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Matches 251 - 300 out of 66,312

Document Document Title
WO/2019/143473A1
Embodiments of the present disclosure generally relate to methods and related process equipment for forming structures on substrates, such as etching high aspect ratio structures within one or more layers formed over a substrate. The met...  
WO/2019/143873A1
These electron beam separator designs address thermally-induced beam drift in an electron-optical system. A heater coil wrapped around the beam separator unit can maintain constant power. Additional coils also can be wrapped around the b...  
WO/2019/143992A1
Systems and methods for increasing the RF power switched into a resonant load by achieving voltage multiplication by means of coupled inductors are provided herein. In one approach, the RF electromagnetic wave achieved by voltage multipl...  
WO/2019/140089A1
Disclosed are compositions and methods for the conductive fixation of organic material, including biological samples. The compositions and methods described herein can address the problems of charging and sample damage caused by electron...  
WO/2019/139395A1
A source matcher of the present invention may comprise: an RF oscillator unit for applying power for plasma generation to a plurality of coils installed in a chamber; an RF matcher unit for matching a load impedance to the characteristic...  
WO/2019/136396A2
Components and processes are disclosed herein for managing non-volatile and/or low- volatility byproduct materials that are generated within a plasma processing region of a plasma processing chamber during performance of various plasma-b...  
WO/2019/134328A1
A ceramic structure, a lower electrode and a dry etching machine. The ceramic structure (10) comprises at least two ceramic plates (11), and each of the ceramic plates is provided with a clamping groove (111) and a clamping protrusion (1...  
WO/2019/135679A1
The present invention is in the field of a vacuum transfer assembly, such as for cryotransfer, and specifically a TEM vacuum transfer assembly, which can be used in microscopy, a sample holder, a vacuum housing, a sample holder stage and...  
WO/2019/131410A1
The present invention addresses the problem of providing a sample inspection device in which noise is removed from a detection signal and a generated electron beam is effectively utilized in inspection, and a sample inspection method. A ...  
WO/2019/133302A1
Various embodiments include an apparatus to filter radio-frequencies in a plasma-based processing device. In various embodiments, an RF filter device includes a number of substantially-planar spiral-filters electrically coupled to and su...  
WO/2019/133433A1
The invention relates to a method for electron microscopy. The method comprises providing an electron microscope, generating an electron beam and an image beam, adjusting one of the beam and of the beam and the image beam to reduce off-a...  
WO/2019/131875A1
The purpose of the present invention is to provide a particle shape analysis method, etc., for analyzing the shape of a fine particulate sample. A particle shape analysis method, in which: a particulate sample (49) is placed on a sample ...  
WO/2019/129988A1
The invention relates to an apparatus for manufacturing a three-dimensional object by selective additive manufacturing, comprising, in a chamber, a support for depositing successive layers of additive manufacturing powder, a distribution...  
WO/2019/133272A1
Plasma processing apparatus and methods are provided. In one example implementation, the plasma processing apparatus includes a processing chamber. The plasma processing apparatus includes a pedestal disposed in the processing chamber. T...  
WO/2019/125860A1
An apparatus may include an electrode assembly, the electrode assembly comprising a plurality of electrodes, arranged in a plurality of electrode pairs arranged to conduct an ion beam therethrough. A given electrode pair lies along a rad...  
WO/2019/124736A1
The present invention relates to a plasma apparatus for dry cleaning semiconductor substrates capable of precisely controlling density and dispersion of reactive active species (radicals) constituting a plasma. The present invention comp...  
WO/2019/120387A1
The invention relates to a method for operating a depositing system in which a process layer is deposited (22) onto an object to be coated. Prior to depositing the process layer on the object to be coated, a reactant (42) of an undesired...  
WO/2019/120386A1
The invention relates to a method for operating a deposition installation (20) having an exhaust gas section (31) with a vacuum pump (30), wherein a layer (40; 50), which is parasitically deposited on a wall (23) of the exhaust gas secti...  
WO/2019/125186A1
An aspect of the invention provides an ion beam sputtering apparatus comprising an ion source configured to generate a hollow ion beam along a beam axis that is located in a hollow part of the beam; and a sputtering target having a targe...  
WO/2019/121883A1
A method of determining a distortion of a field of view of a scanning electron microscope is described. The method may include: providing a sample including substantially parallel lines extending in a first direction; performing scans ac...  
WO/2019/121899A1
The invention relates to a system for controlling the temperature of an electrode. The system comprises at least one heat conduction tube, a coupling element, and a temperature control device. The heat conduction tube is suitable, at lea...  
WO/2019/123604A1
In order to control the amount of electrostatic charge on the surface of a sample to a desired value before computation of a frame-integrated image, the present invention provides a configuration comprising a charged-particle beam source...  
WO/2019/125599A1
A system and method for varying the temperature of a faceplate for an ion source is disclosed. The faceplate is held against the chamber walls of the ion source by a plurality of fasteners. These fasteners may include tension springs or ...  
WO/2019/125680A1
A coil assembly for controlling a magnetic field in a plasma chamber is provided herein. In some embodiments, the coil assembly may include a mandrel including an annular body that includes at least one upper body coolant channel and at ...  
WO/2019/120358A1
The invention relates to a method for operating a depositing system (20), wherein an intermediate layer (50a) is deposited (10) in the depositing system (20) and at least one process layer (52a) is then deposited (12) in the depositing s...  
