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WO/2011/025998 |
An improved method of directing a charged particle beam that compensates for the time required for the charged particles to traverse the system by altering one or more of the deflector signals. According to one embodiment of the inventio...
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WO/2011/025998 |
An improved method of directing a charged particle beam that compensates for the time required for the charged particles to traverse the system by altering one or more of the deflector signals. According to one embodiment of the inventio...
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WO/2011/024174 |
Plasma generating apparatus including a high vacuum processing chamber, a transformer type plasmatron, coupled with the high vacuum processing chamber, and at least one gas source, coupled with the transformer type plasmatron, for introd...
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WO/2011/024174 |
Plasma generating apparatus including a high vacuum processing chamber, a transformer type plasmatron, coupled with the high vacuum processing chamber, and at least one gas source, coupled with the transformer type plasmatron, for introd...
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WO/2011/025795 |
A charged particle beam writer system is disclosed comprising a generator for a charged particle beam having a beam blur radius, wherein the beam blur radius may be varied from shot to shot, or between two or more groups of shots. A meth...
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WO/2011/025998 |
An improved method of directing a charged particle beam that compensates for the time required for the charged particles to traverse the system by altering one or more of the deflector signals. According to one embodiment of the inventio...
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WO/2011/021957 |
In order to produce a three-dimensional image of an object, a scanning electron microscope is used to register the intensity distribution of re-radiation when the depth of focus of the electron microscope is greater than the height of th...
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WO/2011/022703 |
A character projection charged particle beam writer system is disclosed comprising a variable magnification reduction lens which will allow different shot magnifications on a shot by shot basis. A method for fracturing or mask data prepa...
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WO/2011/018932 |
A charged particle beam device comprises a charged particle source, an objective lens (12) for converging a primary-charged particle beam (3) emitted from the charged particle source, a scanning deflector (11) for scanning a sample with ...
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WO/2011/019276 |
The invention relates to a method of manufacturing a micro unit for use in a microscope. The method comprises the step of providing a planar substrate supporting structure and creating a chamber in the supporting structure for receiving ...
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WO/2011/018544 |
The invention relates to a device comprising a specific arrangement of magnets (4) that generate a magnetic field enabling a practically uniform erosion of a cathode or target (2), in such a way that the material thereof is almost fully ...
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WO/2011/019828 |
An improved method of producing solar cells utilizes a mask which is fixed relative to an ion beam in an ion implanter. The ion beam is directed through a plurality of apertures in the mask toward a substrate. The substrate is moved at d...
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WO/2011/017314 |
A closed drift ion source is provided comprising a single magnetic source, a first pole and a second pole. The ends of the first and second poles are separated by a gap. The magnetic source is disposed proximate to one of the first pole ...
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WO/2011/017618 |
A method of applying a suicide to a substrate while minimizing adverse effects, such as lateral diffusion of metal or "piping" is disclosed. The Implantation of the source and drain regions of a semiconductor device are performed at cold...
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WO/2011/016182 |
A charged-particle-beam device is characterized in having a control value for an aligner coil (29) being determined by: a coil current and an electrode applied-voltage at a control value for objectives (30, 31), which is an electromagnet...
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WO/2011/016208 |
A scanning electron microscope, when forming an image of an area to be scanned by scanning a two-dimensional area of a sample (8) with an electron beam (4), changes a scanning line density according to the sample to scan the area, compri...
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WO/2011/017314 |
A closed drift ion source is provided comprising a single magnetic source, a first pole and a second pole. The ends of the first and second poles are separated by a gap. The magnetic source is disposed proximate to one of the first pole ...
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WO/2011/014779 |
In an ion implanter, an ion current measurement device is disposed behind a mask co-planarly with respect to a surface of a target substrate as if said target substrate was positioned on a platen. The ion current measurement device is tr...
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WO/2011/012255 |
The invention relates to a plasma stamp having at least one cavity, at least one opening, before which a substrate to be treated can be arranged, a dielectrical floor arranged opposite the opening and a wall that is electrically conducti...
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WO/2011/013323 |
Disclosed is a desktop-type electron microscope wherein a control system containing an electron microscope main body, an exhaust system, a power source, and a cooling fan is disposed on a bottom plate. The desk-top type electron microsco...
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WO/2011/013342 |
Disclosed is a pattern evaluation device which determines the irregularities of the surface of a sample and measures the dimension thereof using the parallax induced by a beam tilt, wherein the amount of an astigmatic difference or the a...
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WO/2011/013650 |
A charged-particle-beam device is characterized in that a template image to be used in template matching is automatically rotated, when conducting an automatic measurement, according to a predetermined procedure, of a pattern that is arr...
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WO/2011/012185 |
The method for cleaning at least one component arranged in the inner region of a plasma process chamber by using a cleaning gas which comprises fluorine gas, the process chamber having at least one electrode and counter-electrode for pro...
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WO/2011/013311 |
Disclosed is a shield (8, 10) disposed between an ion source (1) of an ion milling device and a sample (7) so as to be in contact with the sample. The shield is characterized by having a circular shape having an opening at the center, an...
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WO/2011/011659 |
A variable-tilt specimen holder (100) for a charged particle instrument having a tilt stage (360), where the tilt stage (360) has a maximum range of tilt, a sample plate (280) affixed to the tilt stage (360), and an ion-beam column (320)...
