STATEMENT OF CLASS SUBJECT MATTERThis class includes, where not provided for elsewhere:A. Processes
(1) involving the use of electrolysis (as provided for in Class 205);
(2) of preparing or purifying compounds or elements involving chemical reaction brought about by electrical or wave energy in a magnetic field;
(3) of treating materials involving chemical reaction brought about by wave energy;
(4) of preparing or purifying compounds or elements involving chemical reaction brought about by an electrostatic field or electrical discharge;
(5) involving the use of electrophoresis or electro-osmosis;
(6) of treating a liquid
(a) to separate or purify the liquid using electric and magnetic fields simultaneously,
(b) to separate or purify the liquid using an electric field, or
(c) using a magnetic field to obtain some effect other than mere separation or purification of the liquid;
(7) involving coating, forming, or etching by the use of sputtering; and
(8) involving coating by the use of vacuum arc discharge. (See Subclass References to the Current Class, below.)B. Products solely disclosed as made by a process under
(A). For exceptions, see Lines With Other Classes and Wtihin This Class, Exceptions, below.
C. Apparatus for carrying out the processes set forth under
(A) except the apparatus used to carry out the wave energy treatment processes provided for in Class 204; such apparatus is provided for elsewhere. (See Lines With Other Classes, below.)D. Electrolyte compositions specialized for use in electrolytic processes or methods of preparing the compositions.
(1) Note. A list of superiority of several composition classes appears elsewhere. See Lines With Other Classes below.
(2) Note. Although the processes described above in
(A), items
(6),
(7), and
(8), do not involve strictly chemical changes, they are in some respects closely related to other portions of the class and so have been included here.
(3) Note. Processes involving purely thermal actions of electrical phenomena or wave energy are not included in this class.
(4) Note. Class 204 provides for the combination of electrical and wave energy processes as described in
(A) above with subsequent:
(1) conventional treatments such as filtering, distilling, washing, and other methods of separating or concentrating products from the previous Class 204 operation or
(2) mere admixing of products from the previous Class 204 operation to form a desired end product. Where a subsequent step significantly modifies a composition, product, or article made by the previous Class 204 operation, the combined process is generally provided for elsewhere and is cross-referenced in Class 204, where necessary.
(5) Note. The combination of an electrical or wave energy operation as described in
(A) above with a preceding method, such as treatment of material to prepare it for the electrical or wave energy operation, is provided for in Class 204. When a method preparatory to a Class 204 operation is claimed, per se, and is not provided for elsewhere, it may be classified in Class 204.
LINES WITH OTHER CLASSESFor apparatus for carrying out the wave energy treatment processes provided for in Class 204, subclasses 157.15+, see Class 250, Radiant Energy, particularly subclasses 492.1+, and Class 422, Chemical Apparatus and Process Disinfecting, Deodorizing, Preserving, or Sterilizing, particularly subclasses 186+; the apparatus used to carry out the processes provided for in Class 204, subclasses 155+; such apparatus is provided for in Class 422, Chemical Apparatus and Process Disinfecting, Deodorizing, Preserving, or Sterilizing, particularly subclasses 186.01+; the apparatus used to carry out the processes provided for in Class 204, subclasses 164; such apparatus is provided for in Class 422, Chemical Apparatus and Process Disinfecting, Deodorizing, Preserving, or Sterilizing particularly subclasses 186.04+; and the section References to Other Classes, herein, the entry to Class 118 for apparatus provided for in Class 118.
The rules for determining Class placement of the Original Reference (OR) for claimed chemical compositions are set forth in the Class Definition of Class 252 in the section LINES WITH OTHER CLASSES AND WITHIN THIS CLASS, subsection COMPOSITION CLASS SUPERIORITY, which includes a hierarachical ORDER OF SUPERIORITY FOR COMPOSITION CLASSES.
EXCEPTIONSThis class includes, where not provided for elsewhere products solely disclosed as made by a process under
(A) in Class Definition, above, with the following exceptions:
(1) products which comprise two or more contiguous metallic layers;
(2) products of processes classifiable in Class 204, subclasses 157.15+ and 450+, and Class 205, subclasses 640+. These products are properly classified in the appropriate product or stock material class (e.g., 260, 423, 428, etc.).
