| Document |
Document Title |
|
7470330 |
A method of removing metal scale from surfaces that includes contacting the surfaces with a first aqueous solution of a chelating agent, allowing the chelating agent to dissolve the metal scale, acidifying the solution to form a precipit...
|
|
7462249 |
A surface treatment process for a metal article includes the following steps. Firstly, a metal article, made of at least one of copper and an alloy thereof, is provided. Secondly, a surface of the metal article is degreased. Thirdly, the...
|
|
7462248 |
A method for cleaning a photomask includes cleaning the photomask with a chemical cleaner, introducing a solution to the photomask, the solution is configured to react with residuals generated from the chemical cleaner to form insoluble ...
|
|
7452426 |
Process solutions comprising one or more surfactants are used to reduce the number of defects in the manufacture of semiconductor devices. In certain preferred embodiments, the process solution of the present invention may reduce defects...
|
|
7435301 |
Disclosed are a cleaning solution for preventing damage of a silicon germanium layer when cleaning a semiconductor device including the silicon germanium layer and a cleaning method using the same. The cleaning solution of a silicon germ...
|
|
7422641 |
A soft spray nozzle discharging a cleaning mist is vertically directed and fixed to an arm. A rinse nozzle discharging rinsing deionized water for suppressing obstruction is vertically fixed to the arm at a prescribed distance from the s...
|
|
7410544 |
A method for cleaning a metal plating tank is provided herein. In accordance with the method, the tank is exposed to a first acid ( 103 ), after which the tank is exposed to a second acid in the presence of a first oxidizing agent ( 107 ).
|
|
7402212 |
A method for cleaning a glass substrate before photoresist coating, which method can remove oxide compounds and organic residues from the surface of a metal layer of the glass substrate, comprises the steps of firstly providing an alkali...
|
|
7399366 |
Several products and processes for preventing the occurrence of rust stains resulting from irrigation systems using water having iron ions, such as well water, and for cleaning off rust stains resulting from the use of said irrigation sy...
|
|
7377984 |
Disclosed herein is a method of cleaning a photomask, which prevents haze from being generated on a surface of the photomask during a photolithography process. The photomask is heat treated to remove residual ions on a surface thereof an...
|
|
7377983 |
A method to prevent deposits on a ceramic surface comprising: (1) pretreating the surface by applying an aqueous solution containing from about 200 ppm to about 1000 ppm by weight of an amphoteric fluorosurfactant, and (2) periodically a...
|
|
7368057 |
A washcoat coating composition is disclosed that includes at least one water insoluble organic solvent and at least one polymer, such as an epoxy acrylic copolymer. A method of removing residual water from a mixture of residual water and...
|
|
7368019 |
A technique is provided to precludes elution of the nickel by infallibly removing the nickel adhering to the inner surface of plumbing hardware, realize a treatment for efficient (treating temperature, treating duration, etc.) preclusion...
|
|
7361231 |
Workpieces are loaded into a cleaning chamber. The cleaning chamber is pressurized with a first dense-phase cleaning fluid, the temperature and pressure of the first dense-phase fluid being maintained at less than about 1500 psi using a ...
|
|
7337788 |
Uncured solvent-based paint may be flushed from a paint delivery installation using a substantially non-aqueous composition containing one or more organic solvents and a polymer having acid and/or amine functional groups.
|
|
7331354 |
In process for cleaning tray columns which are used for the purposes of rectifiying liquids comprising (meth)acrylic compounds, a basic liquid is conveyed downward through the tray column and a gas is passed through the column in counter...
|
|
7329322 |
In an exhaust pipe, a rotating shaft takeoff connection is provided so as to support a rotating shaft for rotating a switching valve fixed thereon. The rotating shaft extends to the outside of the exhaust pipe and is provided with an int...
|
|
7314529 |
A soft spray nozzle discharging a cleaning mist is vertically directed and fixed to an arm. A rinse nozzle discharging rinsing deionized water for suppressing obstruction is vertically fixed to the arm at a prescribed distance from the s...
|
|
7305998 |
In one embodiment of the invention, a method of cleaning a workpiece is disclosed. The method comprises providing a mobile flushing unit and servicing the workpiece as follows: a) connecting a flexible hose of the mobile flushing unit to...
|
|
7267728 |
The present invention relates to a system and method for cleaning and/or treating a surface, preferably surfaces such as ceramic, steel, plastic, glass and/or painted surfaces such as the exterior surface of a vehicle. The system and met...
|
|
7264681 |
A cleaning apparatus and a cleaning method wherein cleaning and drying can be carried out in the same cleaning apparatus without the risk of reverse contamination of the cleaned object after the drying process. The cleaning apparatus inc...
|
|
7261847 |
A process for the functional regeneration of the porosity of the materials used to make molds ( 2 ) for moulding ceramic objects, when the pores have been damaged by use of the mold ( 2 ), comprises the sequential execution of at least t...
|
|
7252720 |
Prion infectivity adsorbed onto substrates (for example, chromatographic columns used to fractionate blood plasma) is removed by treatment with 2M sodium chloride. Optionally, the substrate is further washed with 0.1 M sodium hydroxide.
|
|
7252096 |
On-Line and Off-Line methods of simultaneously cleaning and disinfecting an industrial water system are described and claimed. The methods involve the addition to the water of the industrial water system of a Compound selected from the g...
|
|
7252095 |
In one embodiment of the invention, a method of cleaning a workpiece is disclosed. The method comprises providing a mobile flushing unit and servicing the workpiece as follows: a) connecting a flexible hose of the mobile flushing unit to...
