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Matches 1 - 50 out of 66,076

Document Document Title
WO/2019/212799A1
Embodiments of the present disclosure generally relate to substrate supports for process chambers and RF grounding configurations for use therewith. Methods of grounding RF current are also described. A chamber body at least partially de...  
WO/2019/211072A1
An improved source conversion unit of a charged particle beam apparatus is disclosed. The source conversion unit comprises a first micro-structure array including a plurality of micro- structures. The plurality of micro-structures is gro...  
WO/2019/212741A1
Embodiments disclosed herein include an abatement system and method for abating compounds produced in semiconductor processes. The abatement system includes a remote plasma source for generating an oxidizing plasma for treating exhaust g...  
WO/2019/210891A1
The present invention resides in the unifying idea of ‚Äč‚Äčsynchronizing a positive voltage pulse (U+) supplied to an electrically conductive or ferromagnetic tube (21) and a exciting negative voltage pulse (UC) on a hollow cathode (14)...  
WO/2019/213301A2
The present disclosure provides a method to adjust asymmetric velocity of a scan in a scanning ion beam etch process to correct asymmetry of etching between the inboard side and the outboard side of device structures on a wafer, while ma...  
WO/2019/211305A1
The present invention relates to a transmission electron microscope (100; 200) comprising: - a column (102) defining an object chamber (104), - at least one ballistic material jet source (110, 202, 204, 300, 400, 500): - outside said obj...  
WO/2019/211123A1
An e-beam apparatus is disclosed, the tool comprising an electron optics system (500) configured to project an e-beam onto an object, an object table to hold the object, and a positioning device (510) configured to move the object table ...  
WO/2019/213258A1
Described herein are technologies related to a radical source with a housing that includes a plasma cavity that is designed to contain a plasma created by a plasma generator. The housing has at least one gas injector designed to inject p...  
WO/2019/213664A1
Introduced here is a plasma polymerization apparatus and process. Example embodiments include a vacuum chamber in a substantially symmetrical shape to a central axis. A rotation rack may be operable to rotate about the central axis of th...  
WO/2019/207668A1
The purpose of the present disclosure is to propose a charged particle beam device capable of allowing specifying of a distance between impingement points for a pulsed beam and an interval between impingement points. Proposed is a charge...  
WO/2019/205337A1
An isolation device of a precipitation chamber, used for separating an inner cavity and outer cavity of the precipitation chamber, the isolation device comprising a separation plate mechanism (1) used for sealing the inner chamber, and t...  
WO/2019/206135A1
Disclosed are a method, a device, and equipment for radiofrequency impedance matching, comprising: S110, a frequency sweep matching phase; and S120, a frequency sweep holding phase. S110 comprises the loop execution of the following step...  
WO/2019/205339A1
Provided in the present invention are a lower electrode and a dry etching machine, comprising a base layer, a loading layer, and a bolt, the lower electrode comprising a sealing member, and the sealing member comprising a sealing member ...  
WO/2019/207707A1
In order to improve secondary particle detection efficiency without making a charged particle beam device large in size, the present invention is a charged particle beam device provided with: a charged particle beam source that radiates ...  
WO/2019/201517A1
Vacuum arc source for arc evaporation of Boride, comprising: - a cathode (1) made of at least 90 at-% of Boride, in particular made of more than 98 at-% of Boride - an anode (5), which is preferably in the shape of a disk - a body (2) ma...  
WO/2019/201544A1
Detectors and detection systems are disclosed. According to certain embodiments, a detector comprises a substrate comprising a plurality of sensing elements including a first sensing element (402) and a second sensing element (403), wher...  
WO/2019/204820A1
A scanning microscope multiplexes illumination light beams at different optical wavelengths (e.g., from different light sources) by placing illumination light beams non-coaxially to create separate focuses at specimen. Reflected or fluor...  
WO/2019/203603A1
The present invention relates to a substrate treatment device comprising: a chamber; a first electrode disposed on the top of the chamber; a second electrode disposed on the bottom of the first electrode and including a plurality of open...  
WO/2019/204230A1
An apparatus for distributing plasma products includes first and second electrodes that each include planar surfaces. The first electrode forms first apertures from a first planar surface to a second planar surface; the second electrode ...  
WO/2019/202011A1
The invention relates to a plasma cleaning apparatus comprising a container defining an ionisation chamber provided with an opening, a shielding container shielding the container defining the ionisation chamber provided with an opening, ...  
WO/2019/204110A1
Methods and apparatus for reducing leakage of microwaves at a slit valve of a process chamber. A multi-frequency resonant choke around the slit valve prevents microwave energy from a band of frequencies from escaping from the slit valve....  
WO/2019/204640A1
A power supply system controls the source impedance of a generator in real time utilizing two amplifiers having asymmetrical power profiles in reference to a nominal load impedance that are diametrically opposite in reference to the nomi...  
WO/2019/201724A1
The present invention relates to a composite body consisting of a first part and a second part, and also a transitional zone, which is located between a surface or a region of a surface of the first part and a surface or a region of a su...  
WO/2019/199648A1
Plasma source assemblies, gas distribution assemblies including the plasma source assembly and methods of generating plasma are described. The plasma source assemblies include a powered electrode with a ground electrode adjacent a first ...  
WO/2019/199764A1
Embodiments of the present disclosure generally relate to semiconductor processing apparatus. More specifically, embodiments of the disclosure relate to an ICP process chamber. The ICP process chamber includes a chamber body and a lid di...  