LINE BETWEEN CLASS 204 AND CLASS 75Combinations of metallurgical process steps falling within the definition of Class 75 and electrical or wave energy steps falling under the definition of Class 204 are classified in Class 204, when the metallurgical process steps are preparatory to the electrical or wave energy steps, and are placed in Class 75 when the electrical or wave energy methods are preparatory to the metallurgical process steps. The above applies even when such preparatory steps result in a desired by-product. Class 75, subclasses 228+, provides for a “nominal” element usable in a Class 204 process (i.e., an element claimed only in terms of the metal composition from which it is made). The order of superiority among various metal, alloy, and metal stock areas and methods of manufacture involving them is as follows:1. Class 419, Powder Metallurgy Processes.2. Class 148, Metal Treatment, subclasses 22+, compositions for treatment of solid metal.3. Class 75, Specialized Metallurgical Processes, Compositions for Use Therein, Consolidated Metal Powder Compositions, and Loose Metal Particulate Mixtures, subclasses 300, 301, and 303+, gaseous, liquid, or solid treating compositions for liquid metal or charges, and subclass 302, welding rods defined by composition.4. Class 75, Specialized Metallurgical Processes, Compositions for Use Therein, Consolidated Metal Powder Compositions, and Loose Metal Particulate Mixtures, subclasses 228+, consolidated metal powder compositions, and subclasses 255+, loose metal particulate mixtures.5. Class 420, Alloys or Metallic Compositions, alloys or metallic compositions claimed as products.6. Class 148, Metal Treatment, subclasses 95-122, 194-287, and 500-714, in class schedule order, certain processes of treating solid or semisolid metal by modifying or maintaining internal physical structure (i.e., microstructure) or chemical properties of metal, processes of reactive coating of metal, or processes of chemical heat-removing (e.g., flame-cutting, etc.) or burning of metal. However, if metal casting, fusion bonding, machining, or working is involved, there is a requirement of significant heat treatment as described in References To Other Classes in the Class 148 definition.7. Class 148, Metal Treatment, subclasses 33+, p-n type barrier layer stock material, and subclasses 400+, stock.8. Class 75, Specialized Metallurgical Processes, Compositions for Use Therein, Consolidated Metal Powder Compositions, and Loose Metal Particulate Mixtures, subclasses 331+, processes of making solid particulate alloys directly from liquid metal, and subclasses 343+, processes of producing or purifying alloys in powder form.9. Class 75, Specialized Metallurgical Processes, Compositions for Use Therein, Consolidated Metal Powder Compositions, and Loose Metal Particulate Mixtures, subclasses 10.1+ and 10.67, electrothermic, electromagnetic, or electrostatic processes of making alloys.10. Class 420, Alloys or Metallic Compositions, processes of manufacture.11. Class 75, Specialized Metallurgical Processes, Compositions for Use Therein, Consolidated Metal Powder Compositions, and Loose Metal Particulate Mixtures, subclasses 330+, processes of making metal, treating liquid metals and liquid alloys, and consolidating metalliferous material.12. Class 204, Chemistry: Electrical and Wave Energy, processes.13.
Class 164, Metal Founding, subclasses 1+, processes.14. Class 266, Metallurgical Apparatus, subclasses 44+, processes of operating metallurgical apparatus.
LINES BETWEEN CLASSES 156, 204, 205, AND 216In general, a class 156 operation (e.g., chemical etching of an electrical function semiconductor substrate, etc.) performed on a composition, product, or article made by a Class 204 process (e.g., an entire article previously etched by electrolysis, a product portion modified by electrolytic material treatment, etc.) is considered to provide a significant modification of the composition, product, or article made by the Class 204 process; therefore placing the combination of a Class 204 process followed by a Class 156 procedure in Class 156. However, the combination of a Class 204 electrolytic coating step followed by a Class 156 operation (other than a laminating process as described above) performed
(1) to allow at least a portion of the electrolytic coating to remain and
(2) to only significantly modify the electrolytic coating, per se, is considered to be an electrolytic coating process followed by a mere perfecting step for the electrolytic coating; therefore placing the combination in Class 204. The significant modification of only the electrolytic coating allows for mere incidental alterations to other portions of a coated article such as the substrate, provided that such changes are clearly unintentional (e.g., chemical etching through an electrolytic coating which may also progress into the substrate in some areas to allow complete penetration through all desired other areas of the electrolytic coating, etc.). Class 156, subclasses 625.1+, provide for the original classification of chemically etching an electrical function semiconductive precursor, substrate, or device when the claims are alternative (claims to a Class 156 etching process and claims to a Class 205 electrolytic etching, or when a generic claim is present and no species is specifically claimed). When, however, a generic claim is present (disclosure includes both Class 156 etching and Class 204 or Class 205 subject matter) and a Class 204 or Class 205 species is specifically claimed, and there is no specific claim to a Class 156 etching process, the original classification is in Class 204 or Class 205 and a mandatory cross-reference is placed into Class 156 etching based on the generic claim. Other combinations of Class 204 step
(s) with Class 156 step
(s) will follow the general class line for the combination of Class 204 step
(s) with those from other classes as stated at the beginning of Class 204. Also, see the search class note to Class 216 in this section, since Class 216 is an integral part of Class 156.
