Title:
【発明の名称】気相ヘテロ原子除去のための気相段間接触を伴なう2段水素処理方法
Document Type and Number:
Japanese Patent JP2002524652
Kind Code:
A
Abstract:
A hydroprocessing process includes two hydroprocessing reaction stages, both of which produce a liquid and a vapor effluent, and a liquid-vapor contacting stage. The first stage vapor effluent contains impurities, such as heteroatom compounds, which are removed from the vapor by contact with processed liquid effluent derived from one or both reaction stages and, optionally, also liquid recovered from processed vapor. The first and contact stage liquid effluents are passed into the second stage to finish the hydoprocessing. The contact and second stage vapor effluents are cooled to recover additional hydroprocessed product liquid.
Inventors:
Jung, Henry
Gupta, Ramesh
Ellis, Edward, Stanley
Rewis, William, Ernest
Gupta, Ramesh
Ellis, Edward, Stanley
Rewis, William, Ernest
Application Number:
JP2000570263A
Publication Date:
August 06, 2002
Filing Date:
September 08, 1999
Export Citation:
Assignee:
EXXON RESEARCH AND ENGINEERING COMPANY
International Classes:
C10G65/02; C10G45/02; C10G65/04; C10G65/10; C10G65/12; C10G70/06; (IPC1-7): C10G65/02; C10G45/02
Attorney, Agent or Firm:
Kenji Kawabi