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Matches 201 - 250 out of 13,006

Document Document Title
WO/2017/002363A1
Provided is an X-ray generating apparatus in which a likelihood that an anode member may be deformed by heat deformation of a container is eliminated or reduced to maintain a positional relationship between an electron source and a trans...  
WO/2017/003237A1
Disclosed is a portable X-ray generation device, which uses an electric field emission-type X-ray source, and is thus advantageous in reducing weight and volume and has excellent reliability in X-ray emission performance. The portable X-...  
WO/2017/003236A1
Disclosed is a portable X-ray emission device, which uses an electric field emission-type X-ray source, and is thus advantageous in reducing weight and volume and has excellent reliability in X-ray emission performance. The portable X-ra...  
WO/2016/208155A1
[Problem] To achieve lower power consumption in a radiation-irradiating device that constitutes a radiological image-capturing device, as well as in a control method for a radiation-irradiating device, and a program. [Solution] A radiati...  
WO/2016/207042A1
Disclosed is an amplifier arrangement (1) comprising: an optical amplifier (2) for amplifying laser radiation (3); a first retroreflector (7a) and a second retroreflector (7b), wherein the amplifier (2) is arranged in a beam path (6) of ...  
WO/2016/203630A1
The purpose of the present invention is to control the output timing of a laser light highly accurately. The extreme UV light generation device may comprise: a chamber, wherein plasma is generated, thereby causing extreme UV light to be ...  
WO/2016/186740A1
A coreless transformer ultra-violet (UV) light source system comprising a bulb including a predetermined amount of an element which efficiently emits UV light when exposed to a high current plasma state and a predetermined amount of a bu...  
WO/2016/181715A1
Provided is a radiation source with which the dose and coherency can be adjusted by enabling the width of the slits making up a multi-slit configuration to be changed. Individual slits S provided to this multi-slit configuration 3c are p...  
WO/2016/177519A1
A radiation source for a lithographic apparatus, in particular a laser-produced plasma source wherein a buffer liquid droplet is provided in a source chamber containing the plasma source. The buffer liquid droplet being evaporated explos...  
WO/2016/175031A1
According to one embodiment of the present invention, a chamber device may be provided with: a chamber (2); a target generation device, which is assembled to the chamber and supplies a target material to a predetermined region in the cha...  
WO/2016/174752A1
According to one embodiment of the present invention, a chamber device may be provided with: a chamber; a target generation device, which is assembled to the chamber and supplies a target material to a predetermined region in the chamber...  
WO/2016/170658A1
The purpose of the present invention is to improve the stability of operation of an EUV radiation generator. This droplet detector may comprise a light source which irradiates illuminating light onto droplets which generate extreme ult...  
WO/2016/172611A1
Small, portable, and collapsible X-ray devices are described in this application. In particular, this application describes a portable X-ray device that contains a C-shaped support arm, an X-ray source contained near one end of the suppo...  
WO/2016/170972A1
 The purpose of the present invention is to improve the stability of operation of an EUV radiation generator. This droplet detector may comprise a light source which irradiates illuminating light onto droplets which generate extreme ul...  
WO/2016/171964A1
A system includes a plurality of sensors at distinct and separate locations, each of the distinct and separate locations being equidistant from a region that Is configured to pass light that propagates along a beam path, the sensors bein...  
WO/2016/171195A1
A laser device according to the present disclosure may be provided with: a quantum cascade laser for outputting laser light in accordance with a supply current, from the current rise timing of the supply current to a vibration start timi...  
WO/2016/166549A1
A radiation source and an associated method of use. The radiation source includes a laser-plasma wakefield accelerator that is configured to pass at least one laser pulse through a plasma and inject a stream of plasma electrons into at l...  
WO/2016/163108A1
Disclosed are: discharge electrodes having a shape for obtaining the desired light output; and a light source device equipped with these discharge electrodes. The EUV light source device (100) comprises: a pair of disk-shaped discharge e...  
WO/2016/157315A1
This extreme UV light generation device may be provided with: a chamber; a target supply unit for successively supplying targets into the chamber; an extreme UV light focusing mirror that includes a reflective surface for reflecting and ...  
WO/2016/159618A1
Discloses are an X-ray generation device and a control method therefor. The disclosed X-ray generation device including a filament, a grid, and an anode comprises: a filament control unit for controlling voltage applied to the filament; ...  
WO/2016/160708A1
A robotic scanning system is provided. The scanning system includes a robotic array having at least one set of scanning robots configured to perform a radiological scan on a subject, each robot having a respective emitter or detector. A ...  
WO/2016/157286A1
Provided is an imaging device in which a radiation unit (10) selectively emits X-rays from each of a plurality of radiation positions (RP) arranged along a radiation surface (12) that is a flat surface. An imaging unit (20) captures imag...  
WO/2016/160300A1
A method and system (10, 20, 30, 50) for reducing static charges on a material (18). X-rays (13) can ionize a flowing fluid (16). The ions can be transported to the material and can reduce or dissipate the static charges.  
WO/2016/160371A1
A system including an x-ray scanner gantry having: a housing; a gantry gear; a rotor; a generator mounted on the rotor; and first and second generator gears connected to or engaged with one or more axles of the generator. The second gene...  
WO/2016/152020A1
The present invention discloses: an extreme ultraviolet light source device enabling, without any associated enlargement of the device, an increase in electricity input, or without a reduction in operation suspension time of the device c...  
