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7470330 |
A method of removing metal scale from surfaces that includes contacting the surfaces with a first aqueous solution of a chelating agent, allowing the chelating agent to dissolve the metal scale, acidifying the solution to form a precipit...
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7468106 |
The present invention provides a method for removing niobium-rich second-phase-particle (SPP) deposits from zirconium-niobium alloy components. The method comprises washing a freshly pickled and rinsed zirconium-niobium alloy component w...
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7462249 |
A surface treatment process for a metal article includes the following steps. Firstly, a metal article, made of at least one of copper and an alloy thereof, is provided. Secondly, a surface of the metal article is degreased. Thirdly, the...
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7462248 |
A method for cleaning a photomask includes cleaning the photomask with a chemical cleaner, introducing a solution to the photomask, the solution is configured to react with residuals generated from the chemical cleaner to form insoluble ...
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7459029 |
A cleaning apparatus of organic substances attached to a vapor-deposition mask for low molecular weight organic EL devices comprises a first stage for treating a vapor-deposition mask with a derivative of pyrrolidone, a second stage for ...
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7452426 |
Process solutions comprising one or more surfactants are used to reduce the number of defects in the manufacture of semiconductor devices. In certain preferred embodiments, the process solution of the present invention may reduce defects...
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7448397 |
Described are methods, systems, and chemistries for cleaning various components of semiconductor process equipment. A method in accordance with one embodiment cleans articles with differently contaminated interior and exterior surfaces b...
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7435301 |
Disclosed are a cleaning solution for preventing damage of a silicon germanium layer when cleaning a semiconductor device including the silicon germanium layer and a cleaning method using the same. The cleaning solution of a silicon germ...
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7422021 |
A method for cleaning an oil strainer in an oil pan of an internal combustion engine from which substantially all lubricant has been drained, the method comprising connecting a first conduit to said oil pan; introducing a cleaning fluid ...
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RE40463 |
A variable pressure spray type vehicle laundry apparatus in which a carriage is mounted for longitudinal displacement along overhead parallel beams and an inverted L shaped spray arm carrying both horizontally and vertically directed noz...
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7416612 |
A process for removing paint from a plastic substrate that typically includes immersing and optionally agitating the painted plastic substrate in a first chemical fluid, removing the substrate from the first chemical fluid, typically imm...
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7416611 |
In a method and apparatus for cleaning or processing a workpiece, a process gas is brought into contact with the workpiece by diffusion through a heated liquid layer on the workpiece, and by bulk transport achieved by entraining the gas ...
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7412979 |
The present invention relates to an apparatus and method for removing a coating material from a predetermined first portion of a container, while retaining the coating on a second portion of the container, or alternatively applying a coa...
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7410544 |
A method for cleaning a metal plating tank is provided herein. In accordance with the method, the tank is exposed to a first acid ( 103 ), after which the tank is exposed to a second acid in the presence of a first oxidizing agent ( 107 ).
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7406971 |
An improved method for flushing the residue from internal surfaces of cavities in, for example, turbine blades. In accordance with one aspect of the invention, provision is made for simultaneously flushing the internal cavities of a plur...
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7404903 |
A process for the separation of oil from invert mud drill cuttings. Invert mud drill cuttings are supplied to a mixing chamber of a jet pump. The invert mud drill cuttings are agitated within the jet pump to effect transformation of the ...
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7402362 |
A method and system is disclosed for reducing and monitoring precipitated defects on mask reticles. A predetermined gas is provided into an environment surrounding the reticle assembly for reducing a formation of the precipitated defects...
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7398785 |
A tool for cleaning a culvert comprises a rod having a center longitudinal axis, a housing having a center longitudinal axis and coupled coaxially to the rod, the housing having an interior chamber, the housing has an outside dimension t...
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7396418 |
A process for removing particles from a reticle is described, wherein the process is performed by using a pellicle particle detector (PPD) and a particle removing tool disposed in front of the PPD as well as fixed to the PPD. The particl...
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7396417 |
A degreasing method for descaling or removing laser scales from iron-containing metal part surface by treating the iron-containing metal part surfaces that is optionally tainted with laser scales with an aqueous solution containing at le...
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7390368 |
Fiber optic connector end faces are cleaned effectively by exposing the fiber optic connector end face to the disclosed predominantly aqueous solution and wiping the fiber optic end face dry. The predominantly water-based cleaning soluti...
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7381279 |
An article of manufacture, a system, and a method for at least partially deionizing water, including but not limited to converting tap water into essentially deionized water that can be used for numerous purposes including, but not limit...
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7380557 |
A heat exchanger coil pipe is internally cleaned off dirt deposits by forcing ice and water to pass the pipe. A system for carrying out the cleaning comprises a suction pump, a wastewater collecting tank, a suction hose for connection be...
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7377984 |
Disclosed herein is a method of cleaning a photomask, which prevents haze from being generated on a surface of the photomask during a photolithography process. The photomask is heat treated to remove residual ions on a surface thereof an...
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7377982 |
The present invention discloses a method for the removal of a number of molecular contaminants from surfaces within a device. A purge gas containing oxygen and/or water is introduced into the interior of the device, contacting at least a...
