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WO/2018/167922A1 |
A charged particle beam optical apparatus EX is provided with: a plurality of irradiation optical systems 12 capable of irradiating an object W with charged particle beams EB, respectively; and a first control apparatus 3 that controls a...
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WO/2018/166786A1 |
An embodiment of the invention relates to a method for carrying out a time-resolved interferometric measurement comprising the steps of generating at least two coherent waves, overlapping said at least two coherent waves and producing an...
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WO/2018/167484A1 |
We describe a super-resolution optical microscopy technique in which a sample is located on or adjacent to the planar surface of an aplanatic solid immersion lens and placed in a cryogenic environment.
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WO/2018/169631A1 |
Methods and systems for RF pulse reflection reduction are provided herein. In some embodiments, a method includes (a) receiving a process recipe for processing the substrate that includes a plurality of pulsed RF power waveforms from a p...
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WO/2018/170010A1 |
A method is disclosed for monitoring and controlling a process of plasma-assisted surface modification of a layer formed on a substrate. The method includes flowing a surface modification gas into a plasma processing chamber of a plasma ...
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WO/2018/169927A1 |
An electrical device for electrically measuring a sample during electron microscope imaging includes: a chip through which a slit is defined, the chip having at least one peripheral edge, the slit having an open end at the at least one p...
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WO/2018/167792A1 |
Aspects of the invention may relate to a treatment device and method for providing plasma treatments of lenses. The treatment device for treating a lens, included in an operational device, may include: at least one first electrode locate...
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WO/2018/163240A1 |
A charged particle beam device provided with: a deflection part for deflecting a charged particle beam released from a charged particle source and irradiating a sample with the charged particle beam; a reflection plate for reflecting sec...
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WO/2018/162358A1 |
Systems and methods are provided for evacuating a chamber (101). The evacuation system comprises a cooler (320) coupled with the chamber and a controller (350). The controller is configured to determine whether a property of the cooler o...
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WO/2018/159056A1 |
Provided are an electron source usable stably over a long period of time even if a hexaboride compound is used, and an electron beam device using this electron source. The electron source comprises: a metallic filament (103); a metal tub...
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WO/2018/158422A1 |
The invention relates to an apparatus for generating accelerated electrons, comprising a housing (101), which delimits an evacuable space (102a; 102b) and has an electron exit window (104); an inlet for supplying a working gas into the e...
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WO/2018/158013A1 |
The invention relates to an electrode unit, comprising: a plurality of plasma electrode pairs, which at a specific applied voltage are suited for igniting a plasma between a first plasma electrode and a second plasma electrode of each pl...
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WO/2018/158329A1 |
The invention provides an electron- impact ion source device having high brightness as compared to known Nier-type ion sources, while providing similar advantages in terms of flexibility of the generated ion species, for example. The ion...
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WO/2018/160501A1 |
A high throughput deposition apparatus includes a process chamber, a plurality of targets that form a first closed loop in the process chamber, wherein the first closed loop includes a long dimension defined by at least a first pair of t...
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WO/2018/160688A1 |
A method for imaging a surface of a substrate using a multibeam imaging system includes: modifying an electron beam using a multipole field device; generating beamlets from the electron beam using a beam splitting device having multiple ...
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WO/2018/160554A1 |
Methods and apparatus for boosting ion energies are contemplated herein. In one embodiment, the methods and apparatus comprises a controller, a process chamber with a symmetrical plasma source configured to process a wafer, one or more v...
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WO/2018/153430A1 |
The invention relates to a method for real-time monitoring of a process, comprising: performing a mass spectrometric real-time measurement of a gas mixture (4) generated in the monitored process to determine real-time mass spectrometric ...
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WO/2018/155540A1 |
This electron beam apparatus comprises: an optical system (80) which directs a plurality of light beams onto a photoelectric element (136); and an electron beam optical system (70) which irradiates a wafer (W) with, as a plurality of ele...
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WO/2018/153818A1 |
The invention describes an amplifier circuit for providing an output of at least 100 W, preferably of at least 200 W and most preferably of at least 250 W comprising a field effect transistor (111, 113). A drain of the field effect trans...
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WO/2018/154587A1 |
A control system is presented for use in measuring one or more parameters of a three-dimensional patterned structure. The control system is configured as a computer system comprising a data processor configured to receive and process raw...
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WO/2018/154638A1 |
This charged particle beam device is provided with: a charged particle beam source that emits a primary charged particle beam; an objective lens that focuses the primary charged particle beam on a sample; a path electrode, which is dispo...
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WO/2018/155539A1 |
This electron beam apparatus comprises a projection optical system which directs a plurality of light beams onto a photoelectric element (54), an electron beam optical system (70) which irradiates a wafer (W) with, as a plurality of elec...
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WO/2018/156486A1 |
Systems and methods for tuning to reduce reflected power in multiple states are described. The methods include determining values of one or more parameters of an impedance matching circuit so that reflected power is reduced for multiple ...
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WO/2018/155542A1 |
This electron beam apparatus comprises an optical system (80) which directs a plurality of light beams onto a photoelectric element (136), and an electron beam optical system (70) which irradiates a wafer (W) with, as a plurality of elec...
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WO/2018/152658A1 |
A proton microscope, a wavelength dispersive spectrometer, an energy dispersive spectrometer, and a micro-nano processing platform, which can achieve a proton transmission microscopy function; a proton scanning microscopy function; a pro...
