Login| Sign Up| Help| Contact|

Patent Searching and Data


Title:
【発明の名称】清浄資源を供給するための方法および装置
Document Type and Number:
Japanese Patent JP2001507112
Kind Code:
A
Abstract:
A method and apparatus provides a resource capable of affecting the manufacture of a product to a bay and a chase. Clean resource is supplied to the bay where it is used to affect the manufacture of a product in one or more steps highly sensitive to contaminants in the resource. The resource contaminated by the manufacture of the product is then sent to a chase where it is further used to affect the manufacture of the same or a different product in steps that are less sensitive to the contamination of the resource. Because the bay is most sensitive to contaminants in the resource, the impurified resource received at the chase may not adversely affect the manufacture of products in the chase and thus, supplying a clean resource to the chase is unnecessary.

Inventors:
Michael O'Haloran
Corn, Wilmer
Nelson, Stephen
Application Number:
JP51755498A
Publication Date:
May 29, 2001
Filing Date:
September 30, 1997
Export Citation:
Click for automatic bibliography generation   Help
Assignee:
C2 Mhill Industrial Design Corporation
International Classes:
F24F7/06; F24F3/16; H01L21/02; (IPC1-7): F24F7/06; H01L21/02
Attorney, Agent or Firm:
Akira Asamura (3 outside)