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Matches 1 - 50 out of 65,520

Document Document Title
WO/2019/091752A1
A method for detecting electron beam filament wear in an electron beam source, the method comprising the steps of: enlarging a beam spot emanating from the electron beam source on a work table to a predetermined minimum size, capturing a...  
WO/2019/091903A1
The invention relates to a particle beam apparatus (1) comprising: a particle beam source (210) configured to generate a particle beam (202); a magnetic coil (2) configured to emit a magnetic field to manipulate the particle beam; an obj...  
WO/2019/094929A1
A plasma ion source includes a plasma chamber body having at least one inlet for introducing a feed gas to an interior of the plasma chamber body. The plasma chamber body is electrically isolated from a vacuum chamber attached to the pla...  
WO/2019/093657A1
A mount may comprise: a body that is fixed to an end part of a hollow shaft supporting a heater plate; a gas supply hole that is arranged so as to penetrate the body, and that is for supplying inactive gas to the inside of the shaft in o...  
WO/2019/058163A3
The invention relates to a method for carrying out a deposition process at the outer side (1) and/or at the inner side (2) of a body (3) having a longitudinal extension (L), in which at least one deposition is applied onto the outer and/...  
WO/2019/094304A1
Methods and apparatuses for providing an anisotropic ion beam for etching and treatment of substrate are discussed. In one embodiment, a system for processing a substrate includes a chamber, a chuck assembly, an ion source, and a grid sy...  
WO/2019/089279A1
Apparatus for monitoring of an ion beam. The apparatus may include a processor; and a memory unit coupled to the processor, including a display routine, where the display routine operative on the processor to manage monitoring of the ion...  
WO/2019/089191A1
A system that utilizes a component that controls thermal gradients and the flow of thermal energy by variation in density is disclosed. Methods of fabricating the component are also disclosed. The component is manufactured using additive...  
WO/2019/089467A1
A method and a system for planarizing a membrane is disclosed. In one aspect, the method includes providing a resilient membrane and planarizing the surface of the membrane with a conditioning tool. The planarized membrane may be used in...  
WO/2019/086236A1
A termination unit (300) for a deposition system, comprising a device (100) for effecting a function, the device comprising at least one component (110) comprising electrical steel, and at least one shielding element (120) which is elect...  
WO/2019/081052A1
An ARC evaporator comprising: - a cathode assembly comprising a cooling plate (11), a target (1) as cathode element, - an electrode arranged for enabling that an arc between the electrode and the front surface (1A) of the target (1) can ...  
WO/2019/018019A3
Methods and systems for etching substrates using a remote plasma are described. Remotely excited etchants are formed in a remote plasma and flowed through a showerhead into a substrate processing region to etch the substrate. Optical emi...  
WO/2019/082497A1
The purpose of the present invention is to provide a charged particle ray device which is capable of simply estimating the cross-sectional shape of a pattern. The charged particle ray device according to the present invention acquires a ...  
WO/2019/082976A1
A crystal orientation map generation device (10) that is used in a charged particle radiation device (100) in which charged particle radiation is made incident to the surface of a sample, and that generates a crystal orientation map, whi...  
WO/2019/081053A1
An ARC evaporator comprising: - a cathode assembly, - an electrode arranged for enabling that an arc between an electrode and a front surface of the target can be established, and - a magnetic guidance system placed in front of a back su...  
WO/2019/081162A1
An inspection method for a substrate is described, the inspection method comprising: - providing an electron beam having a first polarization state to a sample of the semiconductor substrate; - detecting a first response signal of the sa...  
WO/2019/077156A1
The invention relates to a method of producing at least one monolayer (L) of a two-dimensional material (mat2D), said two-dimensional material comprising at least one metal element M and one chalcogen element X, and said method comprisin...  
WO/2019/076609A1
Known gas injectors have a gas distributor element having a wall, which extends through a plurality of openings in order to supply process gas. In order to provide a heatable gas injector proceeding therefrom, having a simple design and ...  
WO/2019/077158A1
The invention relates to a method for producing at least one monolayer (L) of a two-dimensional material (Mat2D), said two-dimensional material consisting of an element B and an element N, which are boron and nitrogen respectively, and s...  
WO/2019/079325A1
A matchless plasma source is described. The matchless plasma source includes a controller that is coupled to a direct current (DC) voltage source of an agile DC rail to control a shape of an amplified square waveform that is generated at...  
WO/2019/078657A1
Provided is a plasma etching method using a Faraday cage. The plasma etching method comprises: a step of providing, in a plasma etching device, a Faraday cage that has a mesh part on the top surface thereof; a step of providing a quartz ...  
WO/2019/076884A1
The invention relates to a device for (1) locally manipulating a spatial phase distribution of a charged particle wave propagating along a beam axis (Z). The device comprises a support element (2) having a target region for receiving the...  
WO/2019/077970A1
The present invention provides a long-life ion source capable of generating a large number of aluminum ions. A filament 20 is energized to increase the temperature of a cathode 22 arranged inside a chamber 21, thereby heating a raw mater...  
WO/2019/079013A1
Methods and systems for controlling glow discharge in a plasma chamber are disclosed. An example apparatus includes a chamber having chamber walls connected to ground and a radio frequency (RF) power supply. A top electrode is connected ...  
WO/2019/074563A1
Disclosed herein is an apparatus for processing a substrate using an inductively coupled plasma source. An inductively coupled plasma source utilizes a power source, a shield member, and a coil coupled to the power source. In certain emb...  
