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Matches 201 - 250 out of 12,887

Document Document Title
WO/2016/135932A1
The objective of the invention is a stable generation of EUV light. The extreme UV light generation device is equipped with: a chamber wherein an extreme UV light is generated in a predetermined region therein if a target is irradiated w...  
WO/2016/131601A1
A laser radiation source for a lithographic tool comprising a laser module to emit a first laser beam having a first wavelength and a second laser beam having a second wavelength, a beam separation device to separate the optical paths of...  
WO/2016/131583A1
A laser system comprises a seed module (33) operable to emit a pulse of a first laser beam followed by a pulse of a second laser beam and a plurality of amplification chambers each comprising a gain medium having a gain, wherein the plur...  
WO/2016/131069A3
A plasma-generated EUV light source uses an EUV-diffracting collection mirror (103) to channel spectrally pure in-band radiation through an intermediate-focus aperture (105) and through EUV illumination optics. Out-of-band radiation (110...  
WO/2016/131069A4
A plasma-generated EUV light source uses an EUV-diffracting collection mirror (103) to channel spectrally pure in-band radiation through an intermediate-focus aperture (105) and through EUV illumination optics. Out-of-band radiation (110...  
WO/2016/125295A1
This beam delivery system comprises a plurality of beam adjusters for adjusting the divergence angle of a pulsed laser light emitted from a laser device, a beam sampler for splitting as a sample light a portion of a pulsed laser light ou...  
WO/2016/121040A1
The target supply device in one embodiment of the present invention is a target supply device for supplying a metal target to a plasma generation region, and may be equipped with a tank housing the metal target, a dehydrated filter for s...  
WO/2016/123479A1
A laser scanning system for capturing an image of a specimen is described herein. The laser scanning system includes a light source configured to emit a light beam for illuminating the specimen, a scanning unit including a plurality of r...  
WO/2016/117118A1
An EUV light generation system according to the present disclosure may be provided with: a chamber; a target feed device for feeding a target into the interior of the chamber; a drive laser device for irradiating drive pulse laser light ...  
WO/2016/116147A1
The invention relates to a beam guidance device (3) for guiding a laser beam (5), in particular in the direction of a target region (B), for generating EUV radiation (14), comprising: an adjustment device (15) for adjusting a beam diamet...  
WO/2016/114728A1
The invention is a device for controlling the amount of radiation emitted during the process of imaging, particularly by instruments capable of radiation-based real-time imaging, such as fluoroscopy and cine acquisition. The related devi...  
WO/2016/109055A1
The present inventors have recognized that fall times between high-kV to low-kV levels (during a "dual energy" or "fast-kV" energy scan) are linked to the discharge of HV (high voltage) capacitance. In an embodiment of the invention, a h...  
WO/2016/104484A1
A vacuum chamber (1), wherein an emitter (3) and a target (7) are disposed so as to face each other, and a guard electrode (5) is provided on the outer periphery side of an electron generation unit (31) of the emitter (3). The emitter (3...  
WO/2016/103456A1
To stably generate EUV light. This extreme ultraviolet light generation device may be provided with: a chamber, which is connected to ground, and in which extreme ultraviolet light is generated when a metal target supplied to the inside ...  
WO/2016/098193A1
The present invention can prevent reduction in output of EUV light. This extreme ultraviolet light generation device may be provided with: a chamber 2 in which extreme ultraviolet light is generated from plasma occurred by irradiating, w...  
WO/2016/099758A1
A laser produced plasma extreme ultraviolet laser source comprising at least one variable radius mirror. The at least one variable radius mirror to adjust a beam diameter of a main pulse at a specified distance from a pre-pulse focal pla...  
WO/2016/099758A8
A laser produced plasma extreme ultraviolet laser source comprising at least one variable radius mirror. The at least one variable radius mirror to adjust a beam diameter of a main pulse at a specified distance from a pre-pulse focal pla...  
WO/2016/100393A1
The present disclosure is directed to plasma-based light sources. Systems and methods are described for protecting components of the light source from plasma generated debris which can include target material gas, atomic vapor, high ener...  
WO/2016/098240A1
A beam adjustment device in an extreme ultraviolet light generation device of the present invention may include a first pair comprising a first concave mirror and a first convex mirror arranged on a light path for a pulse laser light, a ...  
WO/2016/099622A1
Tube amplifier system including a plurality of conductor walls extending parallel to a longitudinal axis and defining an interior space therebetween. The tube amplifier system also including a shorting deck that extends transverse to the...  
WO/2016/098543A1
A beam adjustment device in an extreme ultraviolet light generation device of the present invention may include a first pair comprising a first concave mirror and a first convex mirror arranged on a light path for a pulse laser light, a ...  
WO/2016/087394A1
The invention relates to a system (31) for generating spectral computed tomography projection data. A spectral projection data generation device (6) comprising an energy-resolving detector generates spectral computed tomography projectio...  
WO/2016/084356A1
Disclosed is a liquid level detection device for appropriately detecting the liquid level (contained amount) of a high-temperature plasma source material in a liquid state, such as molten tin, within a reservoir containing the high-tempe...  
WO/2016/083647A1
The invention relates to a quality control device (1) for apparatus emitting ionising radiation, comprising : a plate (2) that has a face consisting of a fluorescent or phosphorescent material; a pair of horizontal delimiting strips (3a)...  
WO/2016/084167A1
The vibrator unit according to an embodiment of the present invention is a vibrator unit (310, 320, 330) for applying vibration onto a target material (271) that is supplied inside a target flow path (FL), and equipped with a vibrating e...  
