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Patent Searching and Data


Matches 101 - 150 out of 66,186

Document Document Title
WO/2019/189360A1
A charged particle device comprises: a vacuum formation member having a tubular path that can be connected to an exhaust device, a gas in a first space contacting the surface of an object being discharged via the tubular path, and the va...  
WO/2019/185053A1
Disclosed are a radiation generation device, an additive manufacturing device and an additive manufacturing method, the radiation generation device comprising: a cathode capable of allowing for the escape of electrons after being heated;...  
WO/2019/182097A1
A magnetic body observation method according to the present invention includes an irradiating step of irradiating one region of a specimen (S) with an excitation beam (E1) to cause a magnetic element contained in the specimen (S) to radi...  
WO/2019/182847A1
Systems and methods for multi-level pulsing of a parameter and multi-level pulsing of a frequency of a radio frequency (RF) signal are described. The parameter is pulsed from a low level to a high level while the frequency is pulsed from...  
WO/2019/180242A1
The present invention relates to a cathode assembly for emitting charged particles, used in for example an electron gun as source for generating an electron beam. The cathode assembly has a cathode comprising an emitting member and a car...  
WO/2019/182111A1
The ion gun according to the present invention is provided with: an anode; a magnetic pole that has an interior surface facing the anode, an exterior surface disposed on the side opposite to the interior surface, a slit provided at a pos...  
WO/2019/183237A1
Embodiments of the present disclosure provide methods of laser assisted modification, i.e., laser polishing, of ceramic substrates, or ceramic coated substrates, to desirably reduce the surface roughness and porosity thereof. In one embo...  
WO/2019/180903A1
The purpose of the present invention is to provide a technology that enables a detector using gas amplification to have improved response speed. The scanning electron microscope according to the present invention is provided with: an irr...  
WO/2019/181820A1
This invention relates to an electron gun that uses an electron gun cathode material (105) primarily based on LaB6 or CeB6. Methane gas or ethane gas is caused to flow into the vacuum chamber where the electron gun cathode material (105)...  
WO/2019/179327A1
Provided is a dry etching apparatus, comprising: a reaction chamber, wherein the reaction chamber is internally provided with an upper electrode and a lower electrode; the lower electrode is provided with multiple pores, and the lower el...  
WO/2019/180904A1
The objective of the present invention is to provide a technique for capturing images at a higher speed and higher magnification when acquiring continuous tilted images with an electron microscope. This electron microscope comprises: a f...  
WO/2019/182890A1
Systems and methods for multi-level pulsing of a parameter and multi-level pulsing of a frequency of a radio frequency (RF) signal are described. The RF signal is applied to a substrate support via a match. The parameter is pulsed from a...  
WO/2019/183007A1
A high-brightness electron beam source is disclosed. The electron beam source may include a broadband illumination source configured to generate broadband illumination. A tunable spectral filter may be configured to filter the broadband ...  
WO/2019/136396A3
Components and processes are disclosed herein for managing non-volatile and/or low- volatility byproduct materials that are generated within a plasma processing region of a plasma processing chamber during performance of various plasma-b...  
WO/2019/177834A1
A RF control circuit is provided and includes a controller, a divider, and a RF sensor. The controller selects a RF, which is a frequency of a reference LO signal. The divider receives a first RF signal detected in a substrate processing...  
WO/2019/176212A1
The objective of the present invention is to use brightness images acquired under different energy conditions to estimate the size of a defect in the depth direction in a simple manner. A charged-particle beam device according to the pre...  
WO/2019/177866A1
Frequency tuning for a matchless plasma source is described. To perform the frequency tuning, current is measured at an output of an amplification circuit of the matchless plasma source after a change in a frequency of operation of the m...  
WO/2019/177739A1
A method for producing a sputtered stochiometric a-Al2O3 thin film. A substrate is placed into a chamber containing an Al target to be sputtered. The chamber is evacuated to a base pressure of about 7 x 10-8 Torr or lower and the tempera...  
WO/2019/172115A1
The present invention relates to a device and a method for analyzing the energy of reflection electrons generated from a sample. This device is provided with: an electron beam source (101) for generating a primary electron beam; an elect...  
WO/2019/172433A1
A device (1) including an ionizer (50) is disclosed. The ionizer comprises bulk bodies (80) including one or more emitter materials (89) and that is configured to at least partly depletable; and a heating unit (56) that is configured to ...  
WO/2019/170421A1
The present disclosure proposes a crossover-forming deflector array of an electro-optical system for directing a plurality of electron beams onto an electron detection device. The crossover- forming deflector array includes a plurality o...  
WO/2019/135679A4
The present invention is in the field of a vacuum transfer assembly, such as for cryotransfer, and specifically a TEM vacuum transfer assembly, which can be used in microscopy, a sample holder, a vacuum housing, a sample holder stage and...  
WO/2019/169912A1
A reaction chamber component, comprising a component main body (1) and an oxide film layer (11) that is provided on a surface to be covered of the component main body (1), wherein the component main body (1) is made from a 5-series alumi...  
WO/2019/169298A1
A method of and system for substrate fabrication is disclosed herein. The method includes performing a first plasma-enhanced surface treatment in a chamber prior to disposal of a substrate, then, subsequently, depositing a season materia...  
WO/2019/167165A1
Irradiating non-convergent ion beams on a sample increases the machining accuracy of an ion milling device for machining the sample, or increases the reproduction accuracy of the machining surface shape. Therefore, this ion milling devic...  
