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Matches 1 - 50 out of 64,493

Document Document Title
WO/2018/128339A1
A plasma generation apparatus according to an embodiment of the present invention includes a plasma generation unit. The plasma generation unit has a spherical or ellipsoidal cavity. The plasma generation unit generates plasma by receivi...  
WO/2018/129379A1
An apparatus and method for processing a workpiece with a beam is described. The apparatus includes a vacuum chamber having a beam-line for forming a particle beam and treating a workpiece with the particle beam, and a scanner for transl...  
WO/2018/128634A1
The present disclosure provides a method for material deposition on a substrate in a vacuum deposition process having a sputtering target is provided. The method includes providing a target temperature of the sputtering target during ope...  
WO/2018/128236A1
Provided is a power supply device for plasma generation which supplies a high frequency signal amplified to have energy for plasma generation, the power supply device comprising: a frequency generator for generating a signal having a fre...  
WO/2018/128235A1
Disclosed is a power supply device for plasma generation, which is a power supply device for plasma generation which supplies a high frequency signal amplified to have energy for plasma generation, the power supply device comprising: a f...  
WO/2018/122003A1
The invention relates to a substrate exposure system comprising a frame, a substrate support module for carrying a substrate, an exposure apparatus for exposing said substrate, and adjustment assembly for adjusting the position of the ex...  
WO/2018/121897A1
In a plasma reactor (1), a pumping compartment (5) is separate from a plasma-treating compartment (7) by a structure which comprises a central frame (57). The frame is suspended to the casing (3) of the reactor via spokes (12). The spoke...  
WO/2018/121603A1
A double-station vacuum processor for use in uniform pumping, which is provided with two vacuum processing chambers (10) which may act as processing reaction chambers, and a shared offset air suction port (20) and vacuum pump which are i...  
WO/2018/122015A1
A method (200) for characterizing a region in a sample under study is described. The sample under study comprising a first region having first crystalline properties and a second region having second crystalline properties. The method (2...  
WO/2018/121898A1
In a capacitive coupled etch reactor, in which the smaller electrode is predominantly etched, the surface of the larger electrode is increased by a body e.g. a plate, which is on the same electric potential as the larger electrode and wh...  
WO/2018/119513A1
An electron beam source is provided that includes a vessel forming a chamber, a cathode disposed within the chamber, the cathode comprising a low dimensional electrically conductive material having an anisotropic restricted thermal condu...  
WO/2018/121896A1
In a capacitively coupled etch reactor, in which the smaller electrode is etched, the larger electrode is electrically supplied by a very high frequency supply signal and by a high frequency supply signal. The smaller electrode, acting a...  
WO/2018/122176A1
The present disclosure proposes an anti-rotation lens and using it as an anti-rotation condenser lens in a multi-beam apparatus with a pre-beamlet-forming mechanism. The anti-rotation condenser lens keeps rotation angles of beamlets unch...  
WO/2018/122953A1
The objective of the invention is to provide an aberration corrector that is low-cost and allows the aberration correction to be performed with a straightforward and highly accurate control and a wide aberration correction range. To this...  
WO/2018/122968A1
The objective of the present invention is to enable the determination of a noise source for a charged particle beam device, which may be the cause of a noise frequency component overlapping with a measurement image. To this end, the char...  
WO/2018/119453A1
An exemplary treatment system can be provided which can include a laser system configured to emit at least one laser beam, and an optical system configured to focus the laser beam(s) to a focal region at a selected distance from a surfac...  
WO/2018/114142A1
A method is provided for forming a three-dimensional article through successively depositing individual layers of powder material that are fused together so as to form the article. The method includes: providing at least one electron bea...  
WO/2018/118263A1
A gas injection system, including an extraction plate having an extraction aperture for allowing passage of an ion beam through the extraction plate, the extraction plate further having a gas slot for expulsion of a residue removal gas f...  
WO/2018/113904A1
According to one aspect of the present disclosure, a sputter deposition source (100, 200) is provided. The sputter deposition source comprises: an array of electrodes (110) having two or more pairs of electrodes, wherein each electrode (...  
WO/2018/118966A1
According to an exemplary embodiment, a surface treatment unit comprises a chamber, a process gas inlet configured to allow process gas to enter the chamber, a first and a second plasma source, and a first RF antenna inductively coupled ...  
WO/2018/115898A1
The present invention relates to a handheld material analyser comprising an air-tight chamber having an analysis aperture; an electron beam generation system adapted to direct a beam of electrons through the analysis aperture; an Energy-...  
WO/2018/111593A1
A sputter trap formed on at least a portion of a sputtering chamber component has a plurality of particles and a particle size distribution plot with at least two different distributions. A method of forming a sputter trap having a parti...  
WO/2018/112463A1
Implementations of the present disclosure provide methods for processing substrates in a processing chamber. In one implementation, the method includes (a) depositing a dielectric layer on a first substrate at a first chamber pressure us...  
WO/2018/107823A1
A magnetic lens is disclosed, which includes: a magnetic yoke (10), an exciting coil (20) and a power supply controlling system (30). The magnetic yoke (10) is at outside of the exciting coil (20) and surrounds the coil (20); the excit...  
WO/2018/108239A1
A method for inspecting a substrate is described. The method includes providing the substrate being a large area substrate in a vacuum chamber, wherein the substrate has a thin-film with a grain structure deposited on the substrate; gene...  