WO/2016/079838A1
An extreme ultraviolet light generating device that generates extreme ultraviolet light by generating plasma by irradiating a target with pulsed laser light outputted from a laser device may be provided. This extreme ultraviolet light ge...  
WO/2016/072431A1
An excitation unit according to one embodiment of the present invention applies vibrations to a target material that has been supplied inside of a target flow path. The excitation unit may be provided with the following: a vibration tran...  
WO/2016/071972A1
A target generation device (26) according to one embodiment of the present disclosure may comprise: a filter structure (110, 110A, 110B, 120, 130, 150, 160); a flange (301) which accommodates the filter structure and in which exists a fl...  
WO/2016/072025A1
An excitation unit according to one embodiment of the present invention is an excitation unit (310, 320) that applies vibrations to a target material (271) that has been supplied inside of a target flow path (FL). The vibration unit may ...  
WO/2016/067343A1
The purpose of the present invention is to output laser light having desired characteristics at a desired timing. This laser device is a laser device to be used in tandem with an extreme ultraviolet light generation device that generates...  
WO/2016/067432A1
An X-ray device 1 according to the present invention is provided with a timer 31A for monitoring a nonoperation time indicating the time from the previous signal applied to a control circuit 31 to the next applied signal. Further, if the...  
WO/2016/063409A1
This extreme ultraviolet light generation system may include a laser system and a control unit. The laser system may generate a mist target by irradiating a first target with first pulsed laser light and diffusing the first target, and m...  
WO/2016/059827A1
This transformer is provided with: an iron core (31); a winding part (21, 22) which has a winding wound around the iron core and is installed at the outer circumference of the iron core; and an insulating member (1b, 2b, 3b) which has a ...  
WO/2016/059768A1
Disclosed are a foil trap capable of properly capturing debris without the overall structure thereof being made unnecessarily larger, and an extreme-ultraviolet light source apparatus for mask inspection provided with the foil trap. A de...  
WO/2016/058746A1
A radiation source (SO), which is operable to produce pulses of radiation, comprises: a wall (9,21) with an aperture (8,22); a radiation collector; a rotatable shield (200); and a drive mechanism (230) arranged to rotate the shield about...  
WO/2016/059674A1
In one aspect of this invention, the target material (271) is used for a target generation device (26, 120, 140, 51, 112) of an extreme UV generation device (1), wherein the concentration of dissolved oxygen may be less than or equal to ...  
WO/2016/056639A1
 In the present invention, a ferroelectric body is irradiated with ultraviolet (UV) light, and the ferroelectric body is caused to stably generate electric potential. A method for radiating charged particles, in which the UV-light-rece...  
WO/2016/045905A1
Disclosed is a high-voltage generator for an x-ray apparatus. The generator comprises a voltage multiplier having a high-voltage output terminal and first and second alternating-current input terminals, an output transformer coil (12) ha...  
WO/2016/047437A1
This mobile X-ray imaging device comprises an X-ray high voltage generator and an X-ray tube assembly. The X-ray high voltage generator comprises a storage battery, a capacitor, and a recovering unit that recovers electrical power accumu...  
WO/2016/043318A1
 Provided is a light source device and a method with which the efficiency of generating EUV light can be further improved. [Solution] According to this EUV light source device, a noble gas is supplied into a space inside a hollow body ...  
WO/2016/043313A1
Provided is an EUV light source system that can achieve further improvements in the irradiance of EUV light. Plasma is formed in an interior space of a hollow body (2) as a result of the energy of standing waves that are formed in an int...  
WO/2016/038506A1
An extreme ultraviolet (EUV) radiation source pellet(8) includes at least one metal particle (30) embedded within a heavy noble gas cluster (20) contained within a noble gas shell cluster (10). The EUV radiation source assembly can be ac...  
WO/2016/038657A1
This transmission system for transmitting a pulsed laser beam into an extreme UV light chamber may contain: an optical path adjustment device whereby the optical path of a first pre-pulsed laser beam and the optical path of a second pre-...  
WO/2016/034409A1
The present invention relates to a high voltage generator (100) for supplying an X-ray tube (200), the high voltage generator (100) comprising: a voltage regulator device (100-1), which is configured to provide a DC voltage; a plurality ...  
WO/2016/030485A1
Disclosed is a laser-driven photon source comprising drive optics which focus drive radiation so as to maintain a plasma. The point spread function of the drive optics has a point spread function (75) which is configured such that a spec...  
WO/2016/032683A1
The present invention discloses a method for removing streaks from detector cells with performance difference, specifically a method for removing streaks from detector cells with performance difference and streaks caused by other reasons...  
WO/2016/027346A1
This extreme ultraviolet light generation system may be provided with: a chamber; a target supply unit configured to supply a target to a predetermined region in the chamber, said target having an atomic density of 8.0×1017-1.3×1018 at...  
WO/2016/022267A1
A droplet generation system for use with a laser produced plasma (LPP) extreme ultraviolet (EUV) source plasma chamber is described. During EUV generation, oscillations can occur as a function of droplet time-of-flight within the plasma ...  
WO/2016/012192A1
A radiation source arranged to receive an initiating radiation beam. The radiation source comprises a polarisation adjustment apparatus and a focussing unit configured to focus the initiating radiation beam to be incident on a fuel targe...  
WO/2016/013114A1
To improve energy stability of EUV light. This extreme ultraviolet light generation apparatus may be provided with: a chamber wherein extreme ultraviolet light is generated from plasma generated by irradiating a target with laser light, ...  

Matches 201 - 250 out of 12,887