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7459028 |
A method and apparatus for removing soil from an inner surface of a lumen wall of a medical instrument are disclosed. A carrier gas entrains particles capable of sublimation at room temperature and transports the particles into and throu...
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7422641 |
A soft spray nozzle discharging a cleaning mist is vertically directed and fixed to an arm. A rinse nozzle discharging rinsing deionized water for suppressing obstruction is vertically fixed to the arm at a prescribed distance from the s...
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7410543 |
Resists can be removed while metal contamination of wafers, etc. and generation of particles, and growth of oxide films are suppressed. A substrate processing method comprises feeding a processing gas, such as ozone gas, into a processin...
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7407554 |
Methods of developing or removing a select region of block copolymer films using a polar supercritical solvent to dissolve a select portion are disclosed. In one embodiment, the polar supercritical solvent includes chlorodifluoromethane,...
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7396418 |
A process for removing particles from a reticle is described, wherein the process is performed by using a pellicle particle detector (PPD) and a particle removing tool disposed in front of the PPD as well as fixed to the PPD. The particl...
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7377982 |
The present invention discloses a method for the removal of a number of molecular contaminants from surfaces within a device. A purge gas containing oxygen and/or water is introduced into the interior of the device, contacting at least a...
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7371289 |
Apparatus for cleaning and doping a pin 2 of a tubular 3 during the making or breaking of a string on a well platform. The apparatus comprises a housing 4 having first and second conosed ends 6,7 and arranged in used to be secure...
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7364625 |
Described are methods of rinsing and processing devices such as semiconductor wafers wherein the device is rinsed with using a surface tension reducing agent; the method may include a subsequent drying step which preferably incorporates ...
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7361233 |
The pulsed partial pressure hydrogen cleaning of cobalt-based alloys in turbine components is achieved by disposing the component within a vacuum furnace and heating the component. Upon heating to about 1400° F., a partial pressure hydr...
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7331354 |
In process for cleaning tray columns which are used for the purposes of rectifiying liquids comprising (meth)acrylic compounds, a basic liquid is conveyed downward through the tray column and a gas is passed through the column in counter...
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7329322 |
In an exhaust pipe, a rotating shaft takeoff connection is provided so as to support a rotating shaft for rotating a switching valve fixed thereon. The rotating shaft extends to the outside of the exhaust pipe and is provided with an int...
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7314529 |
A soft spray nozzle discharging a cleaning mist is vertically directed and fixed to an arm. A rinse nozzle discharging rinsing deionized water for suppressing obstruction is vertically fixed to the arm at a prescribed distance from the s...
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7300524 |
A substrate cleaning apparatus includes an indexer, a front surface cleaning unit for cleaning the front surface of a substrate, a back surface cleaning unit for cleaning the back surface of the substrate, a particle inspecting unit for ...
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7297212 |
The present invention discloses a method for the removal of a number of molecular contaminants from surfaces within a device. A purge gas containing oxygen and/or water is introduced into the interior of the device, contacting at least a...
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7288156 |
The invention provides a water supplying apparatus and method thereof which has a high capacity of peeling and removing a disused material such as a resist film and the like, and can efficiently use water vapor. A water supplying apparat...
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7287534 |
A process for cleaning apparatus in which (meth)acrylic acid-containing organic solvents have been treated and/or generated and contain fouling and/or polymer and residues of organic solvent, in which the apparatus contents are subjected...
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7282100 |
A system for cleaning acid rain and mineral deposits from glass and/or painted surfaces includes powdered kaolin clay. The glass is preferably cleaned with this system, then a system for more effectively delivering Fibershield 218 and li...
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7276449 |
A method for moving resist stripper across the surface of a semiconductor substrate includes applying a wet chemical resist stripper, such as an organic or oxidizing wet chemical resist stripper, to at least a portion of a photomask posi...
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7264679 |
In a method of cleaning a surface of a substrate processing chamber component to remove process deposits, the component surface is cooled to a temperature below about −40° C. to fracture the process deposits on the surface. The surfac...
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7252717 |
A method of cleaning a lubrication system of a machine includes removing existing lubricant and circulating a cleaning fluid through the lubrication system. After the cleaning fluid has been removed, a neutralising fluid is circulated th...
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7247210 |
A method for treating CIP equipment is provided according to the present invention. The CIP equipment includes process equipment. The method includes steps of treating the CIP equipment with a multiple phase treating composition comprisi...
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7231927 |
An object of the invention is to provide a method and an apparatus for recycling plastics which is improved with respect to operation efficiency, operation environment, lowering degradation of plastics, recycling cost and environment loa...
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7209625 |
The present invention is directed to a method for cleaning a section of an optical waveguide removed from its jacket, in which the optical waveguide section is inserted into a treatment cell, sprayed with a cleaning fluid, blasted with c...
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7189291 |
The present invention discloses a method for the removal of a number of molecular contaminants from surfaces within a device. A purge gas containing oxygen and/or water is introduced into the interior of the device, contacting at least a...
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7189290 |
A method and apparatus for cleaning a source gas introduction pipe, which can prevent strong adhesion of contaminant mainly containing carbon powder on an outer surface of the source gas introduction pipe to easily remove the contaminant...
