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7470330 |
A method of removing metal scale from surfaces that includes contacting the surfaces with a first aqueous solution of a chelating agent, allowing the chelating agent to dissolve the metal scale, acidifying the solution to form a precipit...
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7468106 |
The present invention provides a method for removing niobium-rich second-phase-particle (SPP) deposits from zirconium-niobium alloy components. The method comprises washing a freshly pickled and rinsed zirconium-niobium alloy component w...
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7462249 |
A surface treatment process for a metal article includes the following steps. Firstly, a metal article, made of at least one of copper and an alloy thereof, is provided. Secondly, a surface of the metal article is degreased. Thirdly, the...
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7462248 |
A method for cleaning a photomask includes cleaning the photomask with a chemical cleaner, introducing a solution to the photomask, the solution is configured to react with residuals generated from the chemical cleaner to form insoluble ...
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7459029 |
A cleaning apparatus of organic substances attached to a vapor-deposition mask for low molecular weight organic EL devices comprises a first stage for treating a vapor-deposition mask with a derivative of pyrrolidone, a second stage for ...
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7459028 |
A method and apparatus for removing soil from an inner surface of a lumen wall of a medical instrument are disclosed. A carrier gas entrains particles capable of sublimation at room temperature and transports the particles into and throu...
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7452426 |
Process solutions comprising one or more surfactants are used to reduce the number of defects in the manufacture of semiconductor devices. In certain preferred embodiments, the process solution of the present invention may reduce defects...
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7448397 |
Described are methods, systems, and chemistries for cleaning various components of semiconductor process equipment. A method in accordance with one embodiment cleans articles with differently contaminated interior and exterior surfaces b...
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7435303 |
The invention relates to the use of agents, which contain at least one disinfection system based on selected organic peracids and combinations of peracids, in automatically functioning systems, in which fragile medical appliances, in par...
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7435301 |
Disclosed are a cleaning solution for preventing damage of a silicon germanium layer when cleaning a semiconductor device including the silicon germanium layer and a cleaning method using the same. The cleaning solution of a silicon germ...
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7416612 |
A process for removing paint from a plastic substrate that typically includes immersing and optionally agitating the painted plastic substrate in a first chemical fluid, removing the substrate from the first chemical fluid, typically imm...
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7412979 |
The present invention relates to an apparatus and method for removing a coating material from a predetermined first portion of a container, while retaining the coating on a second portion of the container, or alternatively applying a coa...
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7410545 |
A substrate immersed in pure water held inside a processing bath disposed to a cleaning unit 1 and accordingly washed, as it bears an aqueous film on its surface, is transported by a substrate transportation mechanism 3 to a spin-pro...
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7410544 |
A method for cleaning a metal plating tank is provided herein. In accordance with the method, the tank is exposed to a first acid ( 103 ), after which the tank is exposed to a second acid in the presence of a first oxidizing agent ( 107 ).
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7410543 |
Resists can be removed while metal contamination of wafers, etc. and generation of particles, and growth of oxide films are suppressed. A substrate processing method comprises feeding a processing gas, such as ozone gas, into a processin...
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7405164 |
In an apparatus and method for removing a photoresist structure from a substrate, a chamber for receiving the substrate includes a showerhead for uniformly distributing a mixture of water vapor and ozone gas onto the substrate. The showe...
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7404863 |
A method of thinning a silicon wafer in a controllable cost-effective manner with minimal chemical consumption. The wafer is placed into a process chamber, after which ozone gas and HF vapor are delivered into the process chamber to reac...
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7402213 |
Described herein is a method of removing an organic-containing material from an exposed surface of a large substrate (at least 0.25 m 2 ). The substrate may comprise an electronic device. The exposed surface is treated with a stripping s...
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7399367 |
A rust-preventive water-oil separating cleaner composition contacts a part to be cleaned to which an oil attaches. The composition separates the oil from the part, while providing the part with a rust-preventive property, thus forming an...
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7399366 |
Several products and processes for preventing the occurrence of rust stains resulting from irrigation systems using water having iron ions, such as well water, and for cleaning off rust stains resulting from the use of said irrigation sy...
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7396418 |
A process for removing particles from a reticle is described, wherein the process is performed by using a pellicle particle detector (PPD) and a particle removing tool disposed in front of the PPD as well as fixed to the PPD. The particl...
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7396417 |
A degreasing method for descaling or removing laser scales from iron-containing metal part surface by treating the iron-containing metal part surfaces that is optionally tainted with laser scales with an aqueous solution containing at le...
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7392811 |
A delivery head is provided that includes a delivery arm and a spray diverter constructed to divert a multiple phase treatment composition flowing through the delivery arm and diverted by the spray diverter to provide a target spray patt...
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7390368 |
Fiber optic connector end faces are cleaned effectively by exposing the fiber optic connector end face to the disclosed predominantly aqueous solution and wiping the fiber optic end face dry. The predominantly water-based cleaning soluti...
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7387689 |
Methods for processing substrate through a head that is configured to be placed in close non-contact proximity to a surface of a substrate are provided. One method includes applying a first fluid onto the surface of the substrate from co...