WO/2019/166331A2
The present invention relates to charged particle beam systems and methods. More particular the present invention relates to a multi beam charged particle beam system and related methods. Even more particular, the present invention relat...  
WO/2019/169382A1
Electron beam collimators and linear accelerators include a target (180) and a collimator body (215). The collimator body (215) has a central aperture that opens at an exit to the target and has a final internal diameter at the exit that...  
WO/2019/169253A1
Plasma source assemblies, gas distribution assemblies including the plasma source assembly and methods of generating a plasma are described. The plasma source assemblies include a powered electrode with a ground electrode adjacent a firs...  
WO/2019/169102A1
The present disclosure relates to a method and apparatus for controlling a plasma sheath near a substrate edge. Changing the voltage/current distribution across the inner electrode and the outer electrode with in the substrate assembly f...  
WO/2019/169016A1
Exemplary magnetic induction plasma systems for generating plasma products are provided. The magnetic induction plasma system may include a first plasma source including a plurality of first sections and a plurality of second sections ar...  
WO/2019/168777A1
Methods and apparatus for supplying radio frequency (RF) power to a process chamber. An RF generator is configured with a capability to operate with an RF power output independent of a reference frequency or synchronize the RF output pow...  
WO/2019/164614A1
Provided herein are approaches for reducing particles in an ion implanter. An electrostatic filter may include a housing and a plurality of conductive beam optics within the housing. The conductive beam optics are arranged around an ion ...  
WO/2019/162041A1
The stress in a layer deposited on a substrate is stabilized with respect to thermal loading by performing sputter deposition of the layer, maintaining all the elements of the material of the layer throughout the thickness of the layer a...  
WO/2019/165296A1
A method of plasma-assisted semiconductor processing in multiple stations in a process chamber is provided. The method comprises: a) providing substrates at each of the multiple stations; b) distributing RF power to multiple stations to ...  
WO/2019/161899A1
According to an embodiment, a method for automated critical dimension measurement on a substrate for display manufacturing is provided. The method includes scanning a first field of view having a first size with a charged particle beam t...  
WO/2019/164121A1
Disclosed is a device for measuring plasma. The device for measuring plasma, may comprise: a reactor having a plasma generation space provided therein, an inner wall surrounding the plasma generation space having a first region and a sec...  
WO/2019/164391A1
Multi-beam charged particle column for inspecting a sample comprises a source for directing multiple primary charged particle beams towards the sample, a detector for detecting signal charged particles from the sample, and a combined mag...  
WO/2019/164615A1
Provided herein are approaches for reducing particles in an ion implanter. An electrostatic filter may include a housing and a plurality of conductive beam optics within the housing. The conductive beam optics are arranged around an ion ...  
WO/2019/164392A1
Apparatus and method for inspecting a surface of a sample. Said apparatus comprises a multi-beam charged particle column comprising a source for creating multiple primary beams (7) directed towards the sample (11), an objective lens (10)...  
WO/2019/162693A1
A rotatable stage for an analytical apparatus. The rotatable stage has a stator, a heat exchanger in thermal connection with the stator, a rotor and a bearing located between the stator and the rotor. The bearing provides a thermal conne...  
WO/2019/162203A1
A method of determining a corrected dimensional parameter value relating to a feature formed by a lithographic process, the corrected dimensional parameter value being corrected for a measurement effect on the dimensional parameter, the ...  
WO/2019/163715A1
Provided are an electron microscope, and a method for observing a measurement sample, with which observation can be performed nondestructively. An electron microscope (1) is provided with a laser light source (2) which generates a CW las...  
WO/2019/161886A1
A method for aligning a multi beam irradiation system (20) for use in an apparatus (10) for producing a three-dimensional work piece by irradiating layers of a raw material powder with electromagnetic or particle radiation comprises the ...  
WO/2019/158448A1
The invention provides an electron beam apparatus, comprising: an e-beam source configured to generate an electron beam; a first part configured to support a substrate, the first part comprising an object table for supporting the substra...  
WO/2019/160273A1
According to one embodiment, a magnet assembly of a magnetron sputtering device can comprise: a yoke; an electromagnet arranged on the yoke and having magnetic poles differing from each other with respect to a direction orthogonal to the...  
WO/2019/161109A1
A device and method of spreading plasma which allows for plasma etching over a larger range of process chamber pressures. A plasma source, such as a linear inductive plasma source, may be choked to alter back pressure within the plasma s...  
WO/2019/160674A1
Embodiments described herein provide methods of forming amorphous or nano-crystalline ceramic films. The methods include depositing a ceramic layer on a substrate using a physical vapor deposition (PVD) process, discontinuing the PVD pro...  
WO/2019/158225A1
In a magnetron sputtering reaction space (I) a magnetron magnetic field (Bm) is generated. A further magnetic field (Ba) is generated in the reaction space (I) whereby a resultant magnetic field (Br) has a directional component parallel ...  
WO/2019/160329A1
A point etching module using an annular surface-discharge plasma apparatus is disclosed. The point etching module using an annular surface-discharge plasma apparatus comprises: a plate-shaped dielectric; a circular electrode disposed on ...  
WO/2019/160782A1
The system includes a photocathode electron source, diffractive optical element, and a microlens array to focus the beamlets. A source directs a radiation beam to the diffractive optical element, which produces a beamlet array to be used...  

Matches 101 - 150 out of 66,186