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WO/2012/014373 |
This charged particle beam device comprises: a beam scan scheduling means (120), for scheduling a beam scan on the basis of an inputted scan condition; and a programmable sequencer (109) that carries out a beam scan control according to ...
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WO/2012/014356 |
Beforehand, the device characteristic parameters of each critical dimension SEM are measured, the cross-sectional shapes of an object to undergo dimension measurements are estimated by a model-based library (MBL) matching system, dimensi...
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WO/2012/014665 |
Disclosed is a scanning transmission electron microscope in which an aberration corrector is mounted and in which positional alignment of the convergence aperture onto the centre of the optical axis can be performed automatically irrespe...
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WO/2012/016055 |
An improved cryogenic specimen holder for imaging and analysis facilitates imaging at very high tilt angles with a large field of view. A retractable specimen holder tip protects the specimen during transport. An optimized Dewar design i...
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WO/2012/015474 |
A glitch duration threshold is determined based on an allowable dose uniformity, a number of passes of a workpiece through an ion beam, a translation velocity, and a beam size. A beam dropout checking routine repeatedly measures beam cur...
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WO/2012/014363 |
The present invention relates to a device (303) for setting image acquisition conditions for charged particle beam devices or the like. An image integration unit (402) forms a plurality of images with a number of different integrations (...
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WO/2012/016198 |
A charged particle beam device includes an electron source structured to generate an electron beam, the electron source being coupled to an electron column that at least partially houses a system structured to direct the electron beam to...
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WO/2012/014870 |
To provide an aberration correction device and a charged particle beam device employing same that are jointly usable with a tunneling electron microscope (TEM) and a scanning tunneling electron microscope (STEM), an aberration correction...
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WO/2012/014371 |
Provided is a stage apparatus, wherein fluctuation in speed is reduced when a stage with a sample mounted thereon is moved at low speed, so that an image to be observed can be moved at constant speed when conducting an observation under ...
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WO/2012/014370 |
In accelerating tubes that use conductive insulators, the dopant density on the surface becomes non-uniform, which may make the surface resistance of the conductive insulator non-uniform. The problem addressed by the present invention is...
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WO/2012/014362 |
The objective of the present invention is to provide a charged particle beam device such that a tip part can be effectually maintained in a clean state, while the frequency of valve body replacements is also reduced. To achieve the objec...
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WO/2012/010374 |
The invention relates to a method for quenching arcs in a gas discharge chamber (5), in which power is fed to a gas discharge chamber (5) and in which, both when there is a flow of current in a first direction and when there is a flow of...
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WO/2012/012523 |
A plasma process uniformity control apparatus comprises a plasma chamber defined by chamber walls and a plurality of magnetic elements (150) disposed on the outside of the chamber wails. Each of the plurality of magnets is configured to ...
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WO/2012/008091 |
Recently, size reduction and high integration are progressing in semiconductor manufacturing processes, so cases are increasing in which sites to be reviewed are closely spaced. The problem in such cases is that if a review is performed ...
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WO/2012/008096 |
The present invention provides a charged particle beam device that prevents process problems arising from defects being overlooked or other deterioration in review performance from being magnified by detecting potentials for malfunctions...
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WO/2012/007602 |
The invention relates to a method for manufacturing nanoneedles in areas of interest located inside solid samples on the nanometre scale. The method relates to FIB sample preparation for analysis of said sample using any technique, in wh...
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WO/2012/007165 |
The method for the plasma treatment of a flat substrate, wherein the substrate is arranged between an electrode and a planar supporting surface which is assigned to a counterelectrode, and thereby has its front side facing the electrode ...
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WO/2012/008089 |
Disclosed is a mass spectrometry, whereby an organic minute foreign material that causes a failure of a device and the like can be analyzed at high sensitivity in an SEM, said organic minute foreign material being approximately several Î...
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WO/2012/008836 |
An inspection apparatus is provided comprising in combination at least an optical microscope and an ion- or electron microscope equipped with a source for emitting a primary beam of radiation to a sample in a sample holder. The apparatus...
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WO/2012/007256 |
The disclosure relates to a magnet arrangement (800, 900, 1000) for a sputtering system, wherein the magnet arrangement is adapted for a rotatable target (126a, 126b) of a sputtering system and includes: a first magnet element (810, 910,...
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WO/2012/008512 |
Disclosed is image processing: that significantly reduces false images and missing images in reconstructed images, and improves reconstruction accuracy; and that can be applied to objects to be observed that are composed of a plurality o...
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WO/2012/009543 |
A scanning confocal transmission electron microscope includes a descan deflector and a corrector below the sample. The microscope uses a detector that is preferably significantly larger than the resolution of the microscope and is positi...
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WO/2012/007483 |
Plasma processing in a capacitively-coupled reactor with trapezoidal- waveform excitation. The invention concerns a method for exciting at least one electrode of a capacitively coupled reactive plasma reactor containing a substrate. The ...
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WO/2012/004495 |
Method for treating at least one surface of a part made of a bulk polymer into which multi-energy ions X+ and X2+ are implanted simultaneously, where X is the atomic symbol chosen from the list consisting of helium (He), nitrogen (N), ox...
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WO/2012/005056 |
Disclosed is a scanning transmission type electron microscope provided with: an aberration corrector (805) for correcting the aberration of an electron optical system that irradiates electron beams to a sample (808); detectors (813, 814)...
