Login| Sign Up| Help| Contact|

Patent Searching and Data


Matches 351 - 400 out of 66,332

Document Document Title
WO/2019/076609A1
Known gas injectors have a gas distributor element having a wall, which extends through a plurality of openings in order to supply process gas. In order to provide a heatable gas injector proceeding therefrom, having a simple design and ...  
WO/2019/077158A1
The invention relates to a method for producing at least one monolayer (L) of a two-dimensional material (Mat2D), said two-dimensional material consisting of an element B and an element N, which are boron and nitrogen respectively, and s...  
WO/2019/079325A1
A matchless plasma source is described. The matchless plasma source includes a controller that is coupled to a direct current (DC) voltage source of an agile DC rail to control a shape of an amplified square waveform that is generated at...  
WO/2019/078657A1
Provided is a plasma etching method using a Faraday cage. The plasma etching method comprises: a step of providing, in a plasma etching device, a Faraday cage that has a mesh part on the top surface thereof; a step of providing a quartz ...  
WO/2019/076884A1
The invention relates to a device for (1) locally manipulating a spatial phase distribution of a charged particle wave propagating along a beam axis (Z). The device comprises a support element (2) having a target region for receiving the...  
WO/2019/077970A1
The present invention provides a long-life ion source capable of generating a large number of aluminum ions. A filament 20 is energized to increase the temperature of a cathode 22 arranged inside a chamber 21, thereby heating a raw mater...  
WO/2019/079013A1
Methods and systems for controlling glow discharge in a plasma chamber are disclosed. An example apparatus includes a chamber having chamber walls connected to ground and a radio frequency (RF) power supply. A top electrode is connected ...  
WO/2019/074563A1
Disclosed herein is an apparatus for processing a substrate using an inductively coupled plasma source. An inductively coupled plasma source utilizes a power source, a shield member, and a coil coupled to the power source. In certain emb...  
WO/2019/074233A1
A plasma treatment device according to the present invention comprises: an induction chamber into which a source gas is introduced in order to generate plasma therein; a treatment chamber in which a treatment target substrate is arranged...  
WO/2019/072448A1
A method of inspecting a sample (10) with a charged particle beam device is described. The method comprises arranging the sample (10) on a stage (20), determining a first focusing strength of an objective lens (150) adapted to focus a ch...  
WO/2019/072704A1
Systems and methods for conducting critical dimension metrology are disclosed. A charged particle beam apparatus generates a beam for imaging a first area 540 and a second area 541-547. Measurements are acquired corresponding to a first ...  
WO/2019/075256A1
A radio frequency (RF) generator having an effective source impedance Z g at a reference point (e.g. at the generator output) includes a reference input and controls the magnitude and phase with respect to a signal received at the refere...  
WO/2019/075183A1
A sputtering chamber particle trap comprises first and second patterns formed on at least a portion of a surface of the particle trap. The first pattern includes one of: first indentations having a first depth and separated by first and ...  
WO/2019/071294A1
The present invention relates to generally to components of scientific analytical equipment, and particularly to methods for extending the operational lifetime or otherwise improving the performance of dynodes used in electron multiplier...  
WO/2019/075258A1
A method for controlling a generator connected to a load involving obtaining a first measured value (M1) related to a forward power calculated with respect to reference impedance (Z?c#191). The method involves adjusting an output of the ...  
WO/2019/074899A1
An ion implantation system has an ion source configured form an ion beam and an angular energy filter (AEF) having an AEF region. A gas source passivates and/or etches a film residing on the AEF by a reaction of the film with a gas. The ...  
WO/2019/074947A1
Generation of bubbles is disclosed to occur within a flow of an aqueous fluid. The bubbles may be formed within a tube of a selected diameter and the bubbles are controlled to exit the tube at a selected diameter. Generally, bubbles are ...  
WO/2019/071352A1
A novel method for cross-section sample preparation has a sample oriented normal to an SEM/GFIS or other imaging column via a stage, and is operated upon by an FIB to form the cross-section pre-lamella within the sample, followed by an a...  
WO/2019/070673A1
A radiofrequency (RF) filter includes an inductive element having multiple coil sections collectively forming an undivided coil of a cable of twisted magnetic wires. At least two adjacent coil sections have different turn pitches. The ca...  
WO/2019/070224A1
An inductive capacitive reactor for residential use functions as a multifaceted transformer with inductor and capacitor functionalities iteratively, includes comprises: a stacked group of hollow centered continuous loop components sequen...  
WO/2019/068601A1
A stage apparatus for an e-beam inspection apparatus comprising: - an object table (3) comprising an supporting surface, the object table configured to support a substrate (190) on the supporting surface; - a positioning device (180) con...  
WO/2019/070427A1
Embodiments disclosed herein generally relate to a substrate processing chamber component assembly with a split slit liner door assembly. In one embodiment, the split slit liner door assembly has a first door portion having a top surface...  
WO/2019/068666A1
A multi-beam apparatus for multi-beam inspection with an improved source conversion unit providing more beamlets with high electric safety, mechanical availability and mechanical stabilization has been disclosed. The source-conversion un...  
WO/2019/070524A1
Described herein are architectures, platforms and methods for providing localized high density plasma sources igniting local gasses during a wafer fabrication process to provide global uniformity. Such plasma sources are resonant structu...  
WO/2019/063528A1
An objective lens for forming an image of an object. The objective lens includes, sequentially from an image side to an object side, a first lens group having negative refractive power, and a second lens group having positive refractive ...  
