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WO/2023/214606A1 |
The present invention provides a method and system for providing plasma simulation, which limit the exposure of the content of data used for plasma simulation, on the basis of a security condition for the data used for plasma simulation,...
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WO/2023/211665A1 |
A method of generating a voltage pulse includes generating a first non-sinusoidal continuous wave voltage (NSCWV) waveform for a first time duration of a clock cycle. The first NSCWV signal comprises a first base voltage and a first freq...
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WO/2023/211583A1 |
A method and apparatus for a gap-fill in semiconductor devices are provided. The method includes forming a metal seed layer on an exposed surface of the substrate, wherein the substrate has features in the form of trenches or vias formed...
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WO/2023/211729A1 |
A system for automatically compensating a gap between a substrate arranged on a substrate support in a processing chamber and a component in the processing chamber. The system includes a light source configured to transmit light toward t...
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WO/2023/210854A1 |
In order to address the issue described, a simulation method, according to the present invention, comprises the steps of: calculating a first result value for a plasma process by inputting at least one parameter related to a plasma proce...
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WO/2023/210855A1 |
The present invention provides plasma simulation method and system, the method extracting text information related to a plasma process from a document in electronic format, and selecting at least a portion of the extracted text informati...
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WO/2023/210595A1 |
One embodiment of the present invention provides a method for processing a thin film, said method comprising: (a) provision of a thin film; (b) irradiation of the thin film with an electron beam; (c) observation of the thin film and dete...
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WO/2023/207053A1 |
The present application provides a method for manufacturing a metal electrode having a grating-like structure, and an electrode. The method comprises: using an ion beam etching (IBE) device to emit a first particle beam to etch a metal l...
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WO/2023/209083A1 |
The present disclosure relates to a magnetron sputtering system comprising a substrate to be coated and a magnetron sputtering device comprising at least one rotatable tubular cathode, a mask positioned between the cathode and the substr...
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WO/2023/207550A1 |
The present invention provides a semiconductor process chamber and an upper electrode structure thereof. The upper electrode structure comprises a magnetron component, an emitting component, a receiving component, a target material and a...
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WO/2023/211105A1 |
According to the present invention, provided is an inductively coupled plasma device for treating an exhaust gas, comprising: an inductively coupled plasma reactor which is provided in an exhaust pipe through which an exhaust gas generat...
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WO/2023/209378A1 |
A method of etching into an indium-based semiconductor material. The method comprises mounting a substrate comprising the indium-based semiconductor material directly on a substrate support structure in a plasma processing chamber, where...
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WO/2023/208350A1 |
A method for testing a packaging substrate with at least one electron beam column is described, wherein the packaging substrate is a panel level packaging substrate or an advanced packaging substrate. The method includes placing the pack...
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WO/2023/204912A2 |
The present disclosure provides a method of processing a substrate within an ion beam system. The substrate has a top surface that has a plurality of features, an edge and a bottom surface. The substrate is placed on a wafer stage and an...
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WO/2023/203281A1 |
According to an aspect, there is provided a collimator for tilted c-axis thin-film deposition comprising a collimator body. The collimator body comprises an array of holes for limiting directions of deposition of particles. The collimato...
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WO/2023/202819A1 |
The present invention provides a charged particle optical device for projecting charged particle beams towards a sample position, arranged in a grid. The device comprises: a beam limiting aperture array and strip arrays. In the beam limi...
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WO/2023/202824A1 |
A method for filtering false positives in a charged particle beam detector includes utilizing spatial information of detected charged particle landing events on the detector. A spatial distribution of detected charged particle landing ev...
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WO/2023/204344A1 |
A simulation method according to the present invention comprises steps in which: a plasma device for performing a plasma process measures electron density and/or electron temperature; a continuity equation for the density of parameters r...
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WO/2023/203744A1 |
The present invention improves throughput before observation of a lamella is completed, and also automatically makes corrections even when the lamella is greatly inclined. An imaging system 10 of the present disclosure comprises: a surfa...
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WO/2023/201391A1 |
Substrates modified with plasma-activated coatings are provided, as are processes for their preparation. The coated substrates may possess high transparency and are radical rich, enabling covalent attachment of biomolecules, for example ...
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WO/2023/202793A1 |
An apparatus for coating a component. The apparatus includes a chamber. A first magnetron and a second magnetron are disposed within the chamber for supplying a coating material to a surface of the component. A component holder is dispos...
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WO/2023/205001A1 |
A method of processing a region of a sample, the method comprising: positioning a sample within a vacuum chamber; generating an ion beam with a focused ion beam (FIB) column; focusing the ion beam on the sample and scanning the focused i...
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WO/2023/203755A1 |
Provided is a charged particle beam device capable of stabilizing discharge current by efficiently reducing pressure around the electron source and preventing contamination of an electron source. This charged particle beam device is conf...
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WO/2023/205472A1 |
A plurality of accessory components for use in respective reel to real sectioning, serial sectioning, and array tomography sectioning described herein incorporate mechanical and electro-mechanical engineering to provide accessory tools f...
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WO/2023/201580A1 |
The present disclosure relates to a power source system, an electron-optical lens group, and a scanning electron microscope. The electron-optical lens group comprises an electron source. The power source system, which supplies power to a...
