Title:
【発明の名称】フォトリソグラフィー過程を監視する方法
Document Type and Number:
Japanese Patent JP2000500930
Kind Code:
A
Abstract:
A method of monitoring a photolithographic process whereby a test pattern (4) is imaged a number of times side by side with the same radiant energy on a photoresist layer (1) provided on a surface (2) of a substrate (3), but in a series of different irradiation times, after which the photoresist is developed. The irradiation dose or "energy-to-clear" with which the photoresist becomes just soluble in developer can thus be ascertained. The radiant energy with which the test pattern is imaged on the photoresist is only a fraction here of the radiant energy available in the process itself for imaging patterns on photoresist which is to be monitored. The method is thus suitable for monitoring a photolithographic process in which pulsed laser radiation is used for the pattern irradiation. The energy-to-clear can be accurately determined also in these processes.
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Inventors:
Zandbergen Peter
Juffermans Casparus Antonius Henrix
Hefour-Fan Anthem Wendy Franciska Johanna
Juffermans Casparus Antonius Henrix
Hefour-Fan Anthem Wendy Franciska Johanna
Application Number:
JP51443198A
Publication Date:
January 25, 2000
Filing Date:
July 15, 1997
Export Citation:
Assignee:
Philips Electronics Nemrose Fennaught Shap
International Classes:
G03F7/20; H01L21/027; (IPC1-7): H01L21/027; G03F7/20
Attorney, Agent or Firm:
Akihide Sugimura (5 outside)