclosed herein. The process kit ring includes an annular body and one or more hollow inner cavities. The annular body is formed from a plasma resistant material. The annular b...  
WO/2018/032004A1
This disclosure provides systems, methods and apparatus systems and methods described herein provide, among other things, a system for additive manufacturing of metal objects. The system includes two electron beams. In one optional imple...  
WO/2018/031174A2
Disclosed here is a scanning probe microscope system and method for operating the same for producing scanning probe microscope images at fast scan rates and reducing oscillation artifacts. In some embodiments, an inverse consistent image...  
WO/2018/026543A1
An electrode for manipulating an ion beam. The electrode may include an insert having an ion beam aperture to conduct the ion beam therethrough, the insert comprising a first electrically conductive material; a frame disposed around the ...  
WO/2018/026509A1
Implementations described herein generally relate to methods and apparatus for in-situ removal of unwanted deposition buildup from one or more interior surfaces of a semiconductor substrate-processing chamber. In one implementation, the ...  
WO/2018/026129A1
A water cooling type surface-wave plasma generation apparatus is disclosed. The water cooling type surface-wave plasma generation apparatus comprises: a waveguide for transmitting an electromagnetic wave; a dielectric pipe having a first...  
WO/2018/025849A1
This charged particle beam device comprises an electron source (11) emitting a primary electron beam (12), an upper objective lens (18) and a lower objective lens (26) focusing the primary electron beam (12) emitted from the electron sou...  
WO/2018/026598A1
Systems, methods, and apparatus are disclosed for reducing crazing in thin film stacks deposited on large area substrates such as glass, for instance architectural glass. Crazing can occur once a conductor-insulator-conductor series of f...  
WO/2018/025239A1
An electron beam 3D printing machine (1), comprising a chamber (2) for generating and accelerating an electron beam and an operating chamber (3) in which a metal powder is melted, with the consequent production of a three-dimensional pro...  
WO/2018/026025A1
The present invention relates to a plasma treatment device. The plasma treatment device according to an embodiment of the present invention may comprise: a cover part attached to a body; a plasma generation part for generating plasma and...  
WO/2018/026731A1
Embodiments disclosed herein generally relate to a plasma processing system for modifying the uniformity pattern of a thin film deposited in a plasma processing chamber which includes at least one VHF power generator coupled to a diffuse...  
WO/2018/026867A1
Various embodiments herein relate to methods, apparatus and systems for forming a recessed feature in dielectric material on a semiconductor substrate. Separate etching and deposition operations are employed in a cyclic manner. Each etch...  

Matches 851 - 900 out of 66,312