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WO/2018/225563A1 |
Provided are: a radiation detector which has improved detection efficiency of radiation by being increased in the portion where radiation is able to be detected; and a radiation detection device. A radiation detector (1) according to the...
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WO/2018/226275A1 |
Plasma strip tools with process uniformity control are provided. In one example implementation, a plasma processing apparatus includes a processing chamber. The apparatus includes a first pedestal in the processing chamber operable to su...
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WO/2018/226574A1 |
An ion implantation system is provided having an ion source configured to form an ion beam from aluminum iodide. A beamline assembly selectively transports the ion beam to an end station configured to accept the ion beam for implantation...
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WO/2018/225148A1 |
The device comprises a scanning coil for causing a charged particle beam emitted from a charged particle source to scan over a sample, a scan control unit for controlling the scanning coil, a detector for detecting electrons generated fr...
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WO/2018/225546A1 |
Provided is a technology that provides attenuation while maintaining rigidity of a support member for reducing vibrations of a sample stage, when disturbance such as an environmental sound affects a device and the sample stage is vibrate...
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WO/2018/226683A1 |
Process kits for use in a multi-cathode process chamber are disclosed. Process kits include one or more of a conical shield, rotatable shield, shroud, inner deposition ring, outer deposition ring, or a cover ring. In some embodiments, a ...
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WO/2018/226273A1 |
Plasma processing apparatus for processing a workpiece are provided. In one example embodiment, a plasma processing apparatus for processing workpiece includes a processing chamber, a plasma chamber separated from the processing chamber ...
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WO/2018/226274A1 |
Plasma processing with post plasma gas injection is provided. In one example implementation, a plasma processing apparatus includes a plasma chamber. The apparatus includes a processing chamber separated from the plasma chamber. The proc...
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WO/2018/226276A1 |
Plasma processing apparatus are provided. In one example implementation, a plasma processing apparatus includes a processing chamber. The apparatus includes a pedestal operable to support a workpiece in the processing chamber. The appara...
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WO/2018/226468A1 |
A substrate processing system includes a processing chamber including a substrate support to support a substrate. A coil is arranged around the processing chamber. A first RF source provides first RF power at a first magnitude and a firs...
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WO/2018/226370A1 |
Implementations of the present disclosure generally relate to the fabrication of integrated circuits. More particularly, the implementations described herein provide techniques for deposition of high-density films for patterning applicat...
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WO/2018/224307A1 |
The invention relates to a method for ionizing gaseous samples by means of dielectric barrier discharge and for subsequently analysing the produced sample ions in an analysis appliance, in particular a mass spectrometer or an ion mobilit...
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WO/2018/220067A1 |
The present invention discloses a target assembly which allows safe, fracture-free and economic operation of target materials with low fracture toughness and/or bending strength during arc evaporation processes as well as in sputtering p...
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WO/2018/221636A1 |
The present invention provides an inclination angle amount calculation device used in a charged particle beam device in which a charged particle beam is impinged on the surface of a sample mounted on a sample stand, the inclination angle...
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WO/2018/222430A2 |
A substrate processing system includes a processing chamber. A pedestal is arranged in the processing chamber. An edge coupling ring is arranged adjacent to the pedestal and around a radially outer edge of the substrate. An actuator is c...
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WO/2018/220809A1 |
The present invention makes it possible to detect high-energy signal electrons that pass through the vicinity of an optical axis, e.g., backscattered electrons (BSE) or secondary electrons (SE) in a booster optical system. For this purpo...
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WO/2018/222256A1 |
Embodiments of the present disclosure generally relate to a process chamber for conformal oxidation of high aspect ratio structures. The process chamber includes a liner assembly located in a first side of a chamber body and two pumping ...
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WO/2018/218797A1 |
The present invention provides a plasma reaction device for processing workpieces, the plasma reaction device comprising: an electron beam generating chamber, a filtering device and a process chamber. The electron beam generating chamber...
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WO/2018/223061A1 |
A sanitizing system for sanitizing a laundry sling that is moveable along one or more support rails includes a motor, a cable operatively coupled to the motor, a sanitizing lamp coupled to the cable, and a controller configured to cause ...
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WO/2018/217167A1 |
A cathode structure for cold field electron emission and method of fabricating a single-tip cathode structure for cold field electron emission. The cathode structure comprises a pointed cathode wire; and a graphene-based coating on at le...
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WO/2018/214243A1 |
A bearing base (1) and a pre-cleaning device. The bearing base (1) is used for bearing a workpiece to be processed (2); a first recessed portion (11) is formed on the bearing base (1); the workpiece to be processed (2) can be received in...
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WO/2018/215263A1 |
The invention relates to a high frequency amplifier arrangement (1) comprising: a) an amplifier part (2), which has an output (100) having two output connections (101,102), b) a balun transformer (7), which has an input (105) having two ...
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WO/2018/214332A1 |
Disclosed are a process chamber and a semiconductor processing apparatus. The process chamber comprises: a chamber body (1), an upper electrode plate (3), a heat source (13) arranged at the top in the chamber body, and a substrate (2) ar...
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WO/2018/217583A1 |
A pedestal assembly for a plasma processing system is provided. The assembly includes a pedestal with central top surface, e.g., mesa, and the central top surface extends from a center of the central top surface to an outer diameter of t...
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WO/2018/217349A1 |
A radio frequency power system is provided that includes bias modules, a switch, a matching network, and a control module. The bias modules are configured to generate respectively DC bias voltages. The switch is configured to (i) receive...
