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7405164 |
In an apparatus and method for removing a photoresist structure from a substrate, a chamber for receiving the substrate includes a showerhead for uniformly distributing a mixture of water vapor and ozone gas onto the substrate. The showe...
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7392812 |
The invention provides a substrate processing apparatus including a processing tank for processing substrates, a transporting path provided along the processing tank, a substrate transporting device moving along the transporting path for...
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7384484 |
After subjected to a developing process, a rinsing process and a replacing process in this order in a developing unit 10 A, 10 B, a substrate W wet with an anti-drying solution is wet-transported to a supercritical drying unit 20 by ...
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7346956 |
An automatic cart wash apparatus. The automatic cart wash apparatus provides improved cleaning of stock carts on a regular basis over manual cleaning by store employees. The automatic cart wash apparatus includes three main stages: a deb...
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7332440 |
A wet etching apparatus and method to shorten processing time and to eliminate formation of unintended mask pattern are described. In the conventional art, after a mask pattern is formed, alien substances such as water mist or stain are ...
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7284560 |
A liquid processing apparatus has a substrate rotating device including a holder for holding a substrate and a motor, a chamber for applying the liquid processing to the substrate, a posture changing mechanism for changing the posture of...
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7267128 |
A substrate treating apparatus for treating substrates includes a treating tank for receiving and treating the substrates, a holding device movable, while holding the substrates in a cantilever mode, between a treating position in the tr...
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7252098 |
A method and apparatus for cleaning, rinsing and Marangoni drying substrates is provided. A line of fluid is sprayed along a substrate surface forming an air/fluid interface line, and a line of drying vapor is supplied to the interface l...
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7182820 |
Methods and apparatus for cleaning hearing aid devices are disclosed. Drying is facilitated in hearing instruments through a novel combination of heater and desiccant in an essentially closed system. Greater efficiency is obtained by min...
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7114508 |
Cleaning apparatus having multiple wash tanks for washing articles in a carbon dioxide dry cleaning system employing a liquid carbon dioxide cleaning solution are provided. Cleaning apparatus having multiple wash tanks of the present inv...
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7086405 |
A screenings washer having a hopper, a grinder downstream of the hopper, and a washer downstream of the grinder. The washer includes an auger rotor that receives the screenings ground by the grinder, a spray wash system that sprays a was...
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7080650 |
A screenings washer having a hopper, a grinder downstream of the hopper, and a washer downstream of the grinder. The washer includes an auger rotor that receives the screenings ground by the grinder, a spray wash system that sprays a was...
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7060422 |
An apparatus for supercritical processing and non-supercritical processing of a workpiece comprises a transfer module, a supercritical processing module, a non-supercritical processing module, and a robot. The transfer module includes an...
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7011714 |
The invention relates to a method and a device for treating surfaces of metallic strip material ( 1 ), especially for pickling rolled material, in a treatment channel ( 2 ), with a pickling medium ( 3 ) containing acid. Jets ( 4 ) are se...
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6945258 |
A cleaning processing system including a wafer transfer device, a wafer detecting sensor for detecting a wafer, a memory for storing the position and direction of an extra wafer present inside the cleaning processing system when the powe...
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6941956 |
A substrate treating method for treating substrates with a treating solution includes a step of heating a treating solution containing sulfuric acid, and treating, with the treating solution, the substrates coated with a film material in...
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6926798 |
An apparatus for supercritical processing and non-supercritical processing of a workpiece comprises a transfer module, a supercritical processing module, a non-supercritical processing module, and a robot. The transfer module includes an...
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6923872 |
The invention relates to an arrangement and a method for cleaning fine solid particles from a continuously flowing liquid suspension. According to the invention, alternate emptying of cleaned liquid in at least two decanting chambers ( 3...
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6913028 |
A flexible container for liquid transport made of a flexible material includes a top face portion, a bottom face portion, and a peripheral face portion connecting the top face portion and the bottom face portion. An air tight, water resi...
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6910489 |
An apparatus containing a composition suitable for eliminating a thermosetting resin is disclosed. In the composition, tetra methyl ammonium hydroxide (TMAH) is included so as to eliminate the thermosetting resin. Accordingly, the compos...
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6899109 |
A system for processing a wafer includes a cleaning module configured to only clean the back side of the wafer so as to remove unwanted particles therefrom before performing subsequent processing tasks on the process side of the wafer. T...
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6887358 |
An installation for processing wafers with a plurality of fabrication units and a plurality of measurement units as well as a transport system for transporting the wafers, is described. A transport control unit, which detects a capacity ...
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6849153 |
A method for removal of post reactive ion etch sidewall polymer rails on a Al/Cu metal line of a semiconductor or microelectronic composite structure comprising:
1) supplying a mixture of an etching gas and an acid neutralizing ga...
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6833109 |
In an apparatus, after completion of a CMP (i.e., chemical mechanical polishing) operation of a semiconductor wafer, the thus polished wafer is temporarily stored in a water tank before it is subjected to a post-CMP cleaning operation. D...
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6823876 |
A method of cleaning and maintenance used for a rotational etching tool, combining the physical characteristics of water (splashed off after striking the surface of a spinning wafer) and a PM (preventive maintenance) computer program, ca...