WO/2019/064293A1
A control system for use in measuring one or more parameters of a patterned structure. The control system is configured as a computer system and comprises: an input utility configured to receive input data comprising raw measured TEM ima...  
WO/2019/064511A1
An electron beam apparatus comprises: a light irradiation apparatus (80) that irradiates a photoelectric element (54) with light; and an electron beam optical system (70) that bombards a wafer W with a an electron beam produced from the ...  
WO/2019/064013A1
A method and system for processing a diffraction pattern image obtained in an electron microscope are disclosed. The method comprises, according to a first set of microscope conditions, causing an electron beam to impinge upon a calibrat...  
WO/2019/063529A1
An optical system used in a charged particle beam inspection system. The optical system includes one or more optical lenses, and a compensation lens configured to compensate a drift of a focal length of a combination of the one or more o...  
WO/2019/063794A1
A multi-cell detector includes a first layer (420) having a region (422) of a first conductivity type and a second layer (440) including a plurality of regions (444) of a second conductivity type. The second layer may also include one or...  
WO/2019/064516A1
An exposure device (1000) comprises: a light optical system (180i); a housing (19) that has formed, in the interior thereof, a vacuum space (34) in which an electron emission surface of a photoelectric element (54i) is positioned; a fram...  
WO/2019/067948A1
The present disclosure generally relates to an isolation device for use in processing systems. The isolation device includes a body having a flow aperture formed therethrough. In one embodiment, the isolation device is disposed between a...  
WO/2019/063559A1
Disclosed herein is a method comprising: determining parameters of a recipe of charged particle beam inspection of a region on a sample, based on a second set of characteristics of the sample; inspecting the region using the recipe.  
WO/2019/068070A1
Described herein are apparatus and methods of printing in the presence of plasma. The apparatus includes a modular print head comprising an inlet module, a plasma module with movable electrode configurations, and a nozzle module. The mod...  
WO/2019/066431A1
The present invention relates to a microwave plasma generator improved in power transmission efficiency, which can compensate for impedance mismatching, due to plasma generated at one end of a coaxial cable of a microwave plasma generato...  
WO/2019/067451A1
This disclosure is generally directed to controlling energy distribution to a load, especially when anomalous events are detected. Benefits of the present disclosure include minimizing the length of a discharge event, mitigating the effe...  
WO/2019/063558A1
Disclosed herein is a method comprising: depositing a first amount of electric charges into a region of a sample, during a first time period; depositing a second amount of electric charges into the region, during a second time period; wh...  
WO/2019/062573A1
Provided are a process chamber and a capacitively coupled plasma apparatus. The process chamber comprises a chamber body, a lining, and a magnetic assembly, wherein the lining is arranged inside the chamber body and defines and forms a p...  
WO/2019/063432A1
Disclosed herein an apparatus (100) and a method for detecting buried features using backscattered particles. In an example, the apparatus comprises a source of charged particles; a stage (30); optics (16) configured to direct a beam of ...  
WO/2019/066802A1
Apparatuses and methodologies for electron beam probing for chip debug and fault isolation are described. In an example, a method of electron-beam signal image mapping (ESIM) includes, scanning an electron beam over an area on a chip con...  
WO/2019/063433A1
An optical height detection system in a charged particle beam inspection system. The optical height detection system includes a projection unit including a modulated illumination source, a projection grating mask including a projection g...  
WO/2019/063530A1
Apparatus and methods for adjusting beam condition of charged particles are disclosed. According to certain embodiments, the apparatus includes one or more first multipole lenses displaced above an aperture, the one or more first multipo...  
WO/2019/063561A1
Disclosed herein is an apparatus comprising: a source of charged particles configured to emit a beam of charged particles along a primary beam axis of the apparatus; a condenser lens configured to cause the beam to concentrate around the...  
WO/2019/067240A1
Embodiments of the present disclosure generally relates a shadow frame including two opposing major side frame members adjacent to two opposing minor side frame members coupled together with a corner bracket, wherein the corner bracket i...  
WO/2019/064521A1
An electron beam exposure apparatus has a plurality of electron beam optical systems (70i) that each make electrons into an electron beam (EB) and bombard a target therewith, said electrons being produced from a photoelectric conversion ...  
WO/2019/064530A1
An electron beam apparatus comprises: a plurality of light emitting units (84a); and an electron beam optical system that makes electrons into a plurality of electron beams (EB) and can bombard a target therewith, said electrons being em...  
WO/2019/063531A1
A system and method for advanced charge control of a light beam is provided. The system comprising a laser source comprising a laser diode for emitting a beam and a beam homogenizer to homogenize the emitted beam. The system and methods ...  
WO/2019/063637A1
It is proposed an assembly (10) comprising: - a crucible (12) comprising at least one cavity (16), - a container (14) for a material (15) to be vaporized, the container being intended to be disposed inside the cavity of the crucible and ...  
WO/2019/063532A1
Disclosed herein is a method comprising: generating a plurality of probe spots (310A-310C) on a sample by a plurality of beams of charged particles; while scanning the plurality of probe spots across a region (300) on the sample, recordi...  
WO/2019/064496A1
Provided is a scanning electron microscope not employing a deceleration method, wherein the scanning electron microscope suppresses the detection amount of SE3 excited due to BSE and is equipped with an energy selection/detection functio...  

Matches 351 - 400 out of 66,332