Title:
【発明の名称】分別したノボラック樹脂及びそれから得られるフォトレジスト組成物
Document Type and Number:
Japanese Patent JP2001506296
Kind Code:
A
Abstract:
The present invention provides a method for producing a film forming, fractionated novolak resin having consistent molecular weight and superior performance in photoresist composition, by isolating such novolak resin fractions without high temperature distillation. A method is also provided for producing photoresist composition from such a fractionated novolak resin and for producing semiconductor devices using such a photoresist composition.
Inventors:
Rahman M. Darryl
Lou Pin-Han
Lou Pin-Han
Application Number:
JP52731298A
Publication Date:
May 15, 2001
Filing Date:
December 16, 1997
Export Citation:
Assignee:
Clariant International Limited
International Classes:
C08G8/00; C08G8/08; C08G16/02; C08L61/06; G03F7/023; (IPC1-7): C08G8/08; C08L61/06; G03F7/023
Attorney, Agent or Firm:
Mitsufumi Ezaki (3 others)