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WO/2012/004175 |
A continuous plasma treatment process, said process comprising the steps of: providing a plasma treatment apparatus, said apparatus comprising at least one plasma treatment zone, said plasma treatment zone comprising a pair of electrodes...
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WO/2012/003994 |
A magnetron sputtering apparatus comprises, within a vacuum chamber (1), a substrate support (2) holding a substrate (3) with an upward- facing plane substrate surface (4) which is to be coated. The substrate (3) may be a disk of, e.g., ...
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WO/2012/006558 |
A charged particle beam system for processing substrates is disclosed, comprising a charged particle column, combination infrared radiation and visible light illumination and imaging subsystems, in-vacuum optics, and a precision stage fo...
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WO/2012/005232 |
Disclosed is a technology that can remove a minimum but sufficient amount of a damaged layer of a sample piece generated during FIB processing. Specifically disclosed is a charged particle beam device comprising: a first element ion beam...
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WO/2012/006168 |
Glitches during ion implantation of a workpiece, such as a solar cell, can be compensated for. In one instance, a workpiece is implanted during a first pass at a First speed. This first pass results in a region of uneven dose in the work...
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WO/2012/001330 |
The invention relates to a method for the surface treatment of a fluid product dispensing device. The method comprises a step in which at least one surface to be treated of at least one part of the device is subjected to ion implantation...
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WO/2012/003327 |
An ion implantation system (200) and method are disclosed in which glitches in voltage are minimised by modifications to the power system of the implanter. These power supply modifications include faster response time, output filtering, ...
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WO/2012/001883 |
Provided is an electron beam scanning method for forming an electric field for appropriately guiding electrons emitted from a pattern to the outside of the pattern, and also provided is a scanning electronic microscope. When an electron ...
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WO/2012/003154 |
A system and method are disclosed for controlling an ion beam. A deceleration lens (7000) is disclosed for use in an ion implanter. The lens may include a suppression electrode (102), first and second focus electrodes, and first and seco...
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WO/2012/001326 |
The invention relates to a method for treating a surface of a device for dispensing a fluid product, said method including a step of modifying, by ion implantation using beams of ions having multiple charge states and multiple energy sta...
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WO/2012/003339 |
A control apparatus for plasma immersion ion implantation of a dielectric substrate which includes an electrode disposed above a generated plasma in a plasma chamber. The electrode is biased with negative voltage pulses at a potential th...
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WO/2012/003445 |
A plasma processing tool comprises a plasma chamber configured to generate a plasma from a gas introduced into the chamber where the generated plasma has an electron plasma frequency. A plurality of electrodes disposed within the chamber...
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WO/2012/001325 |
The invention relates to a method for the surface treatment of a fluid product dispensing device. The method comprises a step in which at least one surface to be treated of at least one part of the device in contact with the fluid produc...
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WO/2012/001876 |
In order to provide a computer program, an image processing device, and a pattern matching method that perform pattern matching at a high level of accuracy without relying on edge deformation, contrast fluctuations, etc., in one embodime...
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WO/2012/001321 |
The invention relates to a method for treating an elastomeric surface of a device for dispensing a fluid product, said method including a step of modifying, by ion implantation using beams of ions having multiple charge states and multip...
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WO/2012/001328 |
The invention relates to a method for the surface treatment of a fluid product dispensing device. The method comprises a step in which at least one surface to be treated of at least one part of the device in contact with the fluid produc...
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WO/2011/163488 |
An improved method of processing substrates, such as to create solar cells, is disclosed. The use of shadow masks may cause alignment errors associated with the differing thermal expansion characteristics of the shadow mask and the subst...
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WO/2011/160990 |
The invention relates to an apparatus (20) for structuring solid surfaces (18) using ion beams (141) from an ion beam spectrum (14), wherein the ion beam spectrum (14) has ions having different charge states and different masses. The app...
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WO/2011/162325 |
A sample stage device (10) is configured such that ideal position information items xtg(i), tg(i) in each predetermined cycle, at which gaps (25, 26) and the like do not affect driving conditions, are calculated and the deviations dx(i),...
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WO/2011/162813 |
A bimetallic rotary target formed of a first metal and a second metal for use in a sputtering apparatus. The rotary target including a target tube having a plurality of grooves or apertures formed therein. An insert being positionable wi...
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WO/2011/160749 |
The invention relates to a method for coating a surface (1) of a carrier material (2) with molecules (5, 6), said molecules (5, 6) being transferred from a molecular store (3, 4) into a gaseous state and ionised, the electrically charged...
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WO/2011/158579 |
Provided is an objective lens system and electron microscope capable of specimen observation using an electron beam accelerated to an ultra-high voltage state, even without using a direct current ultra-high voltage source, a direct curre...
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WO/2011/158739 |
Provided is a charged particle device that prevents the influence of vibrations without narrowing the movement range of a specimen stage and can control the mutual displacement of a charged particle generation unit and the specimen stage...
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WO/2011/156877 |
The present invention aims at supplying a plasma processing device (100) of planar hollow cathodes (3,4) that generates plasma (9) by means of an electric arc in radiofrequency regime where a magnetic field (6) provided by a rotary magne...
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WO/2011/157425 |
An apparatus (10) for the continuous plasma treatment and/or plasma coating of an, in particular, web- or plate-like piece (12) of material comprises at least one barrier electrode (13) which is arranged on one side (14) of the piece (12...
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