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WO/2024/026051A1 |
Embodiments of the present disclosure generally relate to methods, systems, and apparatus for forming layers having single crystalline structures. In one implementation, a method of processing substrates includes positioning a substrate ...
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WO/2024/024108A1 |
In the present invention, a charged particle beam device includes: a movement mechanism that holds and moves a sample; a particle source that outputs a charged particle beam; a detector that detects a signal that is generated by irradiat...
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WO/2024/025413A1 |
The invention relates to a method and a dual beam FIB/(S)TEM apparatus for in-situ sample quality inspection in cryogenic focused ion beam milling. The method comprises the steps of: loading the sample into a sample holder of the 5 dual ...
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WO/2024/021269A1 |
The present invention relates to the technical field of electron microscope equipment, and specifically disclosed are a cryo-stage for a cryo-electron microscope and a control system therefor. The cryo-stage comprises a cryo-electron mic...
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WO/2024/025629A1 |
A method of cleaning a plasma chamber is disclosed. Periodically, a cleaning process is performed. The cleaning process comprises introducing a mixture of fluoride molecules and argon into the plasma chamber and creating a plasma. The fl...
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WO/2024/024061A1 |
The present invention improves the milling speed and lengthen the maintenance cycle of an ion milling device. This ion generating unit of an ion gun comprises: a disk-shaped first cathode 11 and a disk-shaped second cathode 12 provided w...
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WO/2024/023244A1 |
A control device (1) for a plasma production system (100) is used to actuate an impedance-matching circuit (50) comprising an input terminal (50a) and an output terminal (50b). The impedance-matching circuit (50) is connected between a H...
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WO/2024/025168A1 |
In one embodiment of the present invention, provided are an RF-biased reactive ion etching apparatus for addressing the issue of affecting an etch profile that occurs during ion beam etching or reactive ion beam etching by forming a high...
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WO/2024/025241A1 |
In a thin-film ultra-high frequency diagnostic device for plasma diagnosis and a plasma diagnostic module comprising same, the ultra-high frequency diagnostic device comprises at least one antenna located in a space where plasma is gener...
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WO/2024/026142A1 |
An ion implantation system, ion source, and method are provided for forming an aluminum ion beam from an aluminum-containing species to an ion source. One or more of a halide species and a halide molecule are introduced to the ion source...
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WO/2024/017765A1 |
This discloses apparatus and methods for obtaining topographical information about a sample surface. In one arrangement, a sensing system comprises a group of proximal sensors for measuring positions of respective portions of a sample su...
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WO/2024/019219A1 |
Disclosed are a monitoring device capable of measuring characteristics of an edge region and a method for manufacturing same. The monitoring device comprises: a lower cover; a guide unit arranged on the lower cover; a circuit module havi...
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WO/2024/017631A1 |
The present invention relates to a coating plant for coating substrates by cathode sputtering, and to a method for replacing a target in such a coating plant.
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WO/2024/020521A1 |
The present disclosure relates to a plasma apparatus and a method. The plasma apparatus comprises an inner electrode and an outer electrode. The inner electrode comprises a wall defining a first cavity, and an opening of the first cavity...
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WO/2024/017737A1 |
An assessment method comprising: using an assessment apparatus to generate assessment signals representing a property of a surface of a sample; processing the assessment signals to identify candidate defects and outputting a candidate de...
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WO/2024/017766A1 |
A charged particle detector comprising: an array of sensing elements configured to generate an electrical signal in response to charged particles and arranged in rows; an array of optical modulators each connected to a respective one of ...
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WO/2024/017717A1 |
A system and method for enhanced edge detection in charged particle beam systems such as scanning electron microscopes. The method uses spatial information of the incidence locations of charged particle arrival events on a detector surfa...
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WO/2024/018568A1 |
The purpose of the present invention is to provide a charged particle beam device that: has an electrode short-circuit mechanism with which a change in lens action that occurs between accelerating electrodes during a change in an acceler...
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WO/2024/020024A1 |
A plasma processing system includes a processing chamber including a substrate support. A plasma generator is configured to selectively generate plasma in the processing chamber to treat a substrate arranged on the substrate support. An ...
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WO/2024/017553A1 |
A method for manufacturing an edge emitting semiconductor laser diode comprising the following steps is provided: - providing an edge emitting semiconductor body (2) configured for generating electromagnetic laser radiation during operat...
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WO/2024/018570A1 |
The purpose of the present disclosure is to stabilize the probe current of a charged particle source over long periods of time. In a charged particle source according to the present disclosure, an emitter tip has a first flat surface per...
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WO/2024/018544A1 |
The present disclosure provides a charged particle beam system that comprises: a specimen replacement chamber in which an existing specimen stage is utilized as is, and which, in order to improve specimen conveyance efficiency, is used t...
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WO/2024/020152A1 |
Various embodiments herein relate to methods and apparatus for etching a substrate. The substrate is typically a semiconductor substrate. In various implementations, the method involves receiving the substrate in a process chamber, the s...
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WO/2024/018042A1 |
The invention relates to a method for igniting and/or maintaining a plasma with a pulsed high-frequency signal, said method comprising the method steps of: i. generating a pulsed high-frequency signal, ii. changing the frequency of the h...
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WO/2024/019381A1 |
The present invention relates to a layer formation method and, more specifically, to a semiconductor device manufacturing method for forming a semiconductor device through a low-temperature process. The layer formation method according t...
