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Patent Searching and Data


Matches 201 - 250 out of 66,307

Document Document Title
WO/2019/168777A1
Methods and apparatus for supplying radio frequency (RF) power to a process chamber. An RF generator is configured with a capability to operate with an RF power output independent of a reference frequency or synchronize the RF output pow...  
WO/2019/164614A1
Provided herein are approaches for reducing particles in an ion implanter. An electrostatic filter may include a housing and a plurality of conductive beam optics within the housing. The conductive beam optics are arranged around an ion ...  
WO/2019/162041A1
The stress in a layer deposited on a substrate is stabilized with respect to thermal loading by performing sputter deposition of the layer, maintaining all the elements of the material of the layer throughout the thickness of the layer a...  
WO/2019/165296A1
A method of plasma-assisted semiconductor processing in multiple stations in a process chamber is provided. The method comprises: a) providing substrates at each of the multiple stations; b) distributing RF power to multiple stations to ...  
WO/2019/161899A1
According to an embodiment, a method for automated critical dimension measurement on a substrate for display manufacturing is provided. The method includes scanning a first field of view having a first size with a charged particle beam t...  
WO/2019/164121A1
Disclosed is a device for measuring plasma. The device for measuring plasma, may comprise: a reactor having a plasma generation space provided therein, an inner wall surrounding the plasma generation space having a first region and a sec...  
WO/2019/164391A1
Multi-beam charged particle column for inspecting a sample comprises a source for directing multiple primary charged particle beams towards the sample, a detector for detecting signal charged particles from the sample, and a combined mag...  
WO/2019/164615A1
Provided herein are approaches for reducing particles in an ion implanter. An electrostatic filter may include a housing and a plurality of conductive beam optics within the housing. The conductive beam optics are arranged around an ion ...  
WO/2019/164392A1
Apparatus and method for inspecting a surface of a sample. Said apparatus comprises a multi-beam charged particle column comprising a source for creating multiple primary beams (7) directed towards the sample (11), an objective lens (10)...  
WO/2019/162693A1
A rotatable stage for an analytical apparatus. The rotatable stage has a stator, a heat exchanger in thermal connection with the stator, a rotor and a bearing located between the stator and the rotor. The bearing provides a thermal conne...  
WO/2019/162203A1
A method of determining a corrected dimensional parameter value relating to a feature formed by a lithographic process, the corrected dimensional parameter value being corrected for a measurement effect on the dimensional parameter, the ...  
WO/2019/163715A1
Provided are an electron microscope, and a method for observing a measurement sample, with which observation can be performed nondestructively. An electron microscope (1) is provided with a laser light source (2) which generates a CW las...  
WO/2019/161886A1
A method for aligning a multi beam irradiation system (20) for use in an apparatus (10) for producing a three-dimensional work piece by irradiating layers of a raw material powder with electromagnetic or particle radiation comprises the ...  
WO/2019/158448A1
The invention provides an electron beam apparatus, comprising: an e-beam source configured to generate an electron beam; a first part configured to support a substrate, the first part comprising an object table for supporting the substra...  
WO/2019/160273A1
According to one embodiment, a magnet assembly of a magnetron sputtering device can comprise: a yoke; an electromagnet arranged on the yoke and having magnetic poles differing from each other with respect to a direction orthogonal to the...  
WO/2019/161109A1
A device and method of spreading plasma which allows for plasma etching over a larger range of process chamber pressures. A plasma source, such as a linear inductive plasma source, may be choked to alter back pressure within the plasma s...  
WO/2019/160674A1
Embodiments described herein provide methods of forming amorphous or nano-crystalline ceramic films. The methods include depositing a ceramic layer on a substrate using a physical vapor deposition (PVD) process, discontinuing the PVD pro...  
WO/2019/158225A1
In a magnetron sputtering reaction space (I) a magnetron magnetic field (Bm) is generated. A further magnetic field (Ba) is generated in the reaction space (I) whereby a resultant magnetic field (Br) has a directional component parallel ...  
WO/2019/160329A1
A point etching module using an annular surface-discharge plasma apparatus is disclosed. The point etching module using an annular surface-discharge plasma apparatus comprises: a plate-shaped dielectric; a circular electrode disposed on ...  
WO/2019/160782A1
The system includes a photocathode electron source, diffractive optical element, and a microlens array to focus the beamlets. A source directs a radiation beam to the diffractive optical element, which produces a beamlet array to be used...  
WO/2019/158617A1
A sample may be inspected by making particles traverse the sample. The particles that have traversed the sample hit a detector (105) one-by-one. In response thereto, the detector (105) provides a sequence of respective detection outputs,...  
WO/2019/158573A1
The invention relates to a multi-beam electron microscope having a multi-beam electron source (300), an objective lens (102), a detector arrangement (200) and a multiple-aperture plate (11) which has a plurality of openings and is arrang...  
WO/2019/161297A1
Apparatus and methods for selectively transmitting objects of interest from a first reservoir to a second reservoir are disclosed. The apparatus includes electromagnetic focusing apparatus configured to interact with objects of interest ...  
WO/2019/160818A1
Load lock assemblies for a sample analysis system, such as a mass spectrometry system, include a load lock chamber having longitudinally opposing first and second end portions and a through channel, a door coupled to the second end porti...  
WO/2019/156964A1
A sample support structure for electron microscopy includes a membrane having a film, pillars distributed on the film, and a frame supporting the membrane. The pillars may be distributed across an imaging area of the membrane within a pe...  
