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Patent Searching and Data


Matches 301 - 350 out of 66,186

Document Document Title
WO/2019/064516A1
An exposure device (1000) comprises: a light optical system (180i); a housing (19) that has formed, in the interior thereof, a vacuum space (34) in which an electron emission surface of a photoelectric element (54i) is positioned; a fram...  
WO/2019/067948A1
The present disclosure generally relates to an isolation device for use in processing systems. The isolation device includes a body having a flow aperture formed therethrough. In one embodiment, the isolation device is disposed between a...  
WO/2019/063559A1
Disclosed herein is a method comprising: determining parameters of a recipe of charged particle beam inspection of a region on a sample, based on a second set of characteristics of the sample; inspecting the region using the recipe.  
WO/2019/068070A1
Described herein are apparatus and methods of printing in the presence of plasma. The apparatus includes a modular print head comprising an inlet module, a plasma module with movable electrode configurations, and a nozzle module. The mod...  
WO/2019/066431A1
The present invention relates to a microwave plasma generator improved in power transmission efficiency, which can compensate for impedance mismatching, due to plasma generated at one end of a coaxial cable of a microwave plasma generato...  
WO/2019/067451A1
This disclosure is generally directed to controlling energy distribution to a load, especially when anomalous events are detected. Benefits of the present disclosure include minimizing the length of a discharge event, mitigating the effe...  
WO/2019/063558A1
Disclosed herein is a method comprising: depositing a first amount of electric charges into a region of a sample, during a first time period; depositing a second amount of electric charges into the region, during a second time period; wh...  
WO/2019/062573A1
Provided are a process chamber and a capacitively coupled plasma apparatus. The process chamber comprises a chamber body, a lining, and a magnetic assembly, wherein the lining is arranged inside the chamber body and defines and forms a p...  
WO/2019/063432A1
Disclosed herein an apparatus (100) and a method for detecting buried features using backscattered particles. In an example, the apparatus comprises a source of charged particles; a stage (30); optics (16) configured to direct a beam of ...  
WO/2019/066802A1
Apparatuses and methodologies for electron beam probing for chip debug and fault isolation are described. In an example, a method of electron-beam signal image mapping (ESIM) includes, scanning an electron beam over an area on a chip con...  
WO/2019/063433A1
An optical height detection system in a charged particle beam inspection system. The optical height detection system includes a projection unit including a modulated illumination source, a projection grating mask including a projection g...  
WO/2019/063530A1
Apparatus and methods for adjusting beam condition of charged particles are disclosed. According to certain embodiments, the apparatus includes one or more first multipole lenses displaced above an aperture, the one or more first multipo...  
WO/2019/063561A1
Disclosed herein is an apparatus comprising: a source of charged particles configured to emit a beam of charged particles along a primary beam axis of the apparatus; a condenser lens configured to cause the beam to concentrate around the...  
WO/2019/067240A1
Embodiments of the present disclosure generally relates a shadow frame including two opposing major side frame members adjacent to two opposing minor side frame members coupled together with a corner bracket, wherein the corner bracket i...  
WO/2019/064521A1
An electron beam exposure apparatus has a plurality of electron beam optical systems (70i) that each make electrons into an electron beam (EB) and bombard a target therewith, said electrons being produced from a photoelectric conversion ...  
WO/2019/064530A1
An electron beam apparatus comprises: a plurality of light emitting units (84a); and an electron beam optical system that makes electrons into a plurality of electron beams (EB) and can bombard a target therewith, said electrons being em...  
WO/2019/063531A1
A system and method for advanced charge control of a light beam is provided. The system comprising a laser source comprising a laser diode for emitting a beam and a beam homogenizer to homogenize the emitted beam. The system and methods ...  
WO/2019/063637A1
It is proposed an assembly (10) comprising: - a crucible (12) comprising at least one cavity (16), - a container (14) for a material (15) to be vaporized, the container being intended to be disposed inside the cavity of the crucible and ...  
WO/2019/063532A1
Disclosed herein is a method comprising: generating a plurality of probe spots (310A-310C) on a sample by a plurality of beams of charged particles; while scanning the plurality of probe spots across a region (300) on the sample, recordi...  
WO/2019/064496A1
Provided is a scanning electron microscope not employing a deceleration method, wherein the scanning electron microscope suppresses the detection amount of SE3 excited due to BSE and is equipped with an energy selection/detection functio...  
WO/2019/067885A1
The present disclosure generally relates to an isolation device for use in processing systems. The isolation device has a body with an inlet opening disposed at a first end coupled to a processing system component such as a remote plasma...  
WO/2019/064001A1
An apparatus for processing or curing a substrate, the apparatus comprising: a support (102) arranged to transport a moving flexible substrate (104), a plasma generator (110) arranged to generate plasma (112), a magnet array (114) arrang...  
WO/2019/057310A1
The present disclosure relates to a system for cleaning a vacuum chamber. The system includes a vacuum chamber and a compressor. The vacuum chamber includes an inlet and an outlet. The compressor includes an inlet side connected to the o...  
WO/2019/058782A1
The present invention generates rendering data, in which a calculation amount in a multi-charged particle beam rendering device and a data amount can be reduced, from designed data in which a figure having a curved line is included. The ...  
WO/2019/058440A1
In order to optimize defect contrast in a charged particle beam device that inverts charged particles directly above a sample and observes the electrons, this charged particle beam device is provided with a charged particle source (20), ...  