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WO/2024/020294A1 |
A repeller assembly mounts in an arc chamber of an ion implanter. The repeller assembly includes a repeller, a tubular insert, first and second insulators, a contact member, and a lock member. The repeller has a knob-shaped body placed o...
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WO/2024/020295A1 |
A cathode holding assembly to be mounted on an arc chamber support of an ion implanter includes a cathode holding plate (3), an insulator block (4), and a shield cap (5). The cathode holding plate (3) has a protruding outer rib (3d) towa...
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WO/2024/019901A1 |
A bias electrode and a mid-level electrode are disposed within a substrate support. A lower portion of the substrate support exists between the bias electrode and the mid-level electrode. An upper portion of the substrate support exists ...
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WO/2024/015784A1 |
The present invention relates to corona charge deposition systems that use High Voltage (HV) amplifiers for precisely controlling corona charge deposition. Some implementations, provide a corona charge deposition system that uses multipl...
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WO/2024/013039A1 |
The present disclosure relates to apparatus and methods for assessing samples (208) using charged particles. In one arrangement, a degassing action is performed by exposing a target area of a sample (208) with charged particles to stimul...
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WO/2024/015694A1 |
Methods and systems for detecting plasma are provided. In some embodiments, a method for detecting plasma comprises: obtaining data from one or more sensors, wherein the data characterizes a radio frequency (RF) power provided to one or ...
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WO/2024/015158A1 |
A system includes a chamber configured to produce and contain a plasma. The system includes a transmission line positioned in the chamber. The transmission line includes a transmission line input and includes an output coupled to a commo...
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WO/2024/013102A1 |
A Radio Frequency, RF, generator in particular for a plasma application, comprising: a cooling element; at least a first RF power stage having a first output and a second RF power stage having a second output, both being mounted onto the...
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WO/2024/013041A1 |
A charged particle-optical assembly configured to direct a plurality of beams of charged particles in a beam grid towards a sample location, the charged particle-optical assembly comprising: a planar charged particle-optical element conf...
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WO/2024/013040A1 |
A charged particle-optical assembly manipulates one or more charged particle beams. The assembly comprises: an upbeam element a downbeam element and an isolating spacer. The upbeam and down beam elements each comprie a plate having one o...
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WO/2024/012193A1 |
A gas spray head and a manufacturing method therefor, and a plasma processing device. A gas spray head (4) disposed at the top of a vacuum reaction chamber (1) of a plasma processing device comprises a spray head base (401) and a nozzle ...
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WO/2024/013042A1 |
A charged particle-optical apparatus for assessing a sample at an assessment location, the charged particle-optical apparatus comprising: an assessment charged particle-optical device configured to project an assessment charged particle ...
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WO/2024/015187A1 |
Methods and apparatus for processing substrates are provided herein. In some embodiments, a process kit for a substrate support includes: an upper edge ring made of quartz and having an upper surface and a lower surface, wherein the uppe...
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WO/2024/015273A1 |
A voltage control system is disclosed and includes: an edge ring configured to be disposed on a substrate support and surround an outer periphery of a substrate; a tunable edge sheath (TES) ring; a generator; and a controller. The TES ri...
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WO/2024/015265A1 |
A plasma system includes a plasma apparatus including: a plasma chamber; a pedestal configured to hold a substrate in the chamber; and a radio frequency (RF) electrode configured to excite plasma in the chamber; an electromagnetic (EM) c...
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WO/2024/015304A1 |
A radiofrequency (RF) power amplifier for a plasma processing system includes a switching transistor having a drain terminal, a source terminal, and a gate. The source terminal is connected to a reference ground potential. The RF power a...
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WO/2024/015184A1 |
A miniature electron optical column apparatus is disclosed. The apparatus may include a set of electron-optical elements configured to direct a primary electron beam to a sample. The set of electron-optical elements may include an object...
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WO/2024/015258A1 |
A system includes a chamber comprising first and second regions. The chamber is configured to produce and contain a plasma in the second region. The system includes a transmission line positioned in the first region. The transmission lin...
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WO/2024/013145A1 |
Systems and methods of measuring of optimizing collection efficiency of secondary charged particles include a multi-beam inspection apparatus (104) configured to scan (226) a sample (230) and including a lens (242), a detector (244) conf...
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WO/2024/014611A1 |
A method for manufacturing an electrode assembly for a plasma cleaner, according to an embodiment of the present invention, may comprise: a first step of preparing a body part made of a non-conductive material; a second step of forming a...
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WO/2024/007413A1 |
The present invention provides a multifunctional multi-station sample stage for an in-situ detection chip of a scanning electron microscope, comprising a sample stage support and chip carriers. A plurality of mounting slots are formed on...
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WO/2024/007738A1 |
An electron source, a manufacturing method, a chip detection device, and a chip photolithography device. The electron source comprises: a substrate layer; an insulating dielectric layer arranged on the substrate layer; an emitting electr...
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WO/2024/010222A1 |
A non-contact plasma monitoring method and a non-contact plasma monitoring device using same are disclosed. The non-contact plasma monitoring method may comprise: a first step of arranging one or more RF sensors on the outside of an indu...
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WO/2024/009912A1 |
A multibeam image acquisition device according to an embodiment of the present invention is characterized by comprising: a stage on which a sample can be placed; a base which is disposed on the stage and in which at least the surface is ...
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WO/2024/010692A1 |
A multi-plenum gas manifold is disclosed and includes a monolithic body, a first plenum and a second plenum. The first plenum is arranged within the monolithic body and configured to distribute to or divert from one or more substrate pro...
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