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JP5039274B2 |
A particle radiation apparatus, especially transmission or scanning electron microscope, comprises an objective that focuses or images a particle beam, a holder (17) for a probe in the objective, a cooler (21) with cooling surfaces (18) ...
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JP5026711B2 |
Ion implantation with high brightness, ion beam by ionizing gas or vapor, e.g. of dimers, or decaborane, by direct electron impact ionization adjacent the outlet aperture (46, 176) of the ionization chamber (80; 175)). Preferably: condit...
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JP5025068B2 |
A housing for microelectronic devices requiring an internal vacuum for operation, e.g., an image detector, is formed by tape casting and incorporates leads between interior and exterior of said housing where said leads are disposed on a ...
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JP4976344B2 |
A structure comprising: a plate (40); an electron emissive element (104) overlying the plate; a support region (102,108) overlying the plate; and a getter region (112) overlying at least part of the support region, a composite opening ex...
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JP4932864B2 |
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JP4921671B2 |
A high pressure sodium lamp (100) having an evacuated glass envelope (6) with a plurality of electrically conductive support members therein and extending therethrough. An elongated arc tube (14) having a pair of electrodes (26) extendin...
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JP4897188B2 |
A thermal interface material ( 40 ) includes a polymer matrix ( 32 ) and an array of carbon nanotubes ( 22 ) incorporated in the polymer matrix. The polymer matrix has a thermally conductive first face ( 42 ) and an opposite thermally co...
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JP4891527B2 |
A mounting member (50,50',50",50''') for an arc tube/shroud combination comprises an annulus (52). The annulus (52) has at least one mounting tab (54) depending from an outer edge thereof and two spaced apart arc tube-pinch seal-engaging...
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JP4866243B2 |
An arrangement for processing a semiconductor substrate in a plasma processing system is disclosed. The arrangement includes providing a RF coupling structure having a first terminal and a second terminal, the first terminal being couple...
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JP4863329B2 |
A vacuum retention agent, which is safe, easy to handle, saves space, and absorbs residual gases inside a hermetic envelope to maintain the hermetic envelope in a high degree of vacuum is provided in place of the conventional metal gette...
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JP4841489B2 |
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JP4812853B2 |
An electron emitting element (1) includes a substrate (2), an upper electrode (3), and a fine particle layer (4) sandwiched between the substrate (2) and the upper electrode (3). The fine particle layer (4) includes metal fine particles ...
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JP4808923B2 |
The present invention is directed to the use of a molybdenum-rhenium alloy in the construction of sealing tubes (14) for high pressure discharge lamps.
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JP4787054B2 |
A sealing panel (100) that can suppress a rise in discharge voltage is provided. The sealing panel (100) includes a resin material-containing sealing material (20) disposed on the whole periphery in a part between a pair of substrates (1...
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JP4768050B2 |
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JP4754995B2 |
A thermal interface material includes a macromolecular material having two opposite Surfaces, and a plurality of carbon nanotubes each having two opposite ends embedded in the macromolecular material. The two opposite ends of the carbon ...
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JP4741574B2 |
A capacitive plasma source for iPVD is immersed in a strong local magnetic field, and may be a drop-in replacement for an inductively coupled plasma (ICP) source for iPVD. The source includes an annular electrode having a magnet pack beh...
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JP4722354B2 |
An apparatus for removing contaminants from a display device is disclosed. In one embodiment, an auxiliary chamber is adapted to be coupled to a surface of a display device such that contaminants within the display device can travel from...
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JP4718489B2 |
A high-pressure discharge lamp has an outer envelope (1) in which a discharge vessel (11) is arranged enclosing a discharge space (13) with an ionizable filling. The discharge vessel has two mutually opposed neck-shaped portions (2, 3) t...
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JP4713301B2 |
A thermal interface material includes a matrix, a plurality of carbon nanotubes, and at least one phase change layer. The matrix includes a first surface and an opposite second surface. The carbon nanotubes are embedded in the matrix uni...
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JP4714347B2 |
A remote plasma generator, coupling microwave frequency energy to a gas and delivering radicals to a downstream process chamber, includes several features which, in conjunction, enable highly efficient radical generation. In the illustra...
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JP4700062B2 |
Non-evaporable getter alloys are provided which can be activated at relatively low temperatures and are capable of efficiently sorbing hydrogen.
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JP4692348B2 |
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JP2011084076A |
To provide an article having a component with a surface defining microstructured features.Articles having the component with the surface defining microstructured features can be formed by using thermal transfer elements. One example of a...
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JP4662666B2 |
A powder of a composite material comprising a non-evaporable getter material with a palladium coating continuously sorbs hydrogen. Embodiments in which the coverage of the palladium coating over the particles of the NEG material is compl...
