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Matches 1 - 50 out of 13,008

Document Document Title
WO/2019/158765A2
An X-ray source (10) for emitting an X-ray beam (101) is proposed. The X- ray source (10) comprises an anode (12) and an emitter arrangement (14) comprising a cathode (16) for emitting an electron beam (15) towards the anode (12) and an ...  
WO/2019/158492A1
In some general aspects, a surface of a structure within a chamber of an extreme ultraviolet (EUV) light source is cleaned using a method. The method includes generating a plasma state of a material that is present at a location adjacent...  
WO/2019/154994A1
The present inventive concept relates to a method for protecting an X-ray source comprising: a liquid jet generator configured to form a liquid jet moving along a flow axis; an electron source configured to provide an electron beam inter...  
WO/2019/151250A1
[Problem] To provide an X-ray imaging device that increases the possibility that a distributed X-ray source can be adopted, and a synthesis method of tomosynthesis images. [Solution] This X-ray imaging device is provided with multiple di...  
WO/2019/150441A1
An extreme UV light generation device comprises: a chamber (10) in which a target substance supplied in an internal space is irradiated with laser light (301), whereby extreme UV light is generated; a gas supply unit (63) that supplies a...  
WO/2019/151251A1
[Problem] To provide an X-ray imaging device and a method for synthesizing a tomosynthesis image, said device and method being capable of enhancing the possibility that distributed X-ray sources can be employed. [Solution] A method for c...  
WO/2019/146064A1
This extreme ultraviolet generation device that generates extreme ultraviolet by irradiating a tin-containing target with pulsed laser light is provided with: a chamber container; a hydrogen gas supply unit that supplies hydrogen gas to ...  
WO/2019/137846A1
Provided is an apparatus for and method of controlling formation of droplets (102a, b) used to generate EUV radiation that comprise an arrangement producing a laser beam directed to an irradiation region and a droplet source. The droplet...  
WO/2019/124309A1
This X-ray device is provided with: a target that generates X-rays when it is irradiated with an electron beam; an electron beam source that emits the electron beam toward the target; an assessment unit that assesses the state of the tar...  
WO/2019/117172A1
In order to provide an X-ray tube and an X-ray generation device that enable high-sensitivity detection of an initial degree of vacuum and that make it possible to preemptively prevent abnormal electrical discharge and monitor lifetime, ...  
WO/2019/118075A1
An x-ray source (10, 20a, 20b, 20c, 30, 50) can include a housing (11) with material with an atomic number of ≥42 and a thermal conductivity of ≥3 W/(m*K) to assist in removing heat from the x-ray source and to block x-rays emitted i...  
WO/2019/105664A1
A laser beam monitoring system configured to monitor an attribute of an incident laser beam (24), the laser beam monitoring system comprising a beam separating element (30) and a plurality of sensors (34a-34d), wherein the beam separatin...  
WO/2019/102526A1
An extreme ultraviolet generator for irradiating a target with a pulsed laser beam and generating an extreme ultraviolet ray, wherein the extreme ultraviolet generator is provided with: a chamber; a magnet positioned outside of the chamb...  
WO/2019/099241A1
An x-ray source (60, 70) can have a reduced voltage gradient and a consistent voltage gradient, thus allowing less insulation, reduced arcing failure, or both. The x-ray source can comprise a bipolar voltage multiplier (10, 20, 30, 40) a...  
WO/2019/097197A1
The invention relates to a system for generating a spatially localised, high-intensity laser beam, comprising: a laser source (80) designed to generate a burst of N laser pulses with a duration of less than or equal to one picosecond, th...  
WO/2019/092831A1
Provided is an extreme ultraviolet light generation device which generates plasma by irradiating a target material with pulsed laser light, thereby generating extreme ultraviolet light, the extreme ultraviolet light generation device com...  
WO/2019/086397A1
A method is described to clean a surface of an optic (115) within a chamber (125) of an extreme ultraviolet (EUV) light source (100). The chamber is held at a pressure below atmospheric pressure. The method includes generating a material...  
WO/2019/081364A1
An amplified optical beam is provided to a region that receives a target including target material, an interaction between the amplified optical beam and the target converting at least some of the target material from a first form to a s...  
WO/2019/081105A1
An apparatus for receiving a conductive fuel comprises: a body; a current generating mechanism; and a magnet generating mechanism. The body defines a surface for receiving fuel. The current generating mechanism is suitable for generating...  
WO/2019/078079A1
Provided is a mechanism for accurately calculating the spectrum of radiation. This radiation imaging device is designed to image an object of interest using radiation, and is provided with a radiation generation unit for generating radia...  
WO/2019/042587A3
The invention relates to a control device for an X-ray tube (2), comprising a housing (29) that is designed as a shield, in which an anode current regulating unit (1) is arranged and which is connected to a cathode power supply unit (18)...  
WO/2019/079543A1
Systems, devices, and methods to accurately and precisely align a visualized axis with one or more objects in an image field during a procedure using an imager based positioner system attached to an electronic positioning device are desc...  
WO/2019/057584A1
A radiation source configured to provide EUV radiation, the radiation source comprises a fuel emitter and a laser system. The fuel emitter is configured to provide a fuel target to a plasma formation region. The laser system is configure...  
WO/2019/058430A1
This extreme ultraviolet light generation device is provided with: a chamber; an EUV light collecting mirror that is situated inside the chamber, that has a reflecting surface for establishing a first focal point and a second focal point...  
WO/2019/057409A1
A radiation source comprises: an emitter for emitting a fuel target towards a plasma formation region; a laser system for hitting the target with a laser beam to generating a plasma; a collector for collecting radiation emitted by the pl...  
