Title:
【発明の名称】レーザ処理
Document Type and Number:
Japanese Patent JP2002532891
Kind Code:
A
Abstract:
The invention provides a system and method for vaporizing a target structure on a substrate. According to the invention, a calculation is performed, as a function of wavelength, of an incident beam energy necessary to deposit unit energy in the target structure. Then, for the incident beam energy, the energy expected to be deposited in the substrate as a function of wavelength is calculated. A wavelength is identified that corresponds to a relatively low value of the energy expected to be deposited in the substrate, the low value being substantially less than a value of the energy expected to be deposited in the substrate at a higher wavelength. A laser system is provided configured to produce a laser output at the wavelength corresponding to the relatively low value of the energy expected to be deposited in the substrate. The laser output is directed at the target structure on the substrate at the wavelength corresponding to the relatively low value of the energy expected to be deposited in the substrate, in order to vaporize the target structure.
Inventors:
Lower, william
Trepanier, Pierre
Smart, donald victor
Codingley, james
Protokin, michael
Trepanier, Pierre
Smart, donald victor
Codingley, james
Protokin, michael
Application Number:
JP2000587922A
Publication Date:
October 02, 2002
Filing Date:
December 16, 1999
Export Citation:
Assignee:
General Scanning Incorporated
International Classes:
B23K26/02; B23K26/06; B23K26/08; B23K26/10; B23K26/36; H01L21/3205; B23K26/40; H01L21/304; H01L21/768; H01L23/52; H01L23/525; H01L27/10; H01S3/00; (IPC1-7): H01L21/304; H01L21/3205; H01L27/10; H01S3/00
Attorney, Agent or Firm:
Kazuo Shamoto (5 outside)