WO/2016/147910A1
The present invention addresses the problem of making it possible to improve the stability of operation of an EUV-light generation device. A target image-capture device for capturing an image of a target which converts to a plasma and ge...  
WO/2016/147255A1
The present invention addresses the problem of making it possible to improve the stability of operation of an EUV-light generation device. A target image-capture device, which may be provided with: a droplet detector for detecting the pa...  
WO/2016/146400A1
A radiation system for generating a radiation emitting plasma comprises a fuel emitter (3) configured to provide fuel (70) to a plasma formation region (4), a laser (1) arranged to provide a laser beam (2) at the plasma formation region ...  
WO/2016/142995A1
This laser device may include a master oscillator, a plurality of amplifiers, an optical sensor device that detects light travelling backward in a laser light path, and a control unit. The optical sensor device may include a first optica...  
WO/2016/142838A2
Medical X-ray power generator system comprising an energy storage section comprising at least one battery unit and at least one supercapacitor (SC) unit, wherein the SC unit and the battery unit are connected in a way as to allow a bidir...  
WO/2016/142838A3
Medical X-ray power generator system comprising an energy storage section comprising at least one battery unit and at least one supercapacitor (SC) unit, wherein the SC unit and the battery unit are connected in a way as to allow a bidir...  
WO/2016/135965A1
A beam dump device according to one embodiment of the present disclosure is provided with an attenuator module, a beam dump module, and a control unit for controlling the attenuator module and the beam dump module. The attenuator module ...  
WO/2016/135932A1
The objective of the invention is a stable generation of EUV light. The extreme UV light generation device is equipped with: a chamber wherein an extreme UV light is generated in a predetermined region therein if a target is irradiated w...  
WO/2016/131601A1
A laser radiation source for a lithographic tool comprising a laser module to emit a first laser beam having a first wavelength and a second laser beam having a second wavelength, a beam separation device to separate the optical paths of...  
WO/2016/131583A1
A laser system comprises a seed module (33) operable to emit a pulse of a first laser beam followed by a pulse of a second laser beam and a plurality of amplification chambers each comprising a gain medium having a gain, wherein the plur...  
WO/2016/131069A3
A plasma-generated EUV light source uses an EUV-diffracting collection mirror (103) to channel spectrally pure in-band radiation through an intermediate-focus aperture (105) and through EUV illumination optics. Out-of-band radiation (110...  
WO/2016/131069A4
A plasma-generated EUV light source uses an EUV-diffracting collection mirror (103) to channel spectrally pure in-band radiation through an intermediate-focus aperture (105) and through EUV illumination optics. Out-of-band radiation (110...  
WO/2016/125295A1
This beam delivery system comprises a plurality of beam adjusters for adjusting the divergence angle of a pulsed laser light emitted from a laser device, a beam sampler for splitting as a sample light a portion of a pulsed laser light ou...  
WO/2016/121040A1
The target supply device in one embodiment of the present invention is a target supply device for supplying a metal target to a plasma generation region, and may be equipped with a tank housing the metal target, a dehydrated filter for s...  
WO/2016/123479A1
A laser scanning system for capturing an image of a specimen is described herein. The laser scanning system includes a light source configured to emit a light beam for illuminating the specimen, a scanning unit including a plurality of r...  
WO/2016/117118A1
An EUV light generation system according to the present disclosure may be provided with: a chamber; a target feed device for feeding a target into the interior of the chamber; a drive laser device for irradiating drive pulse laser light ...  
WO/2016/116147A1
The invention relates to a beam guidance device (3) for guiding a laser beam (5), in particular in the direction of a target region (B), for generating EUV radiation (14), comprising: an adjustment device (15) for adjusting a beam diamet...  
WO/2016/114728A1
The invention is a device for controlling the amount of radiation emitted during the process of imaging, particularly by instruments capable of radiation-based real-time imaging, such as fluoroscopy and cine acquisition. The related devi...  
WO/2016/109055A1
The present inventors have recognized that fall times between high-kV to low-kV levels (during a "dual energy" or "fast-kV" energy scan) are linked to the discharge of HV (high voltage) capacitance. In an embodiment of the invention, a h...  
WO/2016/104484A1
A vacuum chamber (1), wherein an emitter (3) and a target (7) are disposed so as to face each other, and a guard electrode (5) is provided on the outer periphery side of an electron generation unit (31) of the emitter (3). The emitter (3...  
WO/2016/103456A1
To stably generate EUV light. This extreme ultraviolet light generation device may be provided with: a chamber, which is connected to ground, and in which extreme ultraviolet light is generated when a metal target supplied to the inside ...  
WO/2016/098193A1
The present invention can prevent reduction in output of EUV light. This extreme ultraviolet light generation device may be provided with: a chamber 2 in which extreme ultraviolet light is generated from plasma occurred by irradiating, w...  
WO/2016/099758A1
A laser produced plasma extreme ultraviolet laser source comprising at least one variable radius mirror. The at least one variable radius mirror to adjust a beam diameter of a main pulse at a specified distance from a pre-pulse focal pla...  
WO/2016/099758A8
A laser produced plasma extreme ultraviolet laser source comprising at least one variable radius mirror. The at least one variable radius mirror to adjust a beam diameter of a main pulse at a specified distance from a pre-pulse focal pla...  
WO/2016/100393A1
The present disclosure is directed to plasma-based light sources. Systems and methods are described for protecting components of the light source from plasma generated debris which can include target material gas, atomic vapor, high ener...  

Matches 201 - 250 out of 13,006