LINES BETWEEN CLASSES 216, 156, 204, AND 205Chemical etching performed on a composition, product, or article made by a Class 204 process (e.g., an entire article previously etched by electrolysis, a product portion modified by electrolytic material treatment, etc.) is considered to provide a significant modification of the composition, product, or article made by the Class 204 process; therefore placing the combination of a Class 204 process followed by Class 216 chemical etching in Class 216. However, the combination of a Class 205 electrolytic coating step followed by Class 216 chemical etching performed
(1) to allow at least a portion of the electrolytic coating to remain and
(2) to only significantly modify the electrolytic coating, per se, is considered to be an electrolytic coating process followed by a mere perfecting step for the electrolytic coating; therefore placing the combination in Class 205. The significant modification of only the electrolytic coating allows for mere incidental alterations to other portions of a coated article such as the substrate, provided that such changes are clearly unintentional (e.g., chemical etching through an electrolytic coating which may also progress into the substrate in some areas to allow complete penetration through all desired other areas of the electrolytic coating, etc.). Class 216 also provides for the original classification when the claims are alternative (claims to a Class 216 process and claims to a Class 205 electrolytic etching, or when a generic claim is present and no species is specifically claimed). When, however, a generic claim is present (disclosure includes both Class 216 and Class 204 or Class 205 subject matter) and a Class 204 or Class 205 species is specifically claimed, and there is no specific claim to a Class 216 etching process, the original classification is in Class 204 or Class 205 and a mandatory cross-reference is placed into Class 216 based on the generic claim. Other combinations of Class 204 step
(s) with Class 216 step
(s) will follow the general class line for the combination of Class 204 step
(s) with those from other classes as stated at the beginning of Class 204. Also, see the search class note to Class 156 in this section, since Class 216 is an integral part of Class 156.
LINE BETWEEN CLASS 250 AND CLASS 204Note the difference between the scope of “radiant energy” as set out for Class 250 and “wave energy” as defined in Class 204, subclass 157.15.
LINE BETWEEN CLASSES 260, 204, AND 520See Class 260, Chemistry of Carbon Compounds, for
(1) a chemical process, in general and for preparation and treatment of carbon compounds or a product formed by such a process;
(2) the combination of a Class 204 operation with a subsequent significant chemical process provided for in Class 260 when the subsequent Class 260 process modifies a product of the Class 204 operation to produce a different compound; and
(3) a branched process in which one branch is a Class 204 process and another branch falls within the class definition of Class 260. The combination of a Class 260 process and a subsequent Class 204 operation is classified in Class 204. The foregoing applies even when the preparatory process or operation results in a desired by-product. Also, see the search class note to Class 520 in References to Other Classes, since Class 520 is an integral part of Class 260.
LINES BETWEEN CLASSES 424, 204, AND 514See Class 424, Drug, Bio-Affecting and Body Treating Compositions, for a drug, bio-affecting, or body treating composition which may be made by a Class 204 process; especially subclasses 1.11+ for a radionuclide or intended radionuclide containing, adjuvant or carrier, intermediate, or preparatory composition. Also, see the search class note to Class 514 in REFERENCES TO OTHER CLASSES, below, since Class 514 is an integral part of Class 424.
LINES BETWEEN CLASSES 520, 522, AND 204See Class 520, Synthetic Resins or Natural Rubbers -- Part of the Class 520 Series, appropriate classes, especially Class 522, subclasses 1+, for a composition to be polymerized by wave energy wherein said composition contains a rate-affecting material; or a synthetic resin composition to be modified by wave energy wherein said composition contains a rate-affecting material; or a process of preparing or treating a solid polymer utilizing wave energy. Any process step involving electrolysis, electric current, electro-osmosis, electrophoresis, electrostatic field, electrical discharge, or magnetic field and also involving the treating of a synthetic resin or natural rubber is proper in Class 204 if a wave energy step is involved in any part of the process. The combination of a Class 520 chemical process not involving the use of wave energy with a Class 204 operation is classified
(1) in Class 204 when the Class 520 nonwave energy process is preparatory to the Class 204 operation and
(2) in Class 520 when the Class 204 operation is preparatory to the Class 520 nonwave energy process. A branching process in which the claims are alternative to producing or treating a polymer by a Class 204 process or by a Class 520 chemical process not involving the use of wave energy is classified in Class 520. See Class 204, subclass 157.15, for a further elaboration of the line between Class 204 and Class 520, subclasses 1+.