WO/2018/109489A1
A method of charge mitigation in additive layer manufacturing is provided, which uses a charged particle beam (103) to fuse metal powder (122) within a metal powder bed (123) to form a product layer-by-layer, the method comprising using ...  
WO/2018/108432A1
The invention relates to a device, a method and a use for the coating of lenses, wherein the lenses to be coated are arranged in pairs above parallel, tubular targets. The distance of the targets to each other and/or in relation to the l...  
WO/2018/111598A1
Systems and methods for negating an impedance associated with parasitic capacitance are described. One of the systems includes a plasma chamber having a housing. The housing includes a pedestal, a showerhead situated above the pedestal t...  
WO/2018/108240A1
The present disclosure provides an apparatus (100) for holding a substrate (10) in a vacuum deposition process. The apparatus (100) includes a support surface (112), an electrode arrangement (120) having a plurality of electrodes (122) c...  
WO/2018/106386A1
Provided herein are approaches for in-situ plasma cleaning of one or more components of an ion implantation system. In one approach, the component may include a beam-line component, such as an energy purity module, having a plurality of ...  
WO/2018/106761A1
A system and method for imaging a biological sample using a freezable fluid cell system is disclosed. The freezable fluid cell comprises a top chip, a bottom chip, and a spacer to control the thickness of a vitrified biological sample. T...  
WO/2018/104689A1
The invention relates to a modular microwave plasma-assisted deposition reactor (1) for manufacturing synthetic diamond, said reactor being characterised in that it comprises a least three modulating elements, said modulating elements be...  
WO/2018/106833A1
An electron-optical system for performing electron microscopy is disclosed. The system includes an electron beam source configured to generate a primary electron beam. The system includes a source lens, a condenser lens and an objective ...  
WO/2018/106955A1
Thermal atomic layer etching processes are disclosed. In some embodiments, the methods comprise at least one etch cycle in which the substrate is alternately and sequentially exposed to a first vapor phase halide reactant and a second va...  
WO/2018/106407A1
Embodiments of the present disclosure generally relate to abatement for semiconductor processing equipment. More particularly, embodiments of the present disclosure relate to techniques for foreline solids formation quantification. In on...  
WO/2018/099756A1
A method for inspecting a specimen with an array of primary charged particle beamlets in a charged particle beam device having an optical axis. The method includes generating a primary charged particle beam; illuminating a multi-aperture...  
WO/2018/102088A1
A method for etching an organic carbon based layer below a silicon containing hardmask is provided. An etch gas is provided comprising oxygen and a halogen containing component, and a passivation component, wherein a ratio by volume of t...  
WO/2018/102143A1
A resolving aperture assembly for an ion implantation system has a first plate and a second plate, where the first plate and second plate generally define a resolving aperture therebetween. A position of the first plate with respect to t...  
WO/2018/102364A1
The present invention provides a method for plasma dicing a substrate (100). The substrate is provided with a top surface and a bottom surface, the top surface of the substrate having a plurality of street areas (120) and at least one de...  
WO/2018/100014A1
A variable voltage generator circuit is described for generating, from a substantially constant supply voltage VS, a variable high-voltage control voltage VC for a variable power capacitor (1) having a variable-permittivity dielectric. T...  
WO/2018/099156A1
A vacuum condition processing apparatus(100) is provided, the top of which is connected to an external charged particle beam generating device(200), and the apparatus includes: a suction cup(101) in contact with the specimen(113) to be o...  
WO/2018/099805A1
The present invention relates to methods and devices for extending a time period until changing a measuring tip of a scanning probe microscope. In particular, the invention relates to a method for hardening a measuring tip (120, 127, 130...  
WO/2018/099854A1
A method of inspecting a specimen with an array of primary charged particle beamlets in a charged particle beam device is described. The method includes generating a primary charged particle beam with a charged particle beam emitter; ill...  
WO/2018/100473A1
An end-block (100) for use in a deposition apparatus, for connecting a cylindrical consumable target (150) with magnetic bar, to an outside of the deposition apparatus, comprising at least drive means to provide a relative movement betwe...  
WO/2018/096610A1
The purpose of the present invention is to provide a charged-particle beam device capable of eliminating foreign matter adhered on an electric field correction electrode (201) disposed in an outer peripheral portion of a measurement samp...  
WO/2018/096145A1
Disclosed is a method comprising the irradiation of a wafer (8) by means of an ion beam (2) that passes through an implantation filter (6), the ion beam (2) being electrostatically deviated in a first direction and a second direction in ...  
WO/2018/094982A1
A method for inducing and exciting a radio frequency plasma with laser in a low air pressure environment. In the method, hardware comprises a pulse laser light source (1), a convex lens (3), a target material (5), an ion source system (6...  
WO/2018/098002A1
Processes and systems for carbon ion implantation include utilizing phosphine as a co-gas with a carbon oxide gas in an ion source chamber 300. In one or more embodiments, carbon implantation with the phosphine co-gas is in combination w...  
WO/2018/096235A1
This electrode (1), with which an apparatus furthermore possessing a holder (102) for the substrate, a counter-electrode and means (120, 121, 122) for injecting a plasma gas towards this holder, is equipped comprises a body (2) made from...  
WO/2018/098004A1
Processes and systems for carbon ion implantation include utilizing phosphorous trifluoride (PF3) as a co-gas with carbon oxide gas, and in some embodiments, in combination with the lanthanated tungsten alloy ion source components advant...  

Matches 1 - 50 out of 64,493