|
|
7247208 |
Ammonia-free, HF-free cleaning compositions for cleaning photoresist and plasma ash residues from microelectronic substrates, and particularly to such cleaning compositions useful with and having improved compatibility with microelectron...
|
|
7244316 |
A two-step chemical treatment method for chemically conditioning a sensor element comprising an electrolyte in ionic communication with a first electrode and a second electrode is described. The method comprises treating at least a porti...
|
|
7229506 |
A process for pickling martensitic or ferritic stainless steel, preferably in the form of wires, tubes or rods, wherein the stainless steel is placed in contact with a pickling solution which has a temperature in the range 15 to 29° C. ...
|
|
7228865 |
An embodiment of the invention is a method of cleaning a material stack 2 that has a hard mask top layer 8 . The method involves cleaning the material stack 2 with a fluorine-based plasma etch. The method further involves rinsing th...
|
|
7226897 |
A composition having a first nonionic nonylphenol surfactant having an HLB value ranging from about 10 to about 15, a second nonionic nonylphenol surfactant having an HLB value ranging from about 16 to 20, an aqueous solvent, and optiona...
|
|
7208049 |
Process solutions comprising one or more surfactants are used to reduce the number of defects in the manufacture of semiconductor devices. In certain preferred embodiments, the process solution of the present invention may reduce defects...
|
|
7198680 |
A method for cleaning contaminated surfaces of surgical waste management equipment. The method includes rinsing surfaces of the equipment with water to remove water soluble contaminants and waste material. A rinse solution is applied to ...
|
|
7198052 |
In one embodiment of the invention, a method of cleaning a workpiece is disclosed. The method comprises providing a mobile flushing unit and servicing the workpiece as follows: a) connecting a flexible hose of the mobile flushing unit to...
|
|
7186301 |
Disclosed herein is a device and a method of cleaning a photomask, which prevents haze from being generated on a surface of the photomask during a photolithography process. The photomask is heat treated to remove residual ions on a surfa...
|
|
7186300 |
The present invention relates to methods of treating surfaces, to protect or clean said surfaces. The invention more particularly relates to the treatment of interior walls or surfaces, particularly indoor household walls or surfaces, to...
|
|
7169235 |
A method is suitable for cleaning substrates, after polishing, that require a high degree of cleanliness, such as semiconductor wafers, glass substrates, or liquid crystal displays. The method includes polishing a substrate using an abra...
|
|
7163588 |
Contaminants such as photoresist are quickly removed from a wafer having metal features, using water, ozone and a base such as ammonium hydroxide. Processing is performed at room temperature to avoid metal corrosion. Ozone is delivered i...
|
|
7125456 |
The invention relates to a method for cleaning a washing device ( 5 ) of an offset printing machine, according to which at least one washing device of said offset machine, which comprises a spray bar ( 11 ), is removed prior to the clean...
|
|
7097715 |
The present invention relates generally to cleaning systems, and more specifically to substrate cleaning systems, such as textile cleaning systems, utilizing an organic cleaning solvent and a pressurized fluid solvent. However, unlike co...
|
|
7077918 |
A coating is stripped off a work piece by applying a chromous and aluminiforous coat directly on the work piece and stripping the work piece with an alkaline solution containing a strong oxidant. A single-compartment system can be used, ...
|
|
7077915 |
Organic matter and metal impurities present on the surface of a photomask are removed. Foreign matter still adhering to the surface of the photomask is removed with H 2 gas dissolved water. The photomask is dried. Thus provided is a met...
|
|
7071153 |
The present invention is directed to a method of enhancing the appearance of a soiled porous surface. The inventive method includes applying a concentrated, alkaline, cleaning composition to the soiled porous surface. This concentrated, ...
|
|
7067016 |
A method for post-etch cleaning of a substrate with MRAM structures and MJT structures and materials is disclosed. The method includes inserting the substrate into a first brush box configured for double-sided mechanical cleaning of the ...
|
|
7052553 |
A non-destructive and simple method for cleaning a new or used electrostatic chuck comprises a wet cleaning process, which removes contaminants deposited on a surface of the electrostatic chuck.
|
|
7045021 |
A customizable car wash blending and method is provided. The method includes the steps of positioning a vehicle adjacent a set of sensors (step 10 ), measuring a variety of parametric data relating to macroscopic debris and surface film...
|
|
7041177 |
A method of removing soil an article including the steps of immersing said article in an alkaline composition having a concentration of at least one source of alkalinity about 0.25% or higher, dehydrating the soil and rehydrating the soi...
|
|
7037381 |
Method for stripping ceramic coatings from the surfaces of articles. The apparatus includes a dedicated pressure vessel, such as an autoclave, which is maintained at an elevated temperature. Caustic solution is preheated to a first eleva...
|
|
6991685 |
The invention relates to a method of low temperature cleaning and applying an antimicrobial treatment to food and beverage plant equipment. In addition, the method includes carbon dioxide compatible chemistry. The method may be achieved ...
|
|
6953507 |
The invention relates to a method of low temperature cleaning and applying an antimicrobial treatment to food and beverage plant equipment. In addition, the method includes carbon dioxide compatible chemistry. The method may be achieved ...
|
|
6936113 |
This invention relates to a method to facilitate the removal of adherent polymeric films from a hard surface occasioned by the evaporation of solvent from compositions containing an anionic acrylates copolymer, the method comprising inco...
|