LINES BETWEEN CLASSES 585, 204, AND 260The line between Class 585 and Class 204 is analogous to that between Class 260 and Class 204. See the search class note to Class 260 in REFERENCES TO OTHER CLASSES, below. |
-
1 • PROCESSES AND PRODUCTS
-
155 • Electrical, or wave energy in magnetic field
-
156 • With discharge
-
157.15 • Processes of treating materials by wave energy
-
157.2 • Isotope separation or enrichment
-
157.21 • Inorganic product produced
-
157.22 • Using laser
-
157.3 • Removing a component from normally gaseous mixture
-
157.4 • Process of preparing desired inorganic material
-
157.41 • Using laser
-
157.42 • Using sonic or ultrasonic energy
-
157.43 • Using microwave energy
-
157.44 • Using ionizing radiation
-
157.45 • Boron, phosphorous or silicon containing product produced
-
157.46 • Nitrogen containing product produced
-
157.47 • Carbon containing product produced
-
157.48 • Halogen containing product produced
-
157.49 • Sulfur containing product produced
-
157.5 • Oxygen containing product produced
-
157.51 • Metal oxide or hydrate thereof
-
157.52 • Hydrogen containing product produced
-
157.6 • Process or preparing desired organic product containing at least one atom other than carbon and hydrogen
-
157.61 • Using laser
-
157.62 • Using sonic or ultrasonic energy
-
157.63 • Using ionizing radiation
-
157.64 • Nitrogen, sulfur, phosphorous or silicon containing product produced
-
157.65 • Carbocyclic ring containing product produced
-
157.67 • Vitamin product produced
-
157.68 • Carbohydrate or protein product produced
-
157.69 • Heterocyclic product produced
-
157.7 • Hetero sulfur containing
-
157.71 • Hetero nitrogen containing
-
157.72 • Hetero nitrogen ring contains at least two hetero atoms
-
157.73 • Phosphorous product produced
-
157.74 • Silicon product produced
-
157.75 • Heavy metal product produced
-
157.76 • Sulfur product produced
-
157.77 • Nitrogen containing
-
157.78 • Oxygen containing
-
157.79 • Halogen containing
-
157.8 • Halogen containing
-
157.81 • Nitrogen product produced
-
157.82 • Oxygen containing
-
157.83 • Nitroso or oxime containing
-
157.84 • Halogen containing
-
157.85 • Carbon triple bonded to nitrogen containing
-
157.86 • Halogen containing
-
157.87 • Carboxylic acid or derivative product produced
-
157.88 • Oxygen other than as part of a carboxylic acid or derivative moiety
-
157.89 • Atom other than carbon, hydrogen or oxygen
-
157.9 • Alcohol product produced
-
157.91 • Fused or bridged ring containing
-
157.92 • Ether product produced
-
157.93 • Aldehyde or ketone product produced
-
157.94 • Halogen product produced
-
157.95 • Carbon and halogen only in product
-
157.96 • Carbocyclic ring containing
-
157.97 • Aryl ring containing
-
157.98 • Unsaturated product
-
157.99 • Unsaturation in aryl ring
-
158.1 • Carbocyclic ring containing
-
158.11 • Two or more diverse halogen atoms containing
-
158.12 • Four or more carbon atoms containing
-
158.14 • At least one carbocyclic ring and only carbon and hydrogen atoms in product produced
-
158.2 • Processes of purifying materials
-
158.21 • Organic material purified
-
164 • Electrostatic field or electrical discharge
-
165 • Organic
-
166 • Vitamins
-
167 • Fats, fatty oils, ester type waxes, or higher fatty acids
-
168 • Hydrocarbons
-
169 • Halogenated or oxidized
-
170 • Gaseous
-
171 • Acetylene
-
172 • Cracking hydrocarbon oils
-
173 • Carbon
-
174 • Sulfur-oxygen compounds
-
175 • Hydrogen peroxide
-
176 • Ozone
-
177 • Nitrogen compounds
-
178 • Arc or spark discharge
-
179 • Nitrogen oxides
-
450 • Electrophoresis or electro-osmosis processes and electrolyte compositions therefor when not provided for elsewhere
-
451 • Capillary electrophoresis
-
452 • With detailed detection
-
453 • With injection
-
454 • With adjustment or alteration of electro-osmotic bulk flow
-
455 • Using gel-filled capillary
-
456 • Gel electrophoresis
-
457 • With programmed, cylic, or time responsive control
-
458 • Plural rapid changes in direction of electric field (at least 1,000 times total and at more than 1/sec) (e.g., pulsed field, etc.)
-
459 • Isoelectric focusing (i.e., using pH variation)
-
461 • With analysis or detailed detection
-
462 • With posttreatment of gel to purify or recover a desired component
-
463 • Destaining
-
464 • Blotting
-
465 • Preparation in unitary apparatus (e.g., preparative, etc.)
-
466 • Using slab gel
-
467 • Vertical or inclined
-
468 • Electrolyte composition
-
469 • Gel composition (other than simple agarose or polyacrylamide)
-
470 • Including manufacture or preparation (e.g., molding, gelation, etc.)
-
471 • Coating or forming of object
-
472 • With control responsive to sensed condition
-
473 • Temperature sensed
-
474 • Current sensed
-
475 • Rubber or vulcanizable gum used to coat or form
-
476 • Sheet, web, wire, or filament of indeterminant length formed or coated
-
477 • Alternating current
-
478 • With irradiation or illumination (e.g., for curing, etc.)
-
479 • Coating interior of object
-
480 • With regeneration or replenishment of coating bath (e.g., ultrafiltration, ion exchange, measurement followed by addition of concentrated reagent, etc.)
-
481 • Using ion exchange material
-
482 • Using filter or membrane
-
483 • Forming of object
-
484 • Plural coating operations
-
485 • Using mask
-
486 • Including nonelectrophoretic coating
-
487 • With heat treatment of a coated layer (e.g., curing, sintering, etc.)
-
488 • Organic (e.g., curing thermoset resin, etc.)
