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7437832 |
A reduced pressure drying apparatus includes a chamber that closes in an airtight manner during a reduced pressure drying operation, a stage on which a substrate is mounted; and an exhaust unit having an exhaust tube that opens at exhaus...
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7267128 |
A substrate treating apparatus for treating substrates includes a treating tank for receiving and treating the substrates, a holding device movable, while holding the substrates in a cantilever mode, between a treating position in the tr...
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7252098 |
A method and apparatus for cleaning, rinsing and Marangoni drying substrates is provided. A line of fluid is sprayed along a substrate surface forming an air/fluid interface line, and a line of drying vapor is supplied to the interface l...
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7195021 |
A method for cleaning optics in a chamber. The method can include introducing a first etchant into a chamber that encloses an optical component and a source of electromagnetic radiation that is suitable for lithography, ionizing the firs...
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7107999 |
An indexer part, removal processing part, interface, and dry processing part are disposed adjacent to each other in a row. That is, the removal processing part that performs removal processing of an organic matter by using a removal liqu...
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7080652 |
A semiconductor processing system for wafers or other semiconductor articles. The system uses an interface section at an end of the machine accessible from the clean room. A plurality of processing stations are arranged away from the cle...
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6945258 |
A cleaning processing system including a wafer transfer device, a wafer detecting sensor for detecting a wafer, a memory for storing the position and direction of an extra wafer present inside the cleaning processing system when the powe...
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6892740 |
A chip handling system for integrated circuit (IC) chips each having circuitry on a first face, has a delivery station for receiving, from a first transfer device, a row and column array of chips with the first face upward, a second tran...
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6776173 |
A liquid processing apparatus has a substrate rotating device including a holder for holding a substrate and a motor, a chamber for applying the liquid processing to the substrate, a posture changing mechanism for changing the posture of...
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6763839 |
A substrate cleaning system for cleaning wafers using a sheet-type wet cleaning treatment. The system has a sealable system body, a loading/unloading booth having a substrate carry-in section in which a plurality of substances are stocke...
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6746543 |
A cleaning apparatus and a cleaning method for cleaning a object are provided. In the cleaning apparatus, a drying chamber 42 and a cleaning bath 41 are separated from each other up and down, respectively. Thus, a space in the drying...
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6745783 |
To provide a cleaning processing method and a cleaning processing apparatus which can improve cleaning efficiency. The apparatus is structured to install processing units 11 a- 11 d which provide more than one kind of chemical liquids...
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6736149 |
An apparatus for supercritical processing of multiple workpieces comprises a transfer module, first and second supercritical processing modules, and a robot. The transfer module includes an entrance. The first and second supercritical pr...
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6701942 |
A cleaning apparatus for removing contaminants from the surface of a substrate includes two parts: one which produces an aerosol including frozen particles and directs the aerosol onto the surface of the substrate to remove contaminants ...
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6630031 |
By a simple apparatus construction and process, it is made possible to “clean precisely” a surface at the molecular/atomic level, and the purification degree of the surface processed minutely is made into 10 12 molecules/cm 2 or le...
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6616771 |
A computer-implemented method and system for cleaning a contaminated cannula so that it may be reused includes moving the contaminated cannula from a drug reconstitution station where the cannula is used to prepare a drug solution into a...
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6571806 |
A method for drying a disk-shaped substrate. The substrate is typically a substrate used for the manufacture of magnetic disks, and has a centrally located opening. The substrate is lowered into a liquid bath by a first holder, which als...
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6446646 |
Chambers each include an inlet port for supplying N 2 gas and an outlet port for discharging an inner atmosphere, and therefore the chambers have different amounts of supply of N 2 gas in a unit of time and different amounts of dischar...
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6342104 |
A cleaning apparatus and a cleaning method for cleaning an object are provided. In the cleaning apparatus, a drying chamber 42 and a cleaning bath 41 are separated from each other up and down, respectively. Thus, a space in the dryin...
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6328814 |
A method and apparatus for cleaning, rinsing and Marangoni drying substrates is provided. A line of fluid is sprayed along a substrate surface forming an air/fluid interface line, and a line of drying vapor is supplied to the interface l...
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6319329 |
A method for cleaning an object to be processed in which the atmosphere in a drying chamber is replaced by an inert gas prior to placing an object to be cleaned from an external environment into the chamber. The object is then transporte...
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6306224 |
A process and device for treating sheet objects, especially fragile sheet objects, by rotation through a liquid bath. The objects are disposed in radial slots in a rotating disk, retained therein by a flexible element moving synchronousl...
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6251232 |
A substrate holder 90 where a thin film has accumulated on the surface of the holding claws 91 is transferred in a state where no substrate 9 is being held into a film removal chamber 70 which is established branching off in such a way t...
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6251195 |
An apparatus having a processing chamber for processing a semiconductor wafer under evacuated conditions that is capable of transfer of the wafer from the processing chamber under conditions that are substantially equal to the pressure o...
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6245156 |
Substrate transporting method comprising (a) inputting process data, (b) determining whether a number of units required for processing the wafer is an odd number or an even number, (c1) when a determination result of the step (b) is an o...