WO/2019/199635A1
Multiple harmonic frequency components are used for plasma excitation in a plasma process. Relative amplitude and/or phase shift between the different frequency components is controlled so as to provide desired ion energy plasma properti...  
WO/2019/197512A1
An assembly for use in a physical vapour deposition process, the assembly comprising: a filter having a body including a plurality of apertures therethrough; and a shield configurable to selectively cover a subset of the plurality of ape...  
WO/2019/199682A1
Methods and apparatuses for modifying a wafer surface using an organosilicon precursor are provided herein. The wafer surface is dosed with the organosilicon precursor following deposition of a dielectric material by an atomic layer depo...  
WO/2019/199620A1
Gas distribution modules comprising a housing with an upper plenum and a lower plenum are described. One of the upper plenum and lower plenum is in fluid communication with an inlet and the other is in fluid communication with an outlet....  
WO/2019/193624A1
An electron gun (1) projects an electron beam, and a camera with a scintillator detects a signal generated from a sample due to the irradiation of the electron beam and acquires a transmission image. A current reading terminal measures a...  
WO/2019/194970A1
A method, system, and apparatus for reducing particle generation on a showerhead during an ion bombarding process in a process chamber are provided. First and second RF signals are supplied from an RF generator to an electrode embedded i...  
WO/2019/194305A1
A scanning electron microscope system comprising: a primary electron beam radiation means that radiates a primary electron beam at a first pattern on a substrate that has a second pattern formed at a peripheral region of the first patter...  
WO/2019/194540A1
The present invention relates to a plasma dry cleaning device using complex RF frequencies. The present invention comprises: a chuck disposed at a lower end of a chamber and having a substrate on which at least one of silicon, silicon ox...  
WO/2019/193298A1
The invention relates to a device for heating a bed of powder in an additive manufacturing apparatus, characterized in that it comprises: - a plasma generating device (28), said device being capable of being placed and moved above the po...  
WO/2019/195188A1
Embodiments herein provide methods of plasma treating an amorphous silicon layer deposited using a flowable chemical vapor deposition (FCVD) process. In one embodiment, a method of processing a substrate includes plasma treating an amorp...  
WO/2019/192821A1
Detectors and detection systems are disclosed. A substrate comprises a plurality of sensing elements (311-313) including a first plurality of the sensing elements and a second plurality of the sensing elements, and a plurality of section...  
WO/2019/194468A1
The present invention relates to a microwave plasma generator with improved productivity, which can be operated for a long time due to extended maintenance cycles, of a deposition process exhaust gas trap, and to a deposition process exh...  
WO/2019/194304A1
An electron microscope device having: a detection part that detects reflected electrons which have reflected from a sample that has been irradiated with primary electrons emitted from a primary electron generation part (an electron gun);...  
WO/2019/190660A1
A foil liner comprising a plurality of foil layers is disclosed. The foil layers may each be an electrically conductive material that are stacked on top of each other. The spacing between adjacent foil layers may create a thermal gradien...  
WO/2019/186938A1
The invention addresses the problem that, if a charged-particle beam aperture that is shaped as a ring is used, the charged-particle beam portion directly on the optical axis, wherein the electric current density is highest in the charge...  
WO/2019/190967A1
A low dose disinfection and control system that utilizes empirical and theoretical data to compare performance, sensor data, stored patterns, historical usage, use intensity indexes over time and tracking information to provide a sophist...  
WO/2019/186937A1
The invention addresses the problem that, although a spherical surface aberration correction device wherein a circular hole electrode and a ring electrode have been combined is known as a device for correcting a positive spherical aberra...  
WO/2019/185423A1
Method and circuit (1) for igniting a plasma in a plasma chamber (2), wherein the plasma, in the ignited state, can be supplied by a high-frequency power supply (10) via an impedance matching network (7), in particular with an operating ...  
WO/2019/189368A1
This localized vacuum apparatus is provided with: a vacuum forming member which has a pipe passage connectable to an exhaust device, exhausts gas in a space contacting a surface of an object via the pipe passage, and forms a vacuum area;...  
WO/2019/190393A1
The present disclosure relates to a method for forming a doped semiconductor. The method comprises ionising a sputtering gas between a metallic target and a substrate using a pulsed direct current (DC), and bombarding the target with the...  
WO/2019/186736A1
This scanning electron microscope includes a spin detector for measuring the spin polarizations of secondary electrons emitted from a sample and an analysis device for analyzing the measurement data from the spin detector. The analysis d...  
WO/2019/189366A1
A local vacuum device provided with: a vacuum formation member, which has a conduit that can be connected to an exhaust device, and which, through the conduit, exhausts gas in a space in contact with a surface of an object, thereby formi...  
WO/2019/190659A1
An extraction set including an extraction plate, a blocker and the holding mechanism for the blocker is disclosed. The extraction set includes an extraction plate that may be constructed of titanium coated with a ceramic material. The ex...  
WO/2019/189363A1
This charged particle apparatus is provided with: a vacuum forming member which has a pipe passage connectable to an exhaust device and which can form a vacuum area by exhausting gas in a space contacting a surface of an object through t...  
WO/2019/187118A1
This charged-particle beam application device contains a beam separator. The beam separator comprises: a first magnetic pole; a second magnetic pole facing the first magnetic pole; a first electrode and a second electrode extending along...  

Matches 1 - 50 out of 66,076