-
489 • Using bath having designated chemical composition (DCC)
-
490 • Resultant coating is solely inorganic
-
491 • With heat treatment of coating
-
492 • Anodic processes only
-
493 • With heat treatment of coating
-
494 • And washing, rinsing, or drying of coating
-
495 • With pretreatment of substrate or bath
-
496 • Bath contains shading or coloring agent (e.g., pigment, etc.)
-
497 • Bath contains surface active agent (e.g., soap or detergent, wetting or emulsifying agent, etc.)
-
498 • Bath contains carboxyl group
-
499 • Cathodic processes only
-
500 • With heat treatment of coating
-
501 • Bath contains epoxy or epoxide
-
502 • Bath contains epoxy or epoxide
-
503 • And shading or coloring agent
-
504 • And separate crosslinking or curing agent
-
505 • Isocyanate
-
506 • Bath contains separate crosslinking or curing agent
-
507 • With posttreatment of coating (e.g., heat treatment, washing, drying, etc.)
-
508 • Bath contains shading or coloring agent, metal oxide, free metal, or free carbon
-
509 • With heat treatment of coating
-
510 • With pretreatment of substrate (e.g., cleaning, wetting, etc.)
-
511 • Using liquid jet
-
512 • Continuous movement of substrate through bath
-
513 • Hydrocarbon oil separated or purified
-
514 • Aqueous system
-
515 • Inorganic siliceous or calcareous material prepared, separated, or treated (e.g., clay, earth, concrete, asbestos, glass, etc.)
-
516 • Barrier separation (e.g., using membrane, filter paper, etc.)
-
517 • Ion selective
-
518 • Barrier separation (e.g., using membrane, filter paper, etc.)
-
519 • With control responsive to sensed condition
-
520 • Ion selective
-
521 • Combined with manufacture or pretreatment of barrier
-
522 • Using both anion and cation selective membranes
-
523 • Alternating anion and cation selective membranes
-
524 • And using ion exchange material (e.g., suspended particles, etc.)
-
525 • With prevention of scale buildup or fouling of membrane
-
526 • Gas or vapor treated
-
527 • Biological material prepared, recovered, or treated (e.g., urine, etc.)
-
528 • Regeneration of liquid electrolyte
-
529 • Metal or metal salt recovered or removed
-
530 • Organic material prepared, recovered, or treated
-
531 • Acid prepared, recovered, or treated
-
532 • And using nonion selective membrane
-
533 • And using ion exchange material (e.g., suspended particles, etc.)
-
534 • And using bipolar membrane
-
535 • And using nonion selective membrane
-
536 • And using ion exchange material (e.g., suspended particles, etc.)
-
537 • Using bipolar membrane
-
538 • Water splitting
-
539 • Using anion selective membrane
-
540 • Biological material prepared, recovered, or treated (e.g., urine, etc.)
-
541 • Organic material prepared, recovered, or treated
-
542 • Combined with diverse-type separation (e.g., electro-osmotic barrier separation combined with centrifugal separation, etc.)
-
543 • Biological material prepared, recovered, or treated (e.g., urine, etc.)
-
544 • Organic material prepared, recovered, or treated
-
545 • With use of nonelectrical field or force to separate (e.g., magnetic, centrifugal, etc.)
-
546 • Absorbent strip electrophoresis (e.g., using cellulose acetate or paper strip, etc.)
-
547 • Dielectrophoresis (i.e., using nonuniform electric field)
-
548 • Isoelectric focusing (i.e., using pH variation)
-
549 • Isotachophoresis (i.e., displacement electrophoresis) or measurement of ion or particle mobility
-
550 • Ionophoresis
-
551 • Solid sorption or desorption
-
553 • Bulk separation of solids and liquids (e.g., dewatering solids, clarifying water, etc.)
-
554 • Electrical (including simultaneous electrical and magnetic) separation or purification of liquid or magnetic treatment of liquid (other than separation)
-
555 • With control responsive to sensed condition
-
556 • With measuring, testing, or sensing
-
557 • Using magnetic field
-
558 • With simultaneous use of liquid-liquid extraction solvent
-
559 • Predominantly hydrocarbon
-
560 • Removing solids
-
561 • With addition of agent to facilitate removal
-
562 • Using cohesive filter or solid packing
-
563 • Resolving emulsion or dispersion
-
564 • Using interrupted or pulsed direct current field
-
565 • Using modified alternating current (other than standard 50 Hz or 60 Hz sine wave) field
-
567 • Using modifying agent
-
568 • Gas or vapor
-
569 • Dielectric liquid
-
570 • Water
-
571 • Removing solids
-
572 • Using cohesive filter or solid packing
-
573 • Resolving emulsion or dispersion
-
192.1 • Coating, forming or etching by sputtering
-
192.11 • Ion beam sputter deposition
-
192.12 • Glow discharge sputter deposition (e.g., cathode sputtering, etc.)
-
192.13 • Measuring or testing (e.g., of operating parameters, property of article, etc.)