WO/2019/156770A1
The present disclosure describes a method and apparatus for determining whether components in a semiconductor manufacturing system are authorized for use in that system. By embedding an identification feature in the component, it is poss...  
WO/2019/155540A1
In this invention, a charged-particle beam device (110) comprises: a lens barrel (111) having a charged particle source (112); a sample chamber (101) for mounting therein a sample to be irradiated by a charged-particle beam; and a thermi...  
WO/2019/157068A1
A microscopy system includes a gas cluster beam system configured for generating a beam of gas clusters directed toward a sample to irradiate a sample and mill away successive surface layers from the sample, a scanning electron microscop...  
WO/2019/155978A1
A sputtering device 1 as a substrate treatment device is provided with: a transfer mechanism CMA that transfers a substrate S along a transfer surface; a cathode C that holds a target T; a rotation mechanism RTM that rotates the cathode ...  
WO/2019/155850A1
The present invention pertains to an autofocus technique which is for a scanning electron microscope and uses interlace scanning. This autofocus method for a scanning electron microscope: repeatedly scans a sample with an electron beam w...  
WO/2019/156296A1
Disclosed are a plasma treatment device comprising a boron carbide coating layer, and a manufacturing method therefor, the device having excellent corrosion resistance against plasma, ensuring the uniformity of plasma distribution, impro...  
WO/2019/154490A1
A deposition apparatus (100, 101) for coating a substrate (10, 10b) is described. The deposition apparatus includes a first spool chamber (110) housing a storage spool (112) for providing the flexible substrate (10), a deposition chamber...  
WO/2019/156911A1
A method for non-invasively measuring the impedance of a plasma discharge. Parallel anode and cathode electrodes are connected to a DC voltage source that ignites and sustains a plasma between the anode and cathode. A network analyzer ap...  
WO/2019/152528A1
Various embodiments include an apparatus to retrofit into an electrostatic chuck (ESC) of an existing plasma-based processing system. The apparatus includes a tube adapter having a dielectric coating formed on an inner surface of the tub...  
WO/2019/151025A1
This spatially phase-modulated electron wave generation device which generates spatially phase-modulated electron waves is provided with a laser light output device, a spatial optical phase modulator, and an optical cathode. The optical ...  
WO/2019/149684A1
The present invention relates generally to a reusable ion implantation mask useful for repeatedly implanting selected areas of substrates with ions on a large scale. The present invention further relates to a method for partial ion impla...  
WO/2019/149315A1
The invention relates to a vacuum chamber or part of a vacuum chamber comprising multiple components, in particular chamber walls and connection flanges, which form the vacuum chamber. The invention also relates to a method for producing...  
WO/2019/149763A1
A device (1) for coating a substrate (4) with nanometric sized particles, wherein the device (1) comprises: a plurality of means (2a, 2b, 2c, 2d), called production means, each able to produce a jet (3) of nanometric sized particles, eac...  
WO/2019/152018A1
An atom probe directs two or more pulsed laser beams onto a specimen, with each laser beam being on a different side of the specimen, and with each laser beam supplying pulses at a time different from the other laser beams. The laser bea...  
WO/2019/147583A1
Methods and apparatuses for spacer profile control using atomic layer deposition (ALD) in multi-patterning processes are described herein. A silicon oxide spacer is deposited over a patterned core material and a target layer of a substra...  
WO/2019/145679A1
A vacuum apparatus casing (12) to house at least one pumping mechanism or at least one abatement device has internal channelling (60) defining at least one closed heat transfer pathway along which, in use, heat is conducted through the c...  
WO/2019/147450A1
In one example, a chamber inlet assembly includes a chamber inlet, an outer coupling for a delivery line, and an inner coupling for a processing region of a processing chamber. The inner coupling and the outer coupling are on inner and o...  
WO/2019/147513A1
Embodiments of method and system for controlling plasma performance are described. In an embodiment a method may include supplying power at a first set of power parameters to a plasma chamber. Additionally, the method may include forming...  
WO/2019/147097A1
The present invention relates to a substrate treatment apparatus comprising: a support part for supporting a substrate; a first electrode part disposed above the support part; a second electrode part disposed above the first electrode pa...  
WO/2019/147371A1
Embodiments of the present disclosure generally relate to a processing chamber for conformal oxidation of high aspect ratio structures. The processing chamber includes a chamber body with a first side and a second side opposite the first...  
WO/2019/148010A1
An impedance matching system includes an impedance matching network coupled between an alternating current (AC) generator and electrodes of a plasma chamber. The AC generator generates a multi-level pulse signal of cyclically recurring p...  
WO/2019/141337A1
The invention relates to a microwave plasma device, comprising a treatment area and a number of two or more microwave semiconductors. The microwave plasma device is characterised in that the microwave semiconductors are attached to the t...  
WO/2019/143474A1
Embodiments described herein relate to apparatus and methods for performing electron beam reactive plasma etching (EBRPE). In one embodiment, an apparatus for performing EBRPE processes includes an electrode formed from a material having...  
WO/2019/144093A1
A terminal for an ion implantation system is provided, wherein the terminal has a terminal housing (154) for supporting an ion source (108) configured to form an ion beam. A gas box (146) within the terminal housing has a hydrogen genera...  
WO/2019/143559A1
A pressure barrier comprising a window with a first side and a second side, a main section comprising a length, a first end, and a second end opposite the first end, a first gradient compression section adjacent to the first end of the m...  

Matches 201 - 250 out of 66,307