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WO/2011/011049 |
Accelerated charged particles are provided by inductive amplification of particle energy in connection with a deflagration-mode plasma discharge. The deflagration mode discharge tends to increase particle energy relative to other operati...
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WO/2011/011661 |
An apparatus for monitoring sample milling in a charged-particle instrument has a variable-tilt specimen holder (130) attached to the instrument tilt stage (120). The variable-tilt specimen holder (130) includes a first pivoting plate (2...
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WO/2011/011661 |
An apparatus for monitoring sample milling in a charged-particle instrument has a variable-tilt specimen holder (130) attached to the instrument tilt stage (120). The variable-tilt specimen holder (130) includes a first pivoting plate (2...
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WO/2011/009209 |
A flow cell is provided for the analysis and/or microscopy of liquid or gas samples on the nanometer to micron scale. The flow cell preferably includes a thin membrane that is transparent to electrons and/or photons, thereby enabling the...
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WO/2011/011133 |
An apparatus for cleaning the specimen and interior specimen chamber of Transmission Electron Microscopes, and similar electron- or charged-particle-beam instruments consisting of a plasma cleaning device mounted on a hollow rod that rep...
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WO/2011/011133 |
An apparatus for cleaning the specimen and interior specimen chamber of Transmission Electron Microscopes, and similar electron- or charged-particle-beam instruments consisting of a plasma cleaning device mounted on a hollow rod that rep...
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WO/2011/011659 |
A variable-tilt specimen holder (100) for a charged particle instrument having a tilt stage (360), where the tilt stage (360) has a maximum range of tilt, a sample plate (280) affixed to the tilt stage (360), and an ion-beam column (320)...
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WO/2011/011278 |
An exit window (15) can include an exit window foil (12), and a support grid (13) contacting and supporting the exit window foil. The support grid can have first and second grids (16, 18), each having respective first and second grid por...
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WO/2011/011049 |
Accelerated charged particles are provided by inductive amplification of particle energy in connection with a deflagration-mode plasma discharge. The deflagration mode discharge tends to increase particle energy relative to other operati...
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WO/2011/006799 |
The application concerns a target backing tube for a rotatable cylindrical target assembly (120) comprising : a tube (122a) for at least one target element (126a) to be disposed there around, wherein the tube has an exterior surface adap...
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WO/2011/006588 |
The invention relates to a device for preventing parasitic oscillations in electron beam tubes, comprising a beam tunnel (2) having a static magnetic field present in an axial manner and ceramic and metal rings (12, 13) arranged in an al...
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WO/2011/009065 |
One embodiment relates to a charged-particle energy analyzer apparatus. A first mesh is arranged to receive the charged particles on a first side and pass the charged particles to a second side, and a first electrode is arranged such tha...
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WO/2011/006802 |
A target backing tube is described. The target backing tube is for a rotatable target and includes a tube adapted for one or more non-bonded target cylinders to be disposed around the tube, the tube having an exterior surface adapted to ...
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WO/2011/008288 |
An apparatus is provided for reducing particle contamination in an ion implantation system. The apparatus has an enclosure (250) having an entrance (260), an exit (262), and at least one louvered side (264) having a plurality of louvers ...
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WO/2011/007492 |
A charged particle beam device is equipped with a function of: obtaining an approximation function of a sample drift from a visual field shift amount among a plurality of images (S1); capturing a save image while correcting the drift on ...
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WO/2011/006801 |
The present application concerns a target backing tube (122) for a rotatable cylindrical target assembly (120) comprising: a tube (122) for at least one target element (126) to be disposed there around, wherein the tube has an exterior s...
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WO/2011/007517 |
In order to perform specimen charge measurement or focusing at high speed and with high accuracy even on a specimen in which fixed charge and induced charge may be mixedly present, provided is a specimen potential measuring method charac...
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WO/2011/008413 |
A hydrogen ion implanter for the exfoliation of silicon from silicon wafers uses a large scan wheel (14) carrying 50+ wafers around its periphery and rotating about an axis. In one embodiment, the axis of rotation of the wheel is fixed a...
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WO/2011/007546 |
Provided is an ion-beam generating device that can achieve high-precision uniformity in substrate processing, and reduction in power consumption, without having a substrate-rotating mechanism installed. The ion-beam generating device (1a...
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WO/2011/007516 |
A panorama image synthesis technique is a technique in which an evaluation point (EP) covering a wide-range area of a semiconductor pattern is divided into a plurality of segmental evaluation points (SEPs) and a group of images of the SE...
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WO/2011/009065 |
One embodiment relates to a charged-particle energy analyzer apparatus. A first mesh is arranged to receive the charged particles on a first side and pass the charged particles to a second side, and a first electrode is arranged such tha...
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WO/2011/005469 |
Disclosed are devices, systems, and methods are disclosed that include: (a) a first material layer positioned on a first surface of a support structure and configured to generate secondary electrons in response to incident charged partic...
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WO/2011/005469 |
Disclosed are devices, systems, and methods are disclosed that include: (a) a first material layer (110) positioned on a first surface of a support structure (108) and configured to generate secondary electrons in response to incident ch...
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WO/2011/006109 |
A microwave charged particle source is provided according to various embodiments of the invention. The microwave charged particle source can include a coaxial antenna for generating microwaves and a dielectric layer surrounding the anten...
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WO/2011/005277 |
A method for creating a protective layer over a surface of an object comprising aluminum and magnesium for use in a semiconductor processing system, which includes oxidizing the surface of the object using a plasma electrolytic oxidation...
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