WO/2019/058511A1
An ion source device 10A is provided with: cathode electrodes 13b, 13b that emit electrons; an anode electrode 13a having a slit 13aa through which ions are extracted; an extraction electrode 15, which is disposed by being separated from...  
WO/2019/060060A1
The present disclosure generally relates to plasma assisted or plasma enhanced processing chambers. More specifically, embodiments herein relate to electrostatic chucking (ESC) substrate supports configured to provide independent pulses ...  
WO/2019/060028A1
A method and apparatus for biasing regions of a substrate in a plasma assisted processing chamber are provided. Biasing of the substrate, or regions thereof, increases the potential difference between the substrate and a plasma formed in...  
WO/2019/058163A2
The invention relates to a method for carrying out a deposition process at the outer side (1) and/or at the inner side (2) of a body (3) having a longitudinal extension (L), in which at least one deposition is applied onto the outer and/...  
WO/2019/059621A1
The present invention relates to a dry cleansing method for removing an oxide or nitride formed on a silicon substrate, the method comprising: a reaction product producing step of providing a silicon substrate heated in a state disposed ...  
WO/2019/060030A1
Embodiments described herein generally relate to plasma assisted or plasma enhanced processing chambers. More specifically, embodiments herein relate to electrostatic chucking (ESC) substrate supports configured to provide pulsed DC volt...  
WO/2019/057644A1
A charged particle beam apparatus includes a beamlet forming unit configured to form and scan an array of beamlets (410) on a sample (440). A first portion of the array of beamlets is focused onto a focus plane (430), and a second portio...  
WO/2019/057734A1
The invention relates to a device (1) for treating a product (2) with microwaves, the device (1) comprising a treatment chamber (13) in which the product (2) can be arranged, and a microwave-radiating device arranged in the treatment cha...  
WO/2019/057662A1
The invention relates to a device (1) for treating a product (2) with microwaves, the device (1) having a treatment chamber (15), in which the product (2) can be conveyed along a transport track (13) in a transport direction (14) through...  
WO/2019/060029A1
Embodiments described herein generally relate to plasma assisted or plasma enhanced processing chambers. More specifically, embodiments herein relate to electrostatic chucking (ESC) substrate supports configured to provide pulsed DC volt...  
WO/2019/053871A1
The purpose of the present invention is to provide a technology to reduce a phenomenon in which sample-derived fine particles flicked by ion beam irradiation re-adhere to an ion milling surface. This ion milling device enables a reductio...  
WO/2019/055467A1
An RF feedthrough has an electrically insulative cone that is hollow having first and second openings at first and second ends having first and second diameters. The first diameter is larger than the second diameter, defining a tapered s...  
WO/2019/054635A1
The present invention relates to a technology for increasing the reliability of measurement by preventing the contamination of a self-plasma chamber provided in order to monitor a deposition operation performed in a process chamber, and ...  
WO/2019/053173A1
Systems and methods for implementing a detector array are disclosed. According to certain embodiments, a substrate comprises a plurality of sensing elements (501-503) including a first element (502) and a second element (503), and a swit...  
WO/2019/055193A1
An apparatus and method for determining the health of a plasma system by igniting a plasma within a plasma confining volume generate an ignition signal with an ignition circuit and apply the ignition signal between a biased region and a ...  
WO/2019/053174A1
Systems and methods for implementing a detector array (600) are disclosed. According to certain embodiments, a substrate (600) comprises a plurality of sensing elements (611-613) including a first element (611) and a second element (612)...  
WO/2019/054111A1
The present invention provides a technique for suppressing an abnormal electric discharge inside an ion generation container from an ion source, which is caused by an insulation film originating from by-products when an ionization gas an...  
WO/2019/055967A1
A system and method is provided maintaining a temperature of a workpiece during an implantation of ions in an ion implantation system, where the ion implantation system is characterized with a predetermined set of parameters. A heated ch...  
WO/2019/055162A1
A pedestal assembly for use in a plasma processing apparatus for processing a substrate includes a baseplate. The pedestal assembly can further include a puck configured to support a substrate. The pedestal assembly can further include a...  
WO/2019/053310A1
The invention relates to a remote plasma-enhanced chemical vapour deposition device and to a method for producing same, said device (11) comprising a tube (13) surrounded by an electric radio-frequency coil (14) for transforming a supply...  
WO/2019/048670A1
The invention relates to a gas inlet element (2) for a CVD or PVD reactor (1) having a base plate (7), the broad side (7') of which is adjacent to an edge (18) on a narrow side (7''), having a plurality of gas outlet openings (16, 16''),...  
WO/2019/050663A1
An apparatus may include an electrode system, the electrode system comprising a plurality of electrodes to guide an ion beam from an entrance aperture to an exit aperture, and a voltage supply to apply a plurality of voltages to the elec...  
WO/2019/050809A1
A thermal choke rod connecting a radio frequency source to a substrate support of a plasma processing system includes a tubular member having a first connector for connecting to an RF rod coupled to the substrate support and a second con...  
WO/2019/049260A1
In the present invention, a charged particle beam device uses an optical system with a lens, and because of this optical system, an image distortion occurs in a sample structure 53, an image of which is formed within an observation visua...  
WO/2019/048293A1
Disclosed herein is an apparatus comprising: a source configured to emit charged particles, an optical system and a stage; wherein the stage is configured to support a sample thereon and configured to move the sample by a first distance ...  

Matches 301 - 350 out of 66,186