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WO/2018/215274A1 |
A feedback system (210) for controlling properties of a single layer or multiple layer stack being applied on a substrate (10) by means of a vacuum coating process controlled by a plurality of process controlling means, comprises - at le...
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WO/2018/218021A1 |
Method and apparatus for monitoring and diagnosing gun performance is derived that can determine proper gun operation and if not operating properly diagnose potential causes for abhorrent operation. The voltage produced by the gun is sam...
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WO/2018/210120A1 |
A magnetron driving mechanism comprises a driving assembly, a transmission assembly, a rotating assembly, and a limiting assembly. The driving assembly is used to drive both the rotating assembly and the transmission assembly to rotate c...
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WO/2018/213487A1 |
A system, computer program product and a method for detecting manufacturing process defects, the method may include: obtaining multiple edge measurements of one or more structural elements after a completion of each one of multiple manuf...
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WO/2018/212527A1 |
The present disclosure relates to a plasma device for alleviation of various skin troubles or for skin care, and provides a remote type plasma device wherein a plasma spraying device is separated from the main body thereof and is connect...
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WO/2018/213014A1 |
A system and method relating to determining, by a processing device, a first number of parts waiting to be processed in a subsequent step by a plurality of machines housed in a plurality of buildings interconnected by rails, determining ...
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WO/2018/211081A1 |
An apparatus for patterned processing comprises a source of input gas (2), a source of energy suitable for generating a plasma from the input gas (2) in a plasma region and a grounded sample holder (12) configured for receiving a solid s...
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WO/2018/211369A1 |
An electron microscope system and a method of measuring an aberration of the electron microscope system are disclosed. An aperture filters an electron beam at a diffraction plane of the electron microscope to pass through electrons havin...
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WO/2018/209212A1 |
An automated grid handling apparatus for an electron microscope including a transport module having a multistage shuttle comprising a first shuttle stage having a single degree of freedom of motion and a second shuttle stage having a sin...
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WO/2018/208392A1 |
Embodiments include methods and apparatuses that include a plasma processing tool that includes a plurality of magnets. In one embodiment, a plasma processing tool may comprise a processing chamber and a plurality of modular microwave so...
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WO/2018/208504A1 |
A cylindrical target assembly for use in a physical vapor deposition (PVD) processing chamber for magnetically enhanced sputtering applications. In embodiments disclosed herein, a cylindrical target, disposed around a rotatable backing t...
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WO/2018/206459A1 |
The invention is concerned with a method of monitoring the performance of a cathode of an electron beam melting machine wherein detection means such as a near infrared (NIR) camera is used in combination with the electron beam of the mac...
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WO/2018/207309A1 |
The objective of the present invention is to provide a technique allowing gas pressure at a sample position to be measured accurately when observing the sample surface and interior phenomena occurring in a gas space. In this sample holde...
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WO/2018/206100A1 |
A pulsed DC power supply is provided. The pulsed DC power supply is configured for providing unipolar pulsed DC power. The pulsed DC power supply includes a pulsing unit for alternatingly setting a nominal on-cycle DC voltage during on-c...
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WO/2018/209085A1 |
A radio frequency power system includes a master RF generator and an auxiliary RF generator, wherein each generator outputs a respective RF signal. The master RF generator also outputs a RF control signal to the auxiliary RF generator, a...
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WO/2018/202837A1 |
The present invention relates to a method for preparing a hydrogel nanomembrane comprising: a) formation of a non-cross-linked hydrogel nanofllm on a first substrate; b) cross-linking the non-cross-linked hydrogel with a cross-linking ag...
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WO/2018/202584A1 |
The present invention relates to an electrode pair for generating a linear plasma wherein the electrodes (21, 22) are segmented. More particularly, the present invention relates to a plasma source, for instance a hollow-cathode plasma so...
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WO/2018/201529A1 |
The invention discloses dry etching equipment (100) and an electrode of the dry etching equipment. The electrode of the dry etching equipment comprises: an electrode plate (121), a stop ring (113) and a partition board (114). A component...
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WO/2018/203271A1 |
The invention relates to a substrate treatment system with at least one substrate carrier carrying at least one plate-like substrate and comprising at least one dielectric region, wherein a front side of the dielectric region is opposite...
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WO/2018/204570A1 |
The invention provides a sputter deposition assembly that includes a sputtering chamber, a sputtering target, and a magnet assembly. The magnet assembly includes a magnetic backing plate comprising an elongated flexible magnetic control ...
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WO/2018/202656A1 |
A process for depositing a lithium cobalt oxide-based thin film on a substrate in which the Li-stoichiometry (LixCoO2) can be tuned within the limits 0.5≤ x≤1.1 using a standard stoichiometric LiCoO2 target material combined with a s...
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WO/2018/203936A1 |
Performance of a multi-electron-beam system can be improved by reducing Coulomb effects in the illumination path of a multi-beam inspection system. A beam-limiting aperture with multiple holes can be positioned between an electron beam s...
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WO/2018/197959A1 |
A system and method involve applying an electron beam to a sample and obtaining an image of the sample with the applied electron beam. An orientation of the sample relative to the sample's zone axis is automatically determined based on a...
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WO/2018/200409A1 |
A plasma reactor includes a chamber body having an interior space that provides a plasma chamber, a gas distributor to deliver a processing gas to the plasma chamber, a pump coupled to the plasma chamber to evacuate the chamber, a workpi...
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WO/2018/199373A1 |
The present invention provides a harmful gas processing facility using microwave plasma, comprising: a microwave generation unit; a microwave transmission unit for transmitting and supplying microwaves generated in the microwave generati...
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