-
192.14 • Coating inorganic material onto polymeric material
-
192.15 • Specified deposition material or use
-
192.16 • Wear or abrasion resistant
-
192.17 • Electrical contact material
-
192.18 • Piezoelectric
-
192.2 • Ferromagnetic
-
192.21 • Resistor
-
192.22 • Insulator or dielectric
-
192.23 • Silicon containing
-
192.24 • Superconductor
-
192.25 • Semiconductor
-
192.26 • Optical or photoactive
-
192.27 • Reflective
-
192.28 • Absorptive
-
192.29 • Transparent conductor
-
192.3 • With sputter etching
-
192.32 • Sputter etching
-
192.33 • Measuring or testing (e.g., of operating parameters, end point determination, etc.)
-
192.34 • Ion beam etching (e.g., ion milling, etc.)
-
192.35 • Etching specified material
-
192.36 • Organic
-
192.37 • Silicon containing
-
192.38 • Vacuum arc discharge coating
-
193 • APPARATUS
-
194 • Electrolytic
-
400 • Analysis and testing
-
401 • Fault testing of sensor or component
-
402 • Regeneration or activation
-
403.01 • Biological material (e.g., microbe, enzyme, antigen, etc.) analyzed, tested, or included in apparatus
-
403.02 • Disposable apparatus or apparatus having removable section (e.g., removable cartridge, etc.)
-
403.03 • Plural measuring sections or zones
-
403.04 • Enzyme included in apparatus
-
403.05 • With semipermeable membrane
-
403.06 • With semipermeable membrane
-
403.07 • For blocking passage of macromolecules (molecular weight greater than or equal to 8,000)
-
403.08 • Lipid included in apparatus
-
403.09 • Enzyme included in apparatus
-
403.1 • Enzyme included in apparatus
-
403.11 • Glucose oxidase
-
403.12 • With diverse enzyme or catalyst (e.g., bienzyme or coenzyme system, glucose oxidase with Pt catalyst, etc.)
-
403.13 • And microelectrode (i.e., at least one electrode dimension is less than 500 microns)
-
403.14 • Enzyme included in apparatus
-
403.15 • Electrode containing free carbon
-
404 • Corrosion
-
405 • Titration
-
406 • With significant electrical circuitry or nominal computer device
-
407 • With significant display or analytical device
-
408 • With means for temperature or pressure compensation
-
409 • With means providing specified-flow condition or flow-path
-
410 • Solid electrolyte means
-
411 • Three or more electrodes
-
412 • Three or more electrodes
-
413 • Liquid electrode, e.g., Hg, Na, etc.
-
414 • Gel electrolyte
-
415 • Selectively permeable membrane
-
416 • Ion-sensitive electrode
-
417 • Liquid ion-exchanger
-
418 • Organic membrane
-
419 • Inorganic membrane
-
420 • Glass ion-selective membrane
-
421 • Solid electrolyte
-
422 • Liquid sample sensor
-
423 • With fugitive protective element
-
424 • Gas sample sensor
-
425 • With impressed current means
-
426 • Planar electrode surface
-
427 • With gas reference material
-
428 • With protective element
-
429 • Protective element is a layer
-
430 • Moisture absorbing electrolyte
-
431 • Gas sensing electrode
-
432 • With gas diffusion electrode
-
433 • Measuring carbon or pH
-
434 • Involving plating, coating or stripping
-
435 • Standard reference electrode
-
196.01 • Object protection
-
196.02 • With control means responsive to sensed condition
-
196.03 • And programmed, cyclic, or time responsive control means
-
196.04 • Internal battery
-
196.05 • With programmed, cyclic, or time responsive control means
-
196.06 • With measuring, testing, or sensing means
-
196.07 • Internal battery
-
196.08 • With gas or vapor removing or treating means
-
196.09 • Plural cells used or protected
-
196.1 • Internal battery
-
196.11 • Resistor or impedance in series between anode and object
-
196.12 • With fluid filter
-
196.13 • With bypass means
-
196.14 • Anode moving relative to object
-
196.15 • With fluid inlet or outlet means used or protected
-
196.16 • Dielectric coating, casing, or section
-
196.17 • Rigid anode with rigid support
-
196.18 • More than half of anode is or has coating, covering, or shield
-
196.19 • Dielectric coating, covering, or shield
-
196.2 • Flexible cable, chain, or wire anode or support
-
196.21 • Earth grounded object or protection means
-
196.22 • Copper and zinc electrically coupled or alloyed into one or more electrodes
-
196.23 • Anode contains aluminum
-
196.24 • And magnesium
-
196.25 • And zinc
-
196.26 • Resistor or impedance in series between power supply and object
-
196.27 • Alternative energy supply (e.g., solar panel, thermoelectric or piezoelectric power supply, etc.)