WO/2019/058708A1
This radiation image capturing system comprises: an image capturing unit that includes a plurality of pixels for generating a radiation image and a detecting unit that detects incident radiation in order to perform exposure control; an i...  
WO/2019/057514A1
A vessel having a seal that is protected from the liquid material within the vessel by a volume of gas. The vessel has a partition that divides the vessel into two volume spaces such that the seal that is in gaseous communication with th...  
WO/2019/054540A1
The present invention relates to an apparatus capable of extracting multiple laser Compton scattering (LCS) photon beams by using an LCS reaction, comprising: a linear accelerator for accelerating an electron beam; and an LCS gamma ray g...  
WO/2018/234224A3
An X-ray source (100) is disclosed, comprising a liquid target source (110) configured to provide a liquid target (J) passing through an interaction region (I). The X-ray source further comprises an electron source (120) configured to pr...  
WO/2019/043773A1
[Problem] To enable easy measurement of the film thickness of debris adhered to the surface of a component without the need for the extensive disassembly of the in-chamber component in an extreme ultraviolet light generator. [Solution] A...  
WO/2019/042587A2
The invention relates to a control device for an X-ray tube (2), comprising a housing (29) that is designed as a shield, in which an anode current regulating unit (1) is arranged and which is connected to a cathode power supply unit (18)...  
WO/2019/046417A1
Methods and systems for x-ray based semiconductor metrology utilizing a clean, hard X-ray illumination source are described herein. More specifically, a laser produced plasma light source generates high brightness, hard x-ray illuminatio...  
WO/2019/038103A1
A target material receptacle includes a structure including a passageway that extends in a first direction, the passageway configured to receive target material that travels along a target material path; and a deflector system configured...  
WO/2019/035165A1
An extreme ultraviolet light generation device of one aspect of the present disclosure, comprises: an optical base; and a chamber module configured to be interchangeable with respect to the optical base. The chamber module includes: a ch...  
WO/2019/025768A1
To achieve high quality x-ray imaging, it is important to be able to control the production of x-rays in an x-ray generator. This is achieved by an x-ray generator comprising an array of electron field emitters for producing paths of ele...  
WO/2019/028454A1
A transparent radiation shield, attachable to a patient support platform, and movable to shield a physician from imaging radiation, includes a transparent computer display that is controllable to provide a data overlay on the shield pert...  
WO/2019/019042A1
An X-ray source (201, 1201, 1301, 1401, 1501, 1601, 1701), comprising: a cathode (212) in a recess (215) of a first substrate (210); a counter electrode (220) on a sidewall of the recess (215), configured to cause field emission of elect...  
WO/2019/008719A1
A laser system comprises: a pulse laser system that emits first laser light having a first wavelength component and a first polarized component and second laser light having the first wavelength component and a second polarized component...  
WO/2019/003284A1
An extreme ultraviolet light generation device comprises: a chamber that focuses laser light in the inner space to plasmatize a target substance at the focal point of laser light; a collector mirror that collects extreme ultraviolet ligh...  
WO/2018/234224A2
An X-ray source (100) is disclosed, comprising a liquid target source (110) configured to provide a liquid target (J) passing through an interaction region (I). The X-ray source further comprises an electron source (120) configured to pr...  
WO/2018/234260A1
A supply system for an extreme ultraviolet (EUV) light source includes an apparatus configured to be fluidly coupled to a reservoir configured to contain target material that produces EUV light in a plasma state, the apparatus including ...  
WO/2018/234061A1
A radiation source (SO) comprising: • a fuel supply device (3) configured to supply fuel; • an excitation device (1) configured to excite the fuel into a plasma (7); • a collector (5) configured to collect radiation emitted by the ...  
WO/2018/229424A1
The invention relates to a discharge nozzle configured to project a fluid in the form of a convergent spray. To this end, the invention proposes a discharge nozzle (100) comprising a nozzle body (110) defining a passage (112) between an ...  
WO/2018/232037A1
For radiation safety, a fluoroscope has an adjustable X-ray source-to-intensifier distance (SID) and an X-ray transparent spacer positioned between the source and receptor. As a distance between the source and the intensifier is changed,...  
WO/2018/229855A1
This extreme ultraviolet light generation device is provided with: (A) a chamber for generating extreme ultraviolet light by bringing a target material into a plasma state by irradiating the target material with laser light; (B) a vessel...  
WO/2018/229838A1
The extreme ultraviolet light sensor unit relating to one aspect of the present disclosure is provided with: a mirror that reflects extreme ultraviolet light; a wavelength filter that selectively passes extreme ultraviolet light reflecte...  
WO/2018/225307A1
An X-ray generation device is provided with: an X-ray tube including an electron gun which generates an electron beam and a target which generates an X-ray due to the entry of the electron beam; a power supply unit including a booster un...  
WO/2018/224369A1
The present invention relates to an apparatus (10) for generating X-rays. It is described to produce (210) with at least one power supply (40) a voltage between a cathode (20) and an anode (30). The cathode is positioned relative to the ...  
WO/2018/220761A1
An extreme UV light generation system may comprise: a first area that includes a light path adjustment unit that adjusts the light path of laser light emitted from an oscillator; a second area that includes a chamber having a plasma gene...  
WO/2018/219578A1
A radiation source comprising a fuel emitter configured to provide droplets of fuel to a plasma formation region; and a laser system configured to supply a laser beam; wherein the laser system comprises a delay line configured to delay a...  

Matches 1 - 50 out of 13,008