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6230721 |
The present inventions provides a processing apparatus to enable a plurality of processing sections to be installed in a smaller space. The apparatus has a plurality of processing sections arranged at up-down two stages and supplies a ma...
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6202655 |
A holder (102) made from an HF-resistant material includes annular suction pads (105, 108). The suction pad (105) is used to hold a small silicon substrate by suction, and the suction pad (108) is used to hold a large silicon substrate b...
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6155276 |
A portable ground soil remediation apparatus and method utilizing a water and biodegradeable soap mixture to result in an safe solution to effectively remove crude or refined oil from the soil, as well as the toxins associated with this ...
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6138694 |
A multiple stage wet processing platform includes a sealable enclosure, at least two processing modules positioned within the enclosure, at least one of them including a housing having an opening and a door moveable into position coverin...
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6125862 |
Cleaning apparatus provide for the cleaning of a workpiece by first immersing the workpiece in a cleaning tank having a cleaning liquid therein for a predetermined period of time, removing the workpiece from the cleaning tank, moving the...
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6082382 |
An cleaning mechanism especially well suited for agricultural products in which the agricultural products are moved by a flow of water through a channel in which the water is agitated by vibration of the channel. The agitation of the wat...
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6068002 |
A drying unit is disposed above a cleaning tank containing a cleaning liquid for cleaning semiconductor wafers W. A wafer boat holding semiconductor wafers moves between the cleaning tank and the drying unit. The drying unit has a fixed ...
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6056828 |
According to the present invention, there is provided a substrate conveying apparatus for loading/unloading a substrate to/from a processing section, including an arm for holding the substrate on an upper surface thereof, an arm drive me...
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6026830 |
An improved and new apparatus and method for post chemical-mechanical planarization (CMP) cleaning has been developed. Use of a QDR (Quick Dump Rinse) DI water bath for receiving a cassette of semiconductor substrates from a previous CMP...
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6021790 |
A substrate treating apparatus for successively treating substrates includes a body having a carrying unit for carrying the substrate along a carrying surface. The carrying surface is inclined in a plane perpendicular to the carrying dir...
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6012471 |
An automated means for hydrating and packaging a molded hydrophilic contact lens in one of the mold parts used to mold the lens is provided in which a first robotic assembly removes a plurality of contact lens molds from a production lin...
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5979473 |
An improved apparatus for washing fruit that includes supporting rollers, a nozzle for directing a spray of water at 100 psi at the surface of the whole fruit; and clean-out bars that reduce the movement of the fruit toward the nozzle be...
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5967159 |
According to the present invention, there is provided a substrate conveying apparatus for loading/unloading a substrate to/from a processing section, including an arm for holding the substrate on an upper surface thereof, an arm drive me...
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5836323 |
An automated means for hydrating a molded hydrophilic contact lens is provided in which a first robotic assembly removes a plurality of contact lens molds from a production line carrier, each of the lens molds having a contact lens adher...
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5817185 |
A method of washing substrates arranged at a substantially equal pitch internal in a cassette which includes steps of (a) transferring the substrates to a holder a pitch interval narrower than the arrangement pitch interval in said casse...
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5810028 |
Numerous spin-dry mechanisms 45A, 45B, and 45C for drying workpieces W at individual drying positions by rotating them at high speed are disposed in a drying section 3 of a washing apparatus, and sequentially move forward and backward be...
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5806544 |
Apparatus for cleaning disks during processing. The apparatus is used with a disk processing system having a conveyor belt for transporting a disk carrier containing disks. The conveyor belt and the disk carrier have openings therein. A ...
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5730162 |
A substrate washing apparatus includes a bath, a washing solution supply source, a first path for allowing the washing solution overflowing from the bath, a rinse solution supply source, a second path for passing the rinse solution, a co...
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5671762 |
A decontamination system for particulate matter is provided. The system has a fluid treatment chamber within which three screw-type augers operate to mix hydrocarbon laden soil with treating fluid for removing the hydrocarbon therefrom. ...
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5640980 |
An automated means for hydrating a molded hydrophilic contact lens is provided in which a first robotic assembly removes a plurality of contact lens molds from a production line carrier, each of the lens molds having a contact lens adher...
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5637152 |
An apparatus and method for removing hydrocarbons from soil is disclosed. A gradient force machine pulverizes contaminated soils, which are then mixed with release agents in a mixing tank. A water-filled separation unit receives the mixe...
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5608974 |
A steam drying apparatus in which a process chamber is fitted at a loading opening with a lid which is closed from above. The inner side wall surface of the process chamber has a first surface formed in the lower part thereof and is subs...
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5603777 |
A loader station of substrate treating apparatus receives a transport cassette from a preceding stage. This transport cassette stores a plurality of substrates to be treated, arranged with a predetermined spacing therein. An empty proces...
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5578331 |
An apparatus is provided for removing and transporting articles, such as contact lens sections from a manufacturing line to inspection and packaging stations. The lenses are deposited in a transparent plastic primary package which carrie...
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5573023 |
A single wafer processing apparatus includes a portable processing head that can be a portable module or a movable unit mounted to a supporting machine frame. The processing head has movable fingers adapted to grip a wafer. The fingers p...
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