WO/2019/121268A1
The present invention relates to a method and a device (10) for producing a desired surface profile on a workpiece by structure transfer from masks. The surface profiling according to the invention allows high precision in terms of the d...  
WO/2019/125597A1
A system and method for optimizing a ribbon ion beam in a beam line implantation system is disclosed. The system includes a mass resolving apparatus having a resolving aperture, in which the resolving aperture may be moved in the X and Z...  
WO/2019/125640A1
A method for in-situ patterning a stack having a patterned mask with mask features including sidewalls and tops is provided. A plurality of patterning cycles is provided in a plasma chamber wherein each patterning cycle comprises: at lea...  
WO/2019/121195A1
A transmission electron microscopy system (12) is described, the system comprising: a transmission electron microscope; and a sample substrate (2) for supporting a sample (16) within the transmission electron microscope, wherein the samp...  
WO/2019/125598A1
A system for implanting ions into a workpiece while minimizing the generation of particles is disclosed. The system includes an ion source having an extraction plate with an extraction aperture. The extraction plate is electrically biase...  
WO/2019/121390A1
An electron beam source comprising a cathode, an anode, a means for deflecting an electron beam over a target surface and at least one vacuum pump, the electron beam source further comprising a contraction area arranged between the anode...  
WO/2019/117969A1
Systems and methods for securing an edge ring to a support ring are described. The edge ring is secured to the support ring via multiple fasteners that are inserted into a bottom surface of the edge ring. The securing of the edge ring to...  
WO/2019/118346A1
Embodiments of magnetron assemblies and processing systems incorporating same are provided herein. In some embodiments, a magnetron assembly includes a rotatable magnet assembly coupled to a bottom of the body and having a plurality of m...  
WO/2019/118602A1
An apparatus has a cathode target with a cathode target outer perimeter. An inner magnet array with an inner magnet array inner perimeter is within the cathode target outer perimeter. The inner magnet array includes an inner magnet array...  
WO/2019/118489A1
A charged particle beam source that may include an emitter that has a tip for emitting charged particles; a socket; electrodes; a filament that is connected to the electrodes and to the emitter; electrodes for providing electrical signal...  
WO/2019/117979A1
A sputtering system and method are disclosed. The system includes a first power source that is configured to apply a first voltage at a first electrode that alternates between positive and negative relative to a second electrode during e...  
WO/2019/116605A1
The purpose of the present invention is to provide an electron beam irradiation device, which is capable of efficiently collecting a component that has been removed from a sample as a result of the irradiation of an electron beam onto th...  
WO/2019/118067A1
A system and method for monitoring glitch frequency and energy is disclosed. The system includes a glitch capture module that monitors the voltage of a biased component and captures any glitches that occur. The glitch capture module also...  
WO/2019/117384A1
The present invention relates to a sputtering target and a method for producing same. The present invention presents as an embodiment a sputtering target which is a target used in a sputtering process, is composed of at least one materia...  
WO/2019/118121A1
A gas supply assembly is described for delivery of gas to a plasma flood gun which includes an inert gas and a fluorine-containing gas, wherein the assembly is configured to deliver a volume of the fluorine-containing gas to the flood gu...  
WO/2019/118808A1
Plasma source assemblies comprising an RF hot electrode having a body and at least one return electrode spaced from the RF hot electrode to provide a gap in which a plasma can be formed. An RF feed is connected to the RF hot electrode at...  
WO/2019/118120A1
An ion source with a crucible is disclosed. In some embodiments, the crucible is disposed in one of the ends of the ions source, opposite the cathode. In other embodiments, the crucible is disposed in one of the side walls. A feed materi...  
WO/2019/109670A1
Provided is a chamber environment recovery method, comprising: an oxidation step, involving: carrying out an oxidation treatment on particles in a chamber, and extracting an oxidative product in the chamber after a pre-determined time; a...  
WO/2019/110572A1
Systems and methods for tuning and/or calibrating a charged particle beam apparatus are disclosed. According to certain embodiments, a reference specimen comprises a substrate having a plurality of first objects at a first pitch, and a p...  
WO/2019/112849A1
A system and method for generating a radio frequency (RF) waveform are described. The method includes defining a train of on-off pulses separated by an off state having no on- off pulses. The method further includes applying a multi-leve...  
WO/2019/113008A1
Processing chamber components and methods of manufacture of same are provided herein. In some embodiments, a component part body includes a component part body having a base plane and at least one textured surface region, wherein the at ...  
WO/2019/110288A1
Magnetron sputtering source (1) for coating of a substrate (2), the sputtering source (1) comprising: a target (5) having a target surface at a front side a magnetron arrangement (511, 512) at a backside of the target (5) for creating a ...  
WO/2019/110502A1
The invention relates to an optically controlled electron source (100) comprising at least one tip (P) which is made of a conductive material (Cond) and of which the surface of the apex and the vicinity thereof is covered with at least o...  
WO/2019/107113A1
The purpose of the present invention is to provide an emitter that is made of hafnium carbide (HfC) and that releases electrons in a stable and highly efficient manner, a method for manufacturing the emitter, and an electron gun and elec...  
WO/2019/107729A1
The present invention relates to a dry cleaning apparatus and method for selectively removing polysilicon. The present invention comprises: supplying a fluorine-containing gas in a plasma state and a hydrogen-containing gas in a non-plas...  

Matches 251 - 300 out of 66,312