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Matches 901 - 950 out of 66,307

Document Document Title
WO/2018/020626A1
The purpose of the present invention is to provide a charged-particle beam apparatus capable of performing various types of signal discriminations according to the shape and the size of a sample. The present invention proposes a charged-...  
WO/2018/019482A1
The invention relates to a substrate holder (1) comprising a first contact (3) for the supply of a potential Us to the substrate (2), a charging region (12) on the surface (11) of the substrate holder (1) being designed such that it can ...  
WO/2018/019669A1
In the present invention a method is disclosed for producing synthetic material on a substrate by microwave plasma activated chemical vapor deposition. The method comprises the step of providing a microwave plasma reactor configured to p...  
WO/2018/020624A1
The purpose of the present invention is to provide a charged particle beam device for detecting, with highly precise angular discrimination, charged particles emitted from a specimen. To achieve this purpose, proposed is a charged partic...  
WO/2018/020649A1
To provide a charged particle radiation device with which a sample can be easily observed and analyzed, a charged particle radiation device has: a processing vacuum chamber (104); a processing sample stage (106) on which a sample (110) t...  
WO/2018/020625A1
The purpose of the present invention is to provide a charged particle radiation device capable of performing appropriate vibration suppression control in accordance with a device condition. To achieve the purpose, proposed is a charged p...  
WO/2018/016961A1
The invention relates to an aberration correcting device for correcting aberrations of focusing lenses in an electron microscope. The device comprises a first and a second electron mirror, each comprising an electron beam reflecting face...  
WO/2018/016286A1
Provided is an electron source capable of suppressing the exhaustion of an electron-emitting material. According to the present invention, the electron source has an electron-emitting material and an electron-emission limiting material c...  
WO/2018/016255A1
Provided is a charged particle beam device in which a support body is rigid enough to support a sample chamber while the vibration of the support body is reduced even under the action of a disturbance such as environmental noise, the deg...  
WO/2018/017267A1
A method, apparatus and system for controlling the processing of a substrate within a process chamber are described herein. In some embodiments, a method of controlling a substrate process within a process chamber includes determining a ...  
WO/2018/013681A1
Embodiments of systems and methods for RF power distribution in a multi-zone electrode array are described. A system may include a plasma source configured to generate a plasma field. Also, the system may include an RF power source coupl...  
WO/2018/011662A1
A power transfer system (100) is described for transfer of electrical power to a sputter target in a sputter device. It comprises a first part (110) comprising a contact surface (115) positionable against a first part (210) of an endbloc...  
WO/2018/011837A1
The objective of the present invention is to provide a charged particle beam device equipped with a monochromator, the charged particle beam device being capable of suppressing the attachment of a contaminant onto a slit portion thereof....  
WO/2018/011946A1
In order to provide an ion milling device in which it is possible to minimize contamination of a beam-forming electrode, this ion milling device is provided with: an ion gun (101) that includes a beam-forming electrode for forming ion be...  
WO/2018/010770A1
According to one aspect of the present disclosure, a sputter deposition source (100) with at least one electrode assembly (120) configured for two-side sputter deposition is provided. The electrode assembly (120) comprises: a cathode (12...  
WO/2017/005290A8
A carrier (100) for supporting at least one substrate during a sputter deposition process is provided. The carrier (100) includes a carrier body (102) and an insulating portion provided at the carrier body (102). The insulating portion p...  
WO/2018/009790A1
Embodiments of a gas delivery apparatus for use in a radio frequency (RF) processing apparatus are provided herein. In some embodiments, a gas delivery apparatus for use in a radio frequency (RF) processing apparatus includes: a conducti...  
WO/2018/007136A1
The invention relates to an ion microscopy device having an ion source for generating an ion beam, a detector, a voltage source and a photon pulse generator, wherein the ion microscopy device is designed to irradiate an object with the i...  
WO/2018/009937A1
An apparatus for imaging a feature within a specimen is provided. According to one implementation the apparatus includes a substrate that is configured to support a specimen on an upper surface of the substrate so that the specimen resid...  
WO/2018/007669A1
This invention consists of an electron sensor (1) and a system with a plurality of electron sensors (1) for electron microscopy using an electron microscope. More specifically, the electron microscope generates an electron beam (10) that...  
WO/2018/002047A1
The invention concerns sample holder (1). According to the invention, that the sample holder (1) comprises a sample receiving portion (5) rigidly linking a first portion (101) to a second portion (102), the first portion (101) comprising...  
WO/2018/003493A1
The objective of the present invention is to provide a charged particle beam device capable of correcting an image drift, which accompanies stage deformation or the like, during imaging immediately after moving a stage. In order to achie...  
WO/2018/004884A1
The invention provides a sputter deposition assembly (100) that includes a sputtering chamber (200), a sputtering target (90), and a magnet assembly (300). The magnet assembly includes a two-part magnetic backing plate (60) that includes...  
WO/2018/004880A1
A vaporizer with several novel features to prevent vapor condensation and the clogging of the nozzle is disclosed. The vaporizer is designed such that there is an increase in temperature along the path that the vapor travels as it flows ...  
WO/2018/004883A1
The invention provides a sputter deposition assembly that includes a sputtering chamber, a sputtering target, and a magnet assembly. The magnet assembly includes a magnetic backing plate with a blind recess into which a moveable magnetic...  