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7186299 |
A method for cleaning and drying semiconductor wafers improves device yield by providing more advanced control of the ratio of drying fluid to cleaning fluid, for example the ratio of N2 vapor to IPA vapor. In addition, a quick drain pro...
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7172657 |
In a state of the inside of a treatment chamber of treatment equipment being evacuated, therein a cleaning gas containing trifluoroaceticacid (TFA) as a cleaning agent is supplied. Metal such as copper used in the formation of an interco...
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7168436 |
The invention relates to a gas for removing deposits by a gas-solid reaction. This gas includes a hypofluorite that is defined as being a compound having at least one OF group in the molecule. Various deposits can be removed by the gas, ...
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7153372 |
Gas is introduced prior to a flooding process of a vacuum chamber of a vacuum installation, into coverings of elements, which coverings can be ventilated such that solid bodies are blown out of said coverings thereby preventing a penetra...
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7153370 |
The present application discloses a method of cleaning a semiconductor wafer by mounting a wafer to a chuck, positioning a gas guard, defining therein a chamber having an open bottom, immediately above the layer of water, spraying de-ion...
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7141123 |
A cleanling apparatus for removing contaminants from the surface of a substrate includes two parts: one which produces an aerosol including frozen particles and directs the aerosol onto the surface of the substrate to remove contaminants...
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7112247 |
In a method and system for removing particles from a surface, a portable, compressed gas can is provided containing a particle removal gas. An air ionizer unit is connected to the gas can. A high voltage potential is selectively actuated...
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7108001 |
A supercritical fluid cleaning system uses process fluid for operating rotary motors in the chamber with fluid bearings and fluid load levitation for rotating workpieces and impellers. Rotating speed and direction sensors and a home posi...
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7097717 |
Disclosed is a method and device for collecting particulate contaminants removed using a CO 2 decontamination medium from an early step of a decontamination process. The device removes particulate contaminants from a contaminated subjec...
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7097714 |
The cleaning of particles from an electrostatic chuck. In one embodiment, a method of cleaning an electrostatic chuck in a processing chamber is disclosed. The method comprises directing a flow of gas across the electrostatic chuck to di...
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7087124 |
A high pressure water stream ( 14 ) is discharged onto a surface to be cleaned. An ozone/water stream ( 16 ) is discharged on the same surface for sanitizing the surface. The high pressure water and ozone/water streams ( 14, 16 ) are dis...
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7087123 |
A high pressure water stream ( 14 ) is discharged onto a surface to be cleaned. An ozone/water stream ( 16 ) is discharged on the same surface for sanitizing the surface. The high pressure water and ozone/water streams ( 14, 16 ) are dis...
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7060138 |
A system and method for cleaning boxes used for handling flat media includes a rotor rotatably mounted within an enclosure, with spray nozzles in the enclosure for spraying fluid toward the rotor. The rotor has at least one box holder as...
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7047984 |
A cleaning device for use in the production of semiconductor components comprises two feed devices with which a fluid medium is guided across a respective surface of an object to be cleaned so that different faces of the object are simul...
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7045022 |
The present invention provides a method and process for removing adherent molten metal from a surface by applying a non-wetting agent for the metal to the surface or to the adherent molten metal. The non-wetting agent may be a pressurize...
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7037382 |
A three-dimensional printer uses inkjet-type printheads to rapidly prototype, or print, a three-dimensional model. A powder feeder includes a conveyor system and a metering system to deliver powder to a build area in measured quantities....
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7029539 |
A method for processing a wafer in a spin, rinse, and dry (SRD) module is provided. The method includes engaging a wafer in a process plane, spinning the wafer in the process plane, and cleaning a top surface and a bottom surface of the ...
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7029538 |
In the drying step of the single wafer type substrate cleaning system for cleaning wafers not stored in a cassette, in a sealed cleaning housing, a spin drying treatment is applied to the wafer when the wafer is supported and rotated at ...
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7022193 |
An apparatus and method for treating surfaces of semiconductor wafers with a reactive gas, such as ozone, utilizes streams of gaseous material ejected from a gas nozzle structure to create depressions on or holes through a boundary layer...
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7018481 |
There is disclosed a substrate treating method comprising supplying a treating solution onto a substrate, and continuously discharging a first cleaning solution to the substrate from a first discharge region disposed in a nozzle, while m...
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7005872 |
A test fixture for an electronic device is provided that removes debris from a socket of the test fixture using back side air blow off. In general, the test fixture includes a circuit board, a socket on a front side of the circuit board,...
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6986817 |
A method of automatic cleaning of cooking cavities of cooking equipment for food processing includes the introduction of steam at a temperature of at least 100.deg. C. from a supply line and nozzle into a cooking cavity for a time period...
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6986815 |
A method of clearing residue from a fluid conduit includes commencing flush fluid flow through the fluid conduit and injecting a first fluid into the fluid conduit at a first point to induce turbulent flow of the flush fluid. The first f...
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6982006 |
A general method and apparatus for treating materials at high speed comprises the steps of dissolving a relatively high concentration ozone gas in a solvent at a relatively low predetermined temperature T 1 to form an ozone-solvent solu...
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6981508 |
Provided herein is a method for cleaning a process chamber for semiconductor and/or flat panel display manufacturing. This method comprises the steps of converting a non-cleaning feed gas to a cleaning gas in a remote location and then d...
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