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Matches 401 - 450 out of 66,307

Document Document Title
WO/2019/060030A1
Embodiments described herein generally relate to plasma assisted or plasma enhanced processing chambers. More specifically, embodiments herein relate to electrostatic chucking (ESC) substrate supports configured to provide pulsed DC volt...  
WO/2019/057644A1
A charged particle beam apparatus includes a beamlet forming unit configured to form and scan an array of beamlets (410) on a sample (440). A first portion of the array of beamlets is focused onto a focus plane (430), and a second portio...  
WO/2019/057734A1
The invention relates to a device (1) for treating a product (2) with microwaves, the device (1) comprising a treatment chamber (13) in which the product (2) can be arranged, and a microwave-radiating device arranged in the treatment cha...  
WO/2019/057662A1
The invention relates to a device (1) for treating a product (2) with microwaves, the device (1) having a treatment chamber (15), in which the product (2) can be conveyed along a transport track (13) in a transport direction (14) through...  
WO/2019/060029A1
Embodiments described herein generally relate to plasma assisted or plasma enhanced processing chambers. More specifically, embodiments herein relate to electrostatic chucking (ESC) substrate supports configured to provide pulsed DC volt...  
WO/2019/053871A1
The purpose of the present invention is to provide a technology to reduce a phenomenon in which sample-derived fine particles flicked by ion beam irradiation re-adhere to an ion milling surface. This ion milling device enables a reductio...  
WO/2019/055467A1
An RF feedthrough has an electrically insulative cone that is hollow having first and second openings at first and second ends having first and second diameters. The first diameter is larger than the second diameter, defining a tapered s...  
WO/2019/054635A1
The present invention relates to a technology for increasing the reliability of measurement by preventing the contamination of a self-plasma chamber provided in order to monitor a deposition operation performed in a process chamber, and ...  
WO/2019/053173A1
Systems and methods for implementing a detector array are disclosed. According to certain embodiments, a substrate comprises a plurality of sensing elements (501-503) including a first element (502) and a second element (503), and a swit...  
WO/2019/055193A1
An apparatus and method for determining the health of a plasma system by igniting a plasma within a plasma confining volume generate an ignition signal with an ignition circuit and apply the ignition signal between a biased region and a ...  
WO/2019/053174A1
Systems and methods for implementing a detector array (600) are disclosed. According to certain embodiments, a substrate (600) comprises a plurality of sensing elements (611-613) including a first element (611) and a second element (612)...  
WO/2019/054111A1
The present invention provides a technique for suppressing an abnormal electric discharge inside an ion generation container from an ion source, which is caused by an insulation film originating from by-products when an ionization gas an...  
WO/2019/055967A1
A system and method is provided maintaining a temperature of a workpiece during an implantation of ions in an ion implantation system, where the ion implantation system is characterized with a predetermined set of parameters. A heated ch...  
WO/2019/055162A1
A pedestal assembly for use in a plasma processing apparatus for processing a substrate includes a baseplate. The pedestal assembly can further include a puck configured to support a substrate. The pedestal assembly can further include a...  
WO/2019/053310A1
The invention relates to a remote plasma-enhanced chemical vapour deposition device and to a method for producing same, said device (11) comprising a tube (13) surrounded by an electric radio-frequency coil (14) for transforming a supply...  
WO/2019/048670A1
The invention relates to a gas inlet element (2) for a CVD or PVD reactor (1) having a base plate (7), the broad side (7') of which is adjacent to an edge (18) on a narrow side (7''), having a plurality of gas outlet openings (16, 16''),...  
WO/2019/050663A1
An apparatus may include an electrode system, the electrode system comprising a plurality of electrodes to guide an ion beam from an entrance aperture to an exit aperture, and a voltage supply to apply a plurality of voltages to the elec...  
WO/2019/050809A1
A thermal choke rod connecting a radio frequency source to a substrate support of a plasma processing system includes a tubular member having a first connector for connecting to an RF rod coupled to the substrate support and a second con...  
WO/2019/049260A1
In the present invention, a charged particle beam device uses an optical system with a lens, and because of this optical system, an image distortion occurs in a sample structure 53, an image of which is formed within an observation visua...  
WO/2019/048293A1
Disclosed herein is an apparatus comprising: a source configured to emit charged particles, an optical system and a stage; wherein the stage is configured to support a sample thereon and configured to move the sample by a first distance ...  
WO/2019/048497A1
The present invention relates to an ion beam generator (10), including an emission electrode (12), an extraction electrode (14), and an electricity generator (16). The emission electrode comprises a substrate (20) and a plurality of nano...  
WO/2019/049261A1
In order to provide an electron gun, wherein the spot diameter of a beam converged on a sample can be maintained small even if a probe current applied to the sample is increased, a magnetic field generation source (301) is provided with ...  
WO/2019/043129A1
A system (1) is disclosed, comprising a gas source (2), a rotor (3), at least one positioning device (4) and a target holder (13). The gas source is configured to provide a source jet of gas (5) towards the rotor. The rotor is configured...  
WO/2019/046305A1
A single input multiple output plasma control system includes a splitter that receives a single input and generates multiple outputs. Each output from the splitter is provided to a load. The splitter includes branch circuits connected be...  
WO/2019/046093A1
Systems and methods for increasing peak ion energy with a low angular spread of ions are described. In one of the systems, multiple radio frequency (RF) generators that are coupled to an upper electrode associated with a plasma chamber a...  