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WO/2023/204840A1 |
Methods and apparatus for processing a substrate are provided herein. For example, a matching network configured for use with a plasma processing chamber comprises an input configured to receive one or more radio frequency (RF) signals, ...
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WO/2023/205150A1 |
A synchronization module is configured to generate a synchronization signal for transmission to at least one of a power generator and/or at least one match network, wherein the synchronization signal is formed with pulses having varying ...
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WO/2022/250997A9 |
A generator produces output such as delivered power, voltage, current, forward power etc. that follows a prescribed pattern of output versus time where the pattern repeats with a repetition period by controlling sections of the pattern b...
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WO/2023/205065A1 |
Apparatus provide plasma to a processing volume of a chamber. The Apparatus may comprise a plurality of plasma sources, each with at least a dielectric tube inlet which is at least partially surrounded by a conductive tube which is confi...
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WO/2023/205466A1 |
The disclosure describes imaging systems adapted for use with a plurality of detectors and configured for use in a variety of electron microscopes. Also, methods of using such systems are disclosed.
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WO/2023/202002A1 |
The present invention relates to a machining control method for a semiconductor device and high energy particle beam lithography equipment. The machining control method for a semiconductor device comprises: obtaining an integrated circui...
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WO/2023/204968A1 |
A beam extraction system is provided. The beam extraction system includes a first focusing optic, a second focusing optic, and an optic relay coupled to the first focusing optic and the second focusing optic. The first focusing optic is ...
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WO/2023/204995A1 |
Herein described is an apparatus comprising an inductively coupled plasma (ICP) antenna comprising a plurality of inductances electrically coupled in series, and a capacitor coupled in parallel with an inductance of the plurality of indu...
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WO/2023/204896A1 |
The present disclosure provides a method for increased target utilization within a sputtering system. A plurality of targets are provided wherein each target is operatively connected to a central axis. An ion beam is generated within the...
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WO/2023/205246A1 |
Provided herein is a method for recognizing the presence of multiple-phase inclusions in a base material, including but not limited to metals such as steel, using digital processing techniques with Scanning Electron Microscopy (SEM), Ene...
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WO/2023/197155A1 |
An electron microscope vibration-damping structure (010), comprising a housing (100), an electron emission portion (300) and an air extraction member (200), wherein a main chamber (101) is formed inside the housing (100), and an air extr...
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WO/2023/197099A1 |
A particle corrector and a particle system, which relate to the technical field of particles, and are used for solving the problems of the particle beam current being relatively low, the resolution being low, the particle beam quality be...
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WO/2023/198378A1 |
An improved system 700 is disclosed; e.g. for wafer outer portion inspection in a charged particle beam system such as a scanning electron microscope (SEM). The system uses multiple conductive electrodes, e.g. rings 710,711, around the w...
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WO/2023/200055A1 |
Disclosed are an electrode for supplying lithium ions for real-time microscopic analysis and a method for manufacturing same. The electrode for supplying lithium ions comprises: a solid electrolyte layer comprising a solid electrolyte; a...
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WO/2023/201172A1 |
Systems and methods are described herein for generating, modulating, and/or shaping a plurality of electron beams to be used in various lithography processes. In some aspects, multiple beams may be individually modulated to create a patt...
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WO/2023/197131A1 |
Provided are an adjustable multi-electrode collimating device and a charged particle system using the collimating device. The charged particle system comprises a charged particle source and an adjustable collimating lens. The adjustable ...
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WO/2023/197114A1 |
The present application relates to the technical field of particles, and provides a particle correction device, a particle corrector module, and a particle system. The particle correction device comprises M micro-correctors and a signal ...
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WO/2023/200909A1 |
A method of coating a plasma channel of a plasma source, comprises providing at least one electrolyte having one or more chelating agents therein, treating at least one surface to produce a processed surface, smoothing the surface of the...
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WO/2023/197125A1 |
The present application relates to the technical field of electron optics. Provided in the embodiments of the present application are an electrostatic lens used for reducing the defocus distance and a multi-split beam charged particle sy...
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WO/2023/199506A1 |
The present disclosure provides a charged particle beam system in which an image generation condition for evaluating a beam adjustment condition can be properly set. The charged particle beam system has an adjustment deflector for adjust...
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WO/2023/198397A1 |
Systems and methods of imaging a sample using a charged-particle beam apparatus are disclosed. The apparatus may include a charged-particle source configured to emit charged particles, an aperture plate configured to form a primary charg...
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WO/2023/200787A1 |
Systems and methods of manipulating nano- and micrometer scale particles are described. The system generally includes an optical imaging system for acquiring an image of a sample of particles, a processor for analyzing the image, identif...
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WO/2023/197146A1 |
The present application relates to the technical field of particles, and provides a particle system and a particle beam correction method, aiming at solving the problem of the mismatch between particle beams and lens assemblies. The part...
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WO/2023/197150A1 |
The present application provides an electron beam corrector, a manufacturing method therefor, and a scanning electron microscope. The electron beam corrector comprises: a semiconductor substrate, a wiring layer located on the semiconduct...
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WO/2023/194535A1 |
A method for supplying a laser or a processing plasma in a discharge chamber (30) with electrical power comprises: a. providing power from an output terminal (24) of a balanced amplifier (12) to the discharge chamber (30), wherein the ba...
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