WO/2019/074233A1
A plasma treatment device according to the present invention comprises: an induction chamber into which a source gas is introduced in order to generate plasma therein; a treatment chamber in which a treatment target substrate is arranged...  
WO/2019/072448A1
A method of inspecting a sample (10) with a charged particle beam device is described. The method comprises arranging the sample (10) on a stage (20), determining a first focusing strength of an objective lens (150) adapted to focus a ch...  
WO/2019/072704A1
Systems and methods for conducting critical dimension metrology are disclosed. A charged particle beam apparatus generates a beam for imaging a first area 540 and a second area 541-547. Measurements are acquired corresponding to a first ...  
WO/2019/075256A1
A radio frequency (RF) generator having an effective source impedance Z g at a reference point (e.g. at the generator output) includes a reference input and controls the magnitude and phase with respect to a signal received at the refere...  
WO/2019/075183A1
A sputtering chamber particle trap comprises first and second patterns formed on at least a portion of a surface of the particle trap. The first pattern includes one of: first indentations having a first depth and separated by first and ...  
WO/2019/071294A1
The present invention relates to generally to components of scientific analytical equipment, and particularly to methods for extending the operational lifetime or otherwise improving the performance of dynodes used in electron multiplier...  
WO/2019/075258A1
A method for controlling a generator connected to a load involving obtaining a first measured value (M1) related to a forward power calculated with respect to reference impedance (Z?c#191). The method involves adjusting an output of the ...  
WO/2019/074899A1
An ion implantation system has an ion source configured form an ion beam and an angular energy filter (AEF) having an AEF region. A gas source passivates and/or etches a film residing on the AEF by a reaction of the film with a gas. The ...  
WO/2019/074947A1
Generation of bubbles is disclosed to occur within a flow of an aqueous fluid. The bubbles may be formed within a tube of a selected diameter and the bubbles are controlled to exit the tube at a selected diameter. Generally, bubbles are ...  
WO/2019/071352A1
A novel method for cross-section sample preparation has a sample oriented normal to an SEM/GFIS or other imaging column via a stage, and is operated upon by an FIB to form the cross-section pre-lamella within the sample, followed by an a...  
WO/2019/070673A1
A radiofrequency (RF) filter includes an inductive element having multiple coil sections collectively forming an undivided coil of a cable of twisted magnetic wires. At least two adjacent coil sections have different turn pitches. The ca...  
WO/2019/070224A1
An inductive capacitive reactor for residential use functions as a multifaceted transformer with inductor and capacitor functionalities iteratively, includes comprises: a stacked group of hollow centered continuous loop components sequen...  
WO/2019/068601A1
A stage apparatus for an e-beam inspection apparatus comprising: - an object table (3) comprising an supporting surface, the object table configured to support a substrate (190) on the supporting surface; - a positioning device (180) con...  
WO/2019/070427A1
Embodiments disclosed herein generally relate to a substrate processing chamber component assembly with a split slit liner door assembly. In one embodiment, the split slit liner door assembly has a first door portion having a top surface...  
WO/2019/068666A1
A multi-beam apparatus for multi-beam inspection with an improved source conversion unit providing more beamlets with high electric safety, mechanical availability and mechanical stabilization has been disclosed. The source-conversion un...  
WO/2019/070524A1
Described herein are architectures, platforms and methods for providing localized high density plasma sources igniting local gasses during a wafer fabrication process to provide global uniformity. Such plasma sources are resonant structu...  
WO/2019/063528A1
An objective lens for forming an image of an object. The objective lens includes, sequentially from an image side to an object side, a first lens group having negative refractive power, and a second lens group having positive refractive ...  
WO/2019/064293A1
A control system for use in measuring one or more parameters of a patterned structure. The control system is configured as a computer system and comprises: an input utility configured to receive input data comprising raw measured TEM ima...  
WO/2019/064511A1
An electron beam apparatus comprises: a light irradiation apparatus (80) that irradiates a photoelectric element (54) with light; and an electron beam optical system (70) that bombards a wafer W with a an electron beam produced from the ...  
WO/2019/064013A1
A method and system for processing a diffraction pattern image obtained in an electron microscope are disclosed. The method comprises, according to a first set of microscope conditions, causing an electron beam to impinge upon a calibrat...  
WO/2019/063529A1
An optical system used in a charged particle beam inspection system. The optical system includes one or more optical lenses, and a compensation lens configured to compensate a drift of a focal length of a combination of the one or more o...  
WO/2019/063794A1
A multi-cell detector includes a first layer (420) having a region (422) of a first conductivity type and a second layer (440) including a plurality of regions (444) of a second conductivity type. The second layer may also include one or...  
WO/2019/064516A1
An exposure device (1000) comprises: a light optical system (180i); a housing (19) that has formed, in the interior thereof, a vacuum space (34) in which an electron emission surface of a photoelectric element (54i) is positioned; a fram...  
WO/2019/067948A1
The present disclosure generally relates to an isolation device for use in processing systems. The isolation device includes a body having a flow aperture formed therethrough. In one embodiment, the isolation device is disposed between a...  
WO/2019/063559A1
Disclosed herein is a method comprising: determining parameters of a recipe of charged particle beam inspection of a region on a sample, based on a second set of characteristics of the sample; inspecting the region using the recipe.  

Matches 1 - 50 out of 65,520