WO/2019/046453A1
Implementations of the present disclosure generally relate to an improved vacuum processing system. In one implementation, the vacuum processing system includes a first transfer chamber coupling to at least one vapor phase epitaxy proces...  
WO/2019/043946A1
The present invention provides a charged particle beam device that can efficiently reduce the effects of a residual magnetic field when SEM observation is carried out. This charged particle beam device executes at least one of the follow...  
WO/2019/045276A1
The present invention provides a sputtering cathode and a sputtering device for forming high-density plasma for increasing the strength of a magnetic field formed on one surface of a sputtering target. One embodiment of the present inven...  
WO/2019/042179A1
The present invention provides a lower electrode assembly and a process chamber. The lower electrode assembly comprises a base and an insulation ring disposed between the base and a chamber bottom wall. The insulation ring can form an eq...  
WO/2019/043759A1
The present invention allows lowering the stability requirement for the power source necessary to operate a winding-type aberration corrector. This allows using more reasonably priced power source, thereby reducing equipment cost. A mult...  
WO/2019/043204A1
An electron beam apparatus includes an electron optics system to generate an electron beam, an object table to hold the specimen at a target position so that a target portion of the specimen is irradiated by the electron beam, and a posi...  
WO/2019/042905A1
An e-beam inspection tool is disclosed, the tool comprising: an electron optics system configured to generate an electron beam; an object table configured to hold a specimen; a positioning device configured to position the object table, ...  
WO/2018/175647A9
A composite assembly of a relatively inexpensive ceramic, such as alumina, with a skin, or covering, of a high wear ceramic, such as sapphire, adapted to be used in semiconductor processing environments subjected to high levels of corros...  
WO/2019/043945A1
The present invention achieves, with a simple configuration, a complex charged particle beam device that can reduce leakage magnet-field from a magnetic pole piece constituting an objective lens of a SEM. This charged particle beam devic...  
WO/2019/038966A1
This charged particle beam generator is provided with: an ion source 2; an extraction electrode system 5; an electrostatic lens 7 that converges extraction beams 14; a linear accelerator 9 that accelerates the extraction beams 14; a beam...  
WO/2019/038531A1
An apparatus (lb) and method of depleting a plasma of electrons in a plasma coating apparatus is disclosed. The invention involves generating a plasma comprising ions (9), particulate material (5) and electrons (6) adjacent a target (4);...  
WO/2019/037872A1
An apparatus (100) for transportation of a carrier (10) in a vacuum chamber (101) is provided. The apparatus (100) includes a first transport system (112) configured to contactlessly transport the carrier along a first transport path (T1...  
WO/2019/040519A1
Embodiments include a vacuum device, comprising: an enclosure configured to enclose a vacuum, the enclosure including an external base and an internal base within the enclosure. The external base may include an opening. The external base...  
WO/2019/038327A1
The invention describes a device for providing a vacuum on different vacuum units, more particularly a treatment device for substrates, more particularly semiconductor substrates and substrates for photovoltaics. The invention further de...  
WO/2019/038382A1
During a pre -treat process, hydrogen plasma is used to remove contaminants (e.g., oxygen, carbon) from a surface of a wafer. The hydrogen plasma may be injected into the plasma chamber via an elongated injector nozzle. Using such elonga...  
WO/2019/040554A1
A novel method, composition and system for using antimony-containing dopant materials are provided. The composition is selected with sufficient vapor pressure to flow into an arc chamber as part of an ion implant process. The antimony-co...  
WO/2019/038883A1
In order to achieve a charged particle beam device with which energy of secondary charged particles can be easily discriminated, this charged particle beam device has: a charged particle source 2; a specimen stage 14 on which a specimen ...  
WO/2019/037873A1
An assembly (100) for lifting or lowering a carrier (10) in a vacuum chamber is provided. The assembly (100) includes a carrier support (20) that is movable in an upward or downward direction, and a holding device (30) configured to cont...  
WO/2019/038917A1
In order to achieve a correction sample and an electron beam adjustment method and an electron beam device using the correction sample, with which a high-precision measurement of an incident angle can be performed, this correction sample...  
WO/2019/038841A1
The present invention quantitatively evaluates a crystal growth amount by nondestructive inspection in a wide area from an undergrowth state to an overgrowth state. According the present invention, a plurality of image feature amounts ar...  
WO/2019/035135A1
A method is provided for treating an implant in a medical care center prior to using the implant in a medical procedure. The method comprises applying a plasma- generating electromagnetic (EM) field using at least one electrode so as to ...  
WO/2019/034873A1
A substrate mount for a plasma processing apparatus comprising: a frame; an aperture within the frame, configured to accommodate an insert, the insert being configured to support a substrate for processing by the plasma processing appara...  
WO/2019/033878A1
Provided in the present invention are a liner, a reaction chamber and semiconductor processing equipment, the liner being disposed in the reaction chamber, and comprising: a liner main body, surroundingly disposed at an inner side of a s...  
WO/2019/036136A1
A magnet bar assembly for a rotary target cathode comprises a support structure, a magnet bar structure movably attached to the support structure and including a plurality of magnets, and a positioning mechanism operatively coupled to th...  
WO/2019/010312A4
A generator produces output such as delivered power, voltage, current, forward power etc. that follows a prescribed pattern of output versus time where the pattern repeats with a repetition period by controlling sections of the pattern b...  

Matches 401 - 450 out of 66,307