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6818178 |
A heat sterilization process for small, washed, and bagged articles such as vial stoppers includes a conditioning or air removal phase prior to sterilization. During the air removal phase, a substantial majority of the liquid moisture is...
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6799589 |
In the art of wet-cleaning a substrate by etching with a cleaning solution prepared by dissolving hydrofluoric acid as an active component in water, using the process of measuring the concentration of a predetermined component regularly ...
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6792957 |
A wet etching apparatus and method to shorten processing time and to eliminate formation of unintended mask pattern are described. In the conventional art, after a mask pattern is formed, alien substances such as water mist or stain are ...
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6763839 |
A substrate cleaning system for cleaning wafers using a sheet-type wet cleaning treatment. The system has a sealable system body, a loading/unloading booth having a substrate carry-in section in which a plurality of substances are stocke...
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6748960 |
An apparatus for supercritical processing of multiple workpieces comprises a transfer module, first and second supercritical processing modules, and a robot. The transfer module includes an entrance. The first and second supercritical pr...
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6746543 |
A cleaning apparatus and a cleaning method for cleaning a object are provided. In the cleaning apparatus, a drying chamber 42 and a cleaning bath 41 are separated from each other up and down, respectively. Thus, a space in the drying...
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6745783 |
To provide a cleaning processing method and a cleaning processing apparatus which can improve cleaning efficiency. The apparatus is structured to install processing units 11 a- 11 d which provide more than one kind of chemical liquids...
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6742529 |
A system for recycling reusable resin mold products recovered from discarded apparatuses is disclosed. This recycling system includes a crushing system for crushing resin mold products one kind by one kind into crushed resinous pieces an...
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6732750 |
A semiconductor wafer cleaning apparatus and method uses only one inner bath for chemical solution and de-ionized water cleaning, and includes a marangoni dryer for cleaning and drying semiconductor wafers. The apparatus includes a loadi...
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6701942 |
A cleaning apparatus for removing contaminants from the surface of a substrate includes two parts: one which produces an aerosol including frozen particles and directs the aerosol onto the surface of the substrate to remove contaminants ...
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6647998 |
An electrostatic charge-free solvent-type dryer for drying semiconductor wafers after a wet bench process is disclosed in a preferred embodiment and in an alternate embodiment. In the preferred embodiment, the electrostatic charge-free s...
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6647642 |
A cleaning processing apparatus and method of wafers W held by a rotor capable of holding a plurality of wafers W, which is one embodiment of the liquid processing apparatus of the present invention, comprises an outside chamber, an insi...
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6641781 |
During the treatment, in particular cleaning, disinfecting and drying, of used, dirty endoscopes, in order to render them suitable once again for subsequent use, the following steps take place: placing a used, dirty endoscope in a rack, ...
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6634370 |
Liquid treatment units are disposed in multi-tiers surrounding a main-arm 35 . Among liquid treatment units, plating units M 1 through M 4 are disposed on a lower tier side, and a unit for post-treatment process such as a cleaning uni...
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6625901 |
A dryer for drying a substrate includes: a bath containing a fluid; a chamber; and an isopropyl alcohol delivery system supplying isopropyl alcohol vapor to the interface between the substrate and the fluid when the substrate is removed ...
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6622738 |
An apparatus and system for removing photoresist or other organic material from a substrate such as a semiconductor wafer is provided. The apparatus and system includes a chamber for partially immersing the substrate in a solvent (e.g., ...
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6620257 |
There is disclosed a scrub cleaning device which can reduce cleaning time and which requires no large-scaled device for transferring a substrate to the next cleaning process. The scrub cleaning device comprises: a scrub pad 10 provided...
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6616771 |
A computer-implemented method and system for cleaning a contaminated cannula so that it may be reused includes moving the contaminated cannula from a drug reconstitution station where the cannula is used to prepare a drug solution into a...
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6615852 |
A machine for cleaning a die by using electrolysis and ultrasonic vibration which has in combination a degreasing processing system, an electrolytic-cleaning system with an electrolyte circulator system, and a rinse system. The die, in a...
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6613156 |
A photoresist stripping apparatus and a corresponding method for removing photoresist layers after a patterned polyimide layer is developed. The photoresist-stripping apparatus includes a transporting unit, a stripping unit, a washing un...
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6595220 |
An apparatus for conveying a workpiece as used to convey the workpiece such as a semiconductor wafer, a glass substrate or liquid crystal panel, between processing apparatuses when the workpiece is processed in the plurality of processin...
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6578589 |
Disclosed is a compact apparatus for manufacturing semiconductor wafers, which is aimed at complete removing of moisture from the wafers after final cleaning while reducing the manufacturing time. The apparatus includes a cleaning chambe...
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6578588 |
A unified strip/cleaning apparatus wherein a strip device is integrated with a cleaning device. In the apparatus, a strip line removes resin on a substrate and a cleaning line is provided under the strip line to clean and dry the substra...
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6571806 |
A method for drying a disk-shaped substrate. The substrate is typically a substrate used for the manufacture of magnetic disks, and has a centrally located opening. The substrate is lowered into a liquid bath by a first holder, which als...
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6543461 |
A buffer station for an article handling system, the handling system having a general path along which it moves when handling the article, the buffer station including at least two supporting assemblies including supporting elements form...
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