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7387688 |
The invention relates to a method of operating a dishwasher with a central control unit by measuring the turbidity of the rinsing liquid and establishing the course of the program as a function of the turbidity of the rinsing liquid, the...
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7381279 |
An article of manufacture, a system, and a method for at least partially deionizing water, including but not limited to converting tap water into essentially deionized water that can be used for numerous purposes including, but not limit...
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7380557 |
A heat exchanger coil pipe is internally cleaned off dirt deposits by forcing ice and water to pass the pipe. A system for carrying out the cleaning comprises a suction pump, a wastewater collecting tank, a suction hose for connection be...
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7377984 |
Disclosed herein is a method of cleaning a photomask, which prevents haze from being generated on a surface of the photomask during a photolithography process. The photomask is heat treated to remove residual ions on a surface thereof an...
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7377983 |
A method to prevent deposits on a ceramic surface comprising: (1) pretreating the surface by applying an aqueous solution containing from about 200 ppm to about 1000 ppm by weight of an amphoteric fluorosurfactant, and (2) periodically a...
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7377982 |
The present invention discloses a method for the removal of a number of molecular contaminants from surfaces within a device. A purge gas containing oxygen and/or water is introduced into the interior of the device, contacting at least a...
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7374621 |
A solution of ammonium citrate and benzotriazole (BTA) is used to clean thin film magnetic head wafers. When used with brushing, the solution is a highly efficient process for removing particles, such as those generated during chemical-m...
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7371289 |
Apparatus for cleaning and doping a pin 2 of a tubular 3 during the making or breaking of a string on a well platform. The apparatus comprises a housing 4 having first and second conosed ends 6,7 and arranged in used to be secure...
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7364626 |
Substrate cleaning apparatus and method capable of preventing adhesion of particles to a substrate irrespective of being hydrophilic or hydrophobic are provided. Although a cleaning liquid ejected from a two-fluid nozzle 36 rebounds fr...
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7364625 |
Described are methods of rinsing and processing devices such as semiconductor wafers wherein the device is rinsed with using a surface tension reducing agent; the method may include a subsequent drying step which preferably incorporates ...
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7361231 |
Workpieces are loaded into a cleaning chamber. The cleaning chamber is pressurized with a first dense-phase cleaning fluid, the temperature and pressure of the first dense-phase fluid being maintained at less than about 1500 psi using a ...
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7354484 |
A cleaning processing apparatus comprises a spin chuck for holding a wafer W, an under plate being positioned to face the back surface of the wafer W with a prescribed gap provided therebetween, a support member for supporting the under ...
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7351295 |
A method for cleaning and polishing a rusted iron-containing metal surface is disclosed. The metal surface is contacted with a composition containing fluorometallate anions of a Group IVB metal.
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7344603 |
Polysilazane is treated with a single or mixed solvent comprising one or more members selected from the group consisting of xylene, anisole, decalin, cyclohexane, cyclohexene, methylcyclohexane, ethylcyclohexane, limonene, hexane, octane...
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7337788 |
Uncured solvent-based paint may be flushed from a paint delivery installation using a substantially non-aqueous composition containing one or more organic solvents and a polymer having acid and/or amine functional groups.
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7332042 |
Process for the treatment of cork or a cork-based material particularly with a view towards extracting contaminating organic compounds, in which said cork or said cork-based material is put into contact with a dense fluid under pressure ...
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7331354 |
In process for cleaning tray columns which are used for the purposes of rectifiying liquids comprising (meth)acrylic compounds, a basic liquid is conveyed downward through the tray column and a gas is passed through the column in counter...
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7322369 |
Methods of detaching microorganisms (e.g., bacteria) from, or of inhibiting microbial (e.g., bacterial) attachment to, animal or poultry carcasses or seafood or parts thereof, wherein the method involves contacting animal or poultry carc...
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7314529 |
A soft spray nozzle discharging a cleaning mist is vertically directed and fixed to an arm. A rinse nozzle discharging rinsing deionized water for suppressing obstruction is vertically fixed to the arm at a prescribed distance from the s...
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7305998 |
In one embodiment of the invention, a method of cleaning a workpiece is disclosed. The method comprises providing a mobile flushing unit and servicing the workpiece as follows: a) connecting a flexible hose of the mobile flushing unit to...
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7300527 |
A method for activating the surface of a base material and an apparatus thereof, which is suited to be utilized for pretreatment in electrochemical treatment such as, for example, electroplating or the like, in which the surface of a bas...
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7297212 |
The present invention discloses a method for the removal of a number of molecular contaminants from surfaces within a device. A purge gas containing oxygen and/or water is introduced into the interior of the device, contacting at least a...
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7293569 |
Compositions and methods for cleaning deposition systems utilizing alkylsilanes are described herein. In an embodiment, a method of cleaning a semiconductor fabrication system comprises flushing the system with a solvent comprising at le...
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7288156 |
The invention provides a water supplying apparatus and method thereof which has a high capacity of peeling and removing a disused material such as a resist film and the like, and can efficiently use water vapor. A water supplying apparat...
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7282100 |
A system for cleaning acid rain and mineral deposits from glass and/or painted surfaces includes powdered kaolin clay. The glass is preferably cleaned with this system, then a system for more effectively delivering Fibershield 218 and li...
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