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7377283 |
A method and apparatus for substantially cleaning fill from a borehole is described variously including running a coiled tubing assembly into the wellbore, creating a fluid vortex by circulating cleaning fluid through the coiled tubing, ...
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7374621 |
A solution of ammonium citrate and benzotriazole (BTA) is used to clean thin film magnetic head wafers. When used with brushing, the solution is a highly efficient process for removing particles, such as those generated during chemical-m...
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7368020 |
A method of transporting a reticle is disclosed. The reticle is placed in a reticle carrier that has an ionizer. Moreover, the reticle may be attached with a pellicle. The pellicle consists of a pellicle frame and a pellicle film stretch...
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7367344 |
The present invention relates to methods and apparatus for the use of atmospheric pressure non-thermal plasma to clean and sterilize the surfaces of liquid handling devices. In one embodiment, a method of cleaning a fluid handling device...
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7364625 |
Described are methods of rinsing and processing devices such as semiconductor wafers wherein the device is rinsed with using a surface tension reducing agent; the method may include a subsequent drying step which preferably incorporates ...
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7361234 |
Stepper and/or scanner machines including cleaning devices and methods for cleaning stepper and/or scanner machines are disclosed herein. In one embodiment, a stepper and/or scanner machine includes a housing, an illuminator, a lens, a w...
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7361231 |
Workpieces are loaded into a cleaning chamber. The cleaning chamber is pressurized with a first dense-phase cleaning fluid, the temperature and pressure of the first dense-phase fluid being maintained at less than about 1500 psi using a ...
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7354485 |
A method of cleaning a surface which comprises the step of applying an aqueous cleaning solution to the surface wherein the active cleaning ingredient of the aqueous solution consists essentially of a lignosulfonate. It has been found th...
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7351295 |
A method for cleaning and polishing a rusted iron-containing metal surface is disclosed. The metal surface is contacted with a composition containing fluorometallate anions of a Group IVB metal.
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7344603 |
Polysilazane is treated with a single or mixed solvent comprising one or more members selected from the group consisting of xylene, anisole, decalin, cyclohexane, cyclohexene, methylcyclohexane, ethylcyclohexane, limonene, hexane, octane...
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7341067 |
A method of cleaning a heat transfer element within a boiler furnace is provided. The method includes the steps of allowing a furnace to operate and deposit ash on a heat transfer element, determining an efficiency rate for at least one ...
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7338563 |
A combination of parallel processes is disclosed to provide optimal re-mediation operations for contaminated soil. Soils with high levels of heavy petroleum hydrocarbons are directed to a thermal process for destruction in a combustion p...
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7334941 |
An apparatus for washing items comprises a generally cylindrical mesh housing; a first wall and a second wall, said first wall and said second wall being positioned within said housing so as to define first, second and third compartments...
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7332042 |
Process for the treatment of cork or a cork-based material particularly with a view towards extracting contaminating organic compounds, in which said cork or said cork-based material is put into contact with a dense fluid under pressure ...
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7329322 |
In an exhaust pipe, a rotating shaft takeoff connection is provided so as to support a rotating shaft for rotating a switching valve fixed thereon. The rotating shaft extends to the outside of the exhaust pipe and is provided with an int...
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7329321 |
A method for removing post-processing residues in a single wafer cleaning system is provided. The method initiates with providing a first heated fluid to a proximity head disposed over a substrate. Then, a meniscus of the first fluid is ...
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7322368 |
A plasma cleaning gas for CVD chamber is a gas for cleaning silicon-containing deposits on the surface of a CVD chamber inner wall and the surfaces of members placed inside the CVD chamber after film forming treatment on a substrate by a...
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7320328 |
An apparatus and process are described delivering alternating pulses of fluid and air within either a fully sealed or partially sealed tooling enclave in the direct presence of a constant or variable vacuum source for the purpose of remo...
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7305998 |
In one embodiment of the invention, a method of cleaning a workpiece is disclosed. The method comprises providing a mobile flushing unit and servicing the workpiece as follows: a) connecting a flexible hose of the mobile flushing unit to...
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7300527 |
A method for activating the surface of a base material and an apparatus thereof, which is suited to be utilized for pretreatment in electrochemical treatment such as, for example, electroplating or the like, in which the surface of a bas...
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7297260 |
A system and method for washing engines and for collecting and treating the waste water from engine washing operations. The system includes a collecting device for collecting waste liquid during a washing operation of the engine and a tr...
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7297212 |
The present invention discloses a method for the removal of a number of molecular contaminants from surfaces within a device. A purge gas containing oxygen and/or water is introduced into the interior of the device, contacting at least a...
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7293569 |
Compositions and methods for cleaning deposition systems utilizing alkylsilanes are described herein. In an embodiment, a method of cleaning a semiconductor fabrication system comprises flushing the system with a solvent comprising at le...
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7287535 |
A work washing apparatus including a transfer unit for controlling forward and rearward movements of a work, a table moved by the transfer unit, carrying out the washing of the work from upper and lower surfaces thereof and provided with...
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7287534 |
A process for cleaning apparatus in which (meth)acrylic acid-containing organic solvents have been treated and/or generated and contain fouling and/or polymer and residues of organic solvent, in which the apparatus contents are subjected...
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