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JP2011053486A |
To provide an image display device that efficiently radiates heat without significantly changing the shape of a driving circuit for display.The image display device includes a source driver 20 having a plurality of semiconductor devices ...
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JP4646920B2 |
The service lifetime of an ion source is enhanced or prolonged by the source having provisions for in-situ etch cleaning of the ion source and of an extraction electrode, using reactive halogen gases (F or Cl), and by having features tha...
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JP4643588B2 |
The service lifetime of an ion source is enhanced or prolonged by the source having provisions for in-situ etch cleaning of the ion source and of an extraction electrode, using reactive halogen gases (F or Cl), and by having features tha...
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JP4631716B2 |
To provide a discharge plasma generation assist device capable of extending the service life and of improving reliability thereof. This discharge plasma generation assist device A is used for a discharge plasma device provided with an ai...
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JP4618145B2 |
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JP4620187B2 |
The invention discloses a pumping device by non-vaporizable getter to create a very high vacuum in a chamber defined by a metal wall capable of releasing gas at its surface, characterized in that it comprises a thin layer of non-vaporiza...
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JP2011501794A |
An apparatus for substantially dehumidifying an insulating annular space (108) is provided. This apparatus includes an insulated surrounding envelope (106), an inner cylindrical device (107) and a truncated annular cylinder (100) compris...
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JP4601179B2 |
A tendency for a discontinuity to occur in the amount of power reflected back to an r.f. bias source of a vacuum plasma processor is overcome by controlling the r.f. bias source output power so the power delivered to plasma in a vacuum p...
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JP4596805B2 |
With respect to a vacuum tube having a reduced pressure vessel containing an electric discharge gas sealed therein, problems such as the lowering of discharge efficiency owing to an organic material, moisture or oxygen remaining in the r...
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JP2010537385A |
A field emission device in which a protecting vapor is present in an evacuated space between a field emission cathode assembly and an anode. The protecting vapor may be one or more hydrogen-containing gases such as a gas containing M—H...
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JP2010272260A |
To provide an electron emitting element capable of obtaining a stable and satisfactory amount of electron emission by securing a large number of routes for a current flowing from an electrode substrate to an electron accelerating layer.T...
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JP4590906B2 |
Capacitor unit and capacitor control system used in high output power source are reduced in size. A capacitor unit (1) controlled by the capacitor control system is divided into capacitor blocks (3) formed of a specified number of capaci...
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JP4580438B2 |
A structure comprising: a plate (40); an electron emissive element (104) overlying the plate; a support region (102,108) overlying the plate; and a getter region (112) overlying at least part of the support region, a composite opening ex...
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JP4580439B2 |
A structure comprising: a plate (40); an electron emissive element (104) overlying the plate; a support region (102,108) overlying the plate; and a getter region (112) overlying at least part of the support region, a composite opening ex...
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JP4555301B2 |
A cathode ( 11; 20; 30 ) is provided for cold cathode lamps having the surface of the cathode at least partially coated with a layer of a getter material ( 15; 26; 31 ). The coating allows a reduction of the work function value of the ca...
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JP4543058B2 |
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JP4546455B2 |
A plasma lamp including a waveguide body comprising at least one dielectric material. The body is coupled to a microwave power source which causes the body to resonate in at least one resonant mode. A lamp chamber integrated with the bod...
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JP4540224B2 |
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JP2010157518A |
To provide a method and apparatus for generating an ion beam by which the service life is prolonged and the stop time of an apparatus is reduced. The service life of an ion source (400) can be enhanced or prolonged using a reactant halog...
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JP2010524182A |
A mixed light lamp may include an outer bulb, in which a filament and a discharge vessel are accommodated in series, the discharge vessel having a metal halide fill, the lamp furthermore being assigned a rectifier, an energy storage mean...
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JP2010156047A |
To provide a new system for controlling the flow of vapors sublimated from solids. A vapor delivery system for delivering a steady flow of sublimated vapor 50 to a vacuum chamber 130 includes a vaporizer 28 of solid material 29, a mechan...
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JP4498366B2 |
An ion source is cooled using a cooling plate that is separate and independent of the anode. The cooling plate forms a coolant cavity through which a fluid coolant (e.g., liquid or gas) can flow to cool the anode. In such configurations,...
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JP4435426B2 |
The invention relates to an ionization chamber for ion beams and to a method of monitoring the intensity of an ion therapy beam by way of such an ionization chamber. For that purpose, the ionization chamber includes a chamber housing, a ...
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JP2010048467A |
To provide a plate cooling device smoothly cooling plates subjected to heat treatment and a heat treatment system equipped with the plate cooling device.The plate cooling device 10 includes a plate arrangement part 15 in which a substrat...
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JP4423826B2 |
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