-
196.28 • Rotating electrode
-
196.29 • Magnetic mounting means
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196.3 • Rigid anode with rigid support
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196.31 • Threaded coupling for rigid anode or rigid support
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196.32 • Dielectric thread
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196.33 • Flexible cable, chain, or wire anode or support
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196.34 • Plural anode sections on single cable, chain, or wire
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196.35 • Helically wound
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196.36 • Earth grounded object or protection means
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196.37 • Vessel protected (e.g., steam boiler, etc.)
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196.38 • Anode contains precious metal or free carbon
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With movable electrode means
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198 • Work conveyer
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199 • Rotary
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200 • With base treatment
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201 • Loose article
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202 • Endless
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203 • With base treatment
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204 • With current control
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205 • With current control
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206 • Continuous strip or filament electrode
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207 • With base treatment
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208 • Stripping
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209 • Mechanical working
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210 • Heat treatment means
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211 • With current control
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212 • Rotary
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213 • Barrels and rotary receptacles
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214 • Swinging or tilting receptacles
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215 • With base treatment
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216 • Stripping
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217 • Mechanical working
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218 • With current control
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219 • Liquid electrode
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220 • With electrode recirculation means
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221 • With oscillator, reciprocator or agitator
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222 • Electrode oscillator, reciprocator or agitator
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223 • With current control
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224R • Localized area applicators
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224M • Electrochemical machining
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225 • Electrode feeding or withdrawal means
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226 • With base treatment
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227 • Cells with base treatment means
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228.1 • With current, voltage, or power control means responsive to sensed condition
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228.2 • Fluid level sensing means
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228.3 • Fluid flow sensing means
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228.4 • Fluid pressure sensing means
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228.5 • Gaseous fluid
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228.6 • Electrolyte property sensing means (e.g., temperature, concentration, pH, conductivity, etc.)
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228.7 • Workpiece property sensing means (e.g., mass, coating thickness, etc.)
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228.8 • Workpiece presence, position, or movement sensing means
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228.9 • Having auxiliary electrode
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229.1 • Reference electrode as or with auxiliary electrode
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229.2 • And programmed, cyclic, or time responsive control means
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229.3 • For controlling waveform supplied to working electrode
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229.4 • With programmed, cyclic, or time responsive current, voltage, or power control means
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229.5 • For controlling waveform supplied to working electrode
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229.6 • For simultaneously reversing polarity of working and counter electrodes
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229.7 • Having specified circuit details
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229.8 • With means for measuring, testing, or sensing current, voltage, or power
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229.9 • Having auxiliary electrode
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230.1 • Reference electrode as or with auxiliary electrode
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230.2 • With current, voltage, or power control means
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230.3 • Mechanical
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230.4 • For inhibiting short circuits
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230.5 • Switch or connector
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230.6 • For controlling waveform
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230.7 • Having auxiliary electrode
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230.8 • Having specified circuit details
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232 • Cells with electrolyte treatment means
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233 • Leacher, dissolver or extractor
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234 • Recirculation
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235 • With filter
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236 • With heater or cooler
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237 • Recirculation
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238 • With filter
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239 • With heater or cooler
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240 • With filter
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241 • With heater or cooler
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242 • Cells
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243.1 • Fused bath
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244 • Plural cells
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245 • With feeding and/or withdrawal means
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246 • Gas feeding
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247 • Gas withdrawal
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247.1 • With magnetic field effect compensating means
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247.2 • With means for cleaning electrode element
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247.3 • Refractory hard material (RHM) containing electrode
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247.4 • With cell lining or coating
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247.5 • Thermal effect compensating means
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248 • Internal battery
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249 • Filter or loose electrode type
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250 • Liquid electrode
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251 • Diaphragm type
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252 • Diaphragm type
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253 • Plural cells
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254 • Bipolar electrode
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255 • With feeding and/or withdrawal means
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256 • Gas
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257 • With feeding and/or withdrawal means
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258 • Gas
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259 • Basket-type electrode
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260 • Concentrically arranged electrodes
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261 • With agitator
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262 • With heater or cooler
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263 • With feeding and/or withdrawal means
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264 • And filter
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265 • Gas feeding
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266 • Gas withdrawal
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267 • Plural cells
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268 • Bipolar electrode
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269 • With feeding and/or withdrawal means
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270 • Gas
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271 • Portable
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272 • Concentrically arranged electrodes
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273 • With agitator
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274 • With heater or cooler
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275.1 • With feeding and/or withdrawal means
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276 • And filter
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277 • Gas feeding
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278 • Gas withdrawal
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278.5 • Parallel plate type electrodes
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279 • Elements
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280 • Electrodes
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281 • Electroforming molds or strips plates
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282 • With diaphragm
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283 • Perforated or foraminous electrode
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284 • Perforated or foraminous
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285 • Work holder
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286.1 • With electrode supporting means
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287 • Work container
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288 • Electrodes with lateral extensions
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288.1 • And dielectric gasket or spacer
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288.2 • And additional electrical conductor of diverse material
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288.3 • Including resilient means (e.g., spring, etc.)