WO/2018/004973A1
Methods for forming a diamond like carbon layer with desired film density, mechanical strength and optical film properties are provided. In one embodiment, a method of forming a diamond like carbon layer includes generating an electron b...  
WO/2018/003494A1
The purpose of the present invention is to provide a vibration suppression mechanism which is easily attachable and detachable and which is attached to a charged particle beam device. As one embodiment for achieving said purpose, propose...  
WO/2018/003109A1
In ion-milling apparatuses of the prior art, it has not been necessary to consider variations in the radiation position of an ion beam caused by variations in an acceleration voltage, since it has been sufficient to adjust the accelerati...  
WO/2018/005376A1
Implementations described herein generally relate to a method for forming a metal layer and to a method for forming an oxide layer on the metal layer, in one implementation, the metal layer is formed on a seed layer, and the seed layer h...  
WO/2018/003108A1
Provided is an analysis apparatus for a device having a multi-layer structure, wherein the analysis apparatus is provided with a high-speed upper layer removal function that does not damage an element itself. The apparatus is provided wi...  
WO/2018/005122A1
Semiconductor systems and methods may include methods of performing selective etches that include modifying a material on a semiconductor substrate. The substrate may have at least two exposed materials on a surface of the semiconductor ...  
WO/2017/222201A1
Proposed are a component, made of tungsten carbide bulk, for use in a plasma device, the component exhibiting excellent plasma erosion resistance, securing a uniform distribution of plasma, improving electric and thermal conductivity, an...  
WO/2017/223132A1
An ion implantation system and method is provided for forming an ion beam from aluminum iodide. A water vapor source further introduces water to react residual aluminum iodide to form hydroiodic acid, where the residual aluminum iodide a...  
WO/2017/222938A1
Embodiments of the invention generally relate to methods for removing a boron-carbon layer from a surface of a processing chamber using water vapor plasma treatment. In one embodiment, a method for cleaning a surface of a processing cham...  
WO/2017/221362A1
The objective of the invention is to provide a charged particle beam device allowing stable secondary particles (23) and electromagnetic waves (24) to be detected even with a non-conductive sample under a high-vacuum environment, and all...  
WO/2017/223130A1
An ion implantation system (101) is provided having an ion source (108) configured to form an ion beam (116) from aluminum iodide. A beamline assembly selectively transports the ion beam to an end station (106) configured to accept the i...  
WO/2017/220750A1
The invention relates to a method of and apparatus for preparing a sample for imaging or diffraction experiments under cryogenic conditions, comprising the steps of applying a sample to sample carrier, such as a film on a support, in par...  
WO/2017/223304A1
An orthopedic device (100) comprising a first body (160) having a first surface layer (106) configured to engage a second body (130), a second body (130) having a second surface layer (106) configured to engage a portion of the first sur...  
WO/2017/222974A1
Embodiments described herein generally relate to a substrate support assembly having a shield cover. In one embodiment, a substrate support assembly is disclosed herein. The substrate support assembly includes a support plate, a pluralit...  
WO/2017/216941A1
In charged particle beam apparatuses equipped with an optical image pickup device that is disposed at an angle different from that of a mirror body, when a sample is placed so as to face the optical image pickup device, there is a possib...  
WO/2017/215806A1
A vacuum treatment chamber (1) comprises a vacuum recipient (3) and therein a screen (13). Within the screen (13) there is provided a stationary substrate support (11). Within the side wall (5) of the vacuum recipient (3), there is provi...  
WO/2017/218394A1
Systems and methods for controlling a voltage waveform at a substrate during plasma processing include applying a shaped pulse bias waveform to a substrate support, the substrate support including an electrostatic chuck, a chucking pole,...  
WO/2017/215976A1
Method for projecting a beam of particles onto a substrate, said method comprising: - a step of calculating a correction of scattering effects of said beam by means of a point spread function modelling the forward scattering effects of s...  
WO/2017/216262A1
The invention relates to an apparatus (200) for the thermal treatment of substrates. In this case, a gas discharge lamp (110) runs in a so-called simmer mode in standby operation. A power supply (280) of constant power can be connected t...  
WO/2017/213078A1
Provided is a gas cluster ion beam machining method that allows a work object to be machined into an intended shape even if the work object has a rotationally asymmetric shape. The present invention is provided with: an irradiation step ...  
WO/2017/214166A1
A method of forming metal nanoparticles includes applying a substance to an area of interest, applying cold plasma to the area of interest, and synthesizing nanoparticles from the substance using the cold plasma in the area of interest, ...  
WO/2017/212236A1
There is provided welding apparatus (10) having a welding head (20) comprising an outer face attachable to a welding device (16) such as an electron beam gun or laser, an inner face sealable to a workpiece (12), and an outer sealing ring...  
WO/2017/212240A1
There is provided a welding head (80) for a welding apparatus, the head (80) comprising an outer face attachable to a welding device such as an electron beam gun or laser, an inner face sealable to a workpiece, and an outer sealing ring ...  
WO/2017/210178A1
An ion implantation system has a first chamber and a process chamber with a heated chuck. A controller' transfers the workpiece between the heated chuck and first chamber and selectively energizes the heated chuck first and second modes,...  
WO/2017/208560A1
An electron microscope for measuring electromagnetic field information, wherein the electric field distribution and the magnetic field distribution of a sample are isolated and measured in a highly accurate manner. This invention compris...  

Matches 901 - 950 out of 66,307