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WO/2018/154800A1 |
A measuring device for irradiating charged particle beams and observing samples, wherein the measuring device is characterized by comprising a particle source for outputting charged particle beams, a lens for focusing the charged particl...
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WO/2018/154705A1 |
The purpose of the present invention is to provide a charged particle beam device which suppresses sample deformation caused by placing a sample on a suctioning surface of an electrostatic chuck mechanism, the sample having a temperature...
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WO/2018/154706A1 |
The objective of the present invention is to provide a charged-particle beam device wherein suppressing the effects of static build-up is compatible with performing high-throughput measurements and examination. In order to achieve this o...
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WO/2018/155537A1 |
This electron beam apparatus comprises an optical device (84) capable of providing a plurality of light beams which can be controlled individually, a projection optical system (86) which directs the plurality of light beams from the opti...
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WO/2018/156452A1 |
Methods and apparatus for processing substrates with a multi-cathode chamber. The multi-cathode chamber includes a shield with a plurality of holes and a plurality of shunts. The shield is rotatable to orient the holes and shunts with a ...
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WO/2018/153856A1 |
A load lock system for charged particle beam imaging with a particle shielding plate (204), a bottom seal plate (202) and a plurality of sensor units (301-303) is provided. The sensor units are located above the wafer, the shield plate i...
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WO/2018/155538A1 |
This electron beam apparatus comprises: an optical device (84) capable of providing a plurality of light beams which can be controlled individually; an illuminating system (82) which can direct illuminating light onto the optical device;...
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WO/2018/155545A1 |
This electron beam apparatus comprises an optical system (80) which directs a plurality of optical beams onto a photoelectric element (54), and an electron beam optical system (70) which irradiates a wafer (W) with, as a plurality of ele...
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WO/2018/155543A1 |
This electron beam apparatus comprises an optical system (80) which directs a plurality of light beams onto a photoelectric element (54), an electron beam optical system (70) which irradiates a wafer (W) with, as a plurality of electron ...
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WO/2018/151920A1 |
A voltage-current sensor enables more accurate measurement of the voltage, current, and phase of RF power that is delivered to high-temperature processing region. The sensor includes a planar body comprised of a non-organic, electrically...
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WO/2018/152142A1 |
Plasma processing apparatus and methods are disclosed. In one example implementation, a plasma processing apparatus can include a processing chamber. The apparatus can include a pedestal located in the processing chamber configured to su...
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WO/2018/149732A1 |
A method and a charged particle beam system for an automated long term processing of a sample by a charged particle beam is disclosed. The charged particle beams system comprises a charged particle source having a tip (20) emitting charg...
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WO/2018/149777A1 |
The invention concerns a lithography process on a sample (2) comprising at least one structure (1) and covered by at least a lower layer (3) of resist and a upper layer (4) of resist the process comprising: thanks to an optical device (8...
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WO/2018/151889A1 |
A substrate support for supporting a substrate within a semiconductor processing chamber is provided. A substrate support body is provided. At least one resistive heating element is embedded in or on the substrate support body comprising...
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WO/2018/150159A1 |
An apparatus for protecting an interior surface of a fusion reactor vessel. The apparatus comprises a power supply operably connected to an electrode for insertion into the vessel. The apparatus supports a solid material within the vesse...
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WO/2018/152126A1 |
Embodiments disclosed herein generally relate to a plasma processing system. The plasma processing system includes a processing chamber, a chamber seasoning system, and a remote plasma cleaning system. The processing chamber has a chambe...
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WO/2018/149894A1 |
The present invention relates to a method for the evaporation of a cathode by means of cathodic arc evaporation, wherein the focal spot of the arc is forced to a predetermined track on the cathode surface by means of temporally and spati...
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WO/2018/148044A2 |
Carbon materials having carbon aggregates, where the aggregates include carbon nanoparticles and no seed particles, are disclosed. In various embodiments, the nanoparticles include graphene, optionally with multi-walled spherical fullere...
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WO/2018/147537A2 |
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WO/2018/146204A1 |
A charge control apparatus for controlling charge on a substrate in a vacuum chamber is described. The apparatus includes a light source emitting a beam of radiation having a divergence; a mirror con figured to reflect the beam of radiat...
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WO/2018/145983A1 |
Systems and methods are provided for charged particle detection. The detection system comprises a signal processing circuit (502) configured to generate a set of intensity gradients based on electron intensity data received from a plural...
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WO/2018/148091A1 |
Embodiments of a tantalum (Ta) target pasting process for deposition chambers using RF powered processes include pasting at least a portion of the inner surfaces of the process chamber with Ta after using RF sputtering to deposit dielect...
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WO/2018/148150A1 |
A scanning electron microscopy (SEM) system includes a plurality of electron-optical columns and a plurality of electron beam sources. The electron beam sources include an emitter including one or more emitter tips configured to generate...
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WO/2018/146804A1 |
The purpose of the invention is to provide a device with which the same field of view is observed with a charged particle beam device and a camera, without increasing the size of a housing. A charged particle beam device according to an ...
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WO/2018/148043A1 |
A processing reactor includes a microwave energy source and a field-enhancing waveguide. The field-enhancing waveguide has a field-enhancing zone between a first cross-sectional area and a second cross-sectional area of the waveguide, an...
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