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288.4 • Including threaded connector
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288.5 • Having wedge or tapered tightening means
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288.6 • Hook or loop
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289 • With lateral extensions
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290.01 • Laminated or coated (i.e., composite having two or more layers)
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290.02 • Actinide series element (i.e., Ac, Th, Pa, U, Np, Pu, Am, Cm, Bk, Cf, Es, Fm, Md, No, or Lr) or compound containing
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290.03 • Having three or more layers
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290.04 • Rare earth metal (i.e., Sc, Y, La, Ce, Pr, Nd, Pm, Sm, Eu, Gd, Tb, Dy, Ho, Er, Tm, Yb, or Lu) or compound containing
-
290.05 • Organic compound containing
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290.06 • And noble metal (i.e., Ru, Rh, Pd, Os, Ir, Pt, Ag, or Au) or compound containing
-
290.07 • And free carbon containing
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290.08 • Noble metal (i.e., Ru, Rh, Pd, Os, Ir, Pt, Ag, or Au) or compound containing
-
290.09 • Plural metal oxides containing
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290.1 • Rare earth metal (i.e., Sc, Y, La, Ce, Pr, Nd, Pm, Sm, Eu, Gd, Tb, Dy, Ho, Er, Tm, Yb, or Lu) or compound containing
-
290.11 • Organic compound containing
-
290.12 • Refractory metal (i.e., Ti, V, Cr, Zr, Nb or Cb, Mo, Hf, Ta, or W) or compound containing
-
290.13 • Surface layer contains electrolytically exposed refractory metal or compound
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290.14 • Noble metal (i.e., Ru, Rh, Pd, Os, Ir, Pt, Ag, or Au) or compound containing
-
290.15 • Free carbon containing
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291 • Composition
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292 • Metallic
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293 • Alloys
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294 • Carbon containing
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295 • Diaphragms
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296 • Organic
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297.01 • Electrode support or work holder
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297.02 • Magnetic support
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297.03 • Vacuum support
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297.04 • Float or buoyant support
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297.05 • Mask for workpiece
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297.06 • Workpiece rack
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297.07 • Adjustable
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297.08 • Mechanized
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297.09 • Including resilient means (e.g., spring, etc.)
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297.1 • Including resilient means (e.g., spring, etc.)
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297.11 • Porous enclosure
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297.12 • Grid or grating
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297.13 • Including threaded connector
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297.14 • Including resilient means (e.g., spring, etc.)
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297.15 • Including threaded connector
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297.16 • Hook or loop
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298.01 • Coating, forming or etching by sputtering
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298.02 • Coating
-
298.03 • Measuring, analyzing or testing
-
298.04 • Ion beam sputter deposition
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298.05 • Ion plating
-
298.06 • Triode, tetrode, auxiliary electrode or biased workpiece
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298.07 • Specified gas feed or withdrawal
-
298.08 • Specified power supply or matching network
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298.09 • Specified cooling or heating
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298.11 • Specified mask, shield or shutter
-
298.12 • Specified target particulars
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298.13 • Target composition
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298.14 • Specified anode particulars
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298.15 • Specified work holder
-
298.16 • Magnetically enhanced
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298.17 • Flux passes through target surface
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298.18 • Focusing target (e.g., conical target, plural inclined targets, etc.)
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298.19 • Planar magnetron
-
298.2 • Moving magnetic field or target
-
298.21 • Cylindrical or curved magnetron target
-
298.22 • Moving magnetic field or target
-
298.23 • Moving workpiece or target
-
298.24 • Indeterminate length moving workpiece
-
298.25 • Multi-chamber (e.g., including air lock, load/unload chamber, etc.)
-
298.26 • Plural diverse treatment stations, zones, or coating material source within single chamber
-
298.27 • Plural modes of movement (e.g., planetary, epicyclic, etc.)
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298.28 • Rotational movement
-
298.29 • Oscillatory movement
-
298.31 • Etching
-
298.32 • Measuring, analyzing or testing
-
298.33 • Specified gas feed or withdrawal
-
298.34 • Auxiliary electrode, bias means or specified power supply
-
298.35 • Multi-chamber, load/unload means or moving workpiece
-
298.36 • Beam or directed flux etching (e.g., ion beam, etc.)
-
298.37 • Magnetically enhanced
-
298.38 • Microwave excitation
-
298.39 • Plural parallel plates (e.g., desmearing reactor, etc.)
-
298.41 • Vacuum arc discharge coating
-
600 • Electrophoretic or electro-osmotic apparatus
-
601 • Capillary electrophoresis type
-
602 • With control means responsive to sensed condition
-
603 • With detailed detection system (e.g., including a light source and a camera, etc.)
-
604 • With injector
-
605 • Gel filled
-
606 • Gel electrophoresis type
-
607 • With control means responsive to sensed condition
-
608 • With programmed, cyclic, or time responsive control means
-
609 • Plural rapid changes in direction of electric field (at least 1,000 times total and at more than 1/sec) (e.g., pulsed field, etc.)
-
610 • Isoelectric focusing (i.e., uses pH variation)
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