Title:
【発明の名称】沈殿処理
Document Type and Number:
Japanese Patent JP2002537204
Kind Code:
A
Abstract:
The present invention relates to a process for inducing homogeneous precipitation of a metal oxide, wherein said metal is capable of existing in at least two cationic oxidation states, which process comprises the steps of: i) providing an aqueous solution of a metal in a lower cationic oxidation state; and ii) adding an oxidant capable of oxidising said metal to a higher cationic oxidation state under conditions such that the mixing of said aqueous solution and said oxidant is substantially complete before precipitation of an oxide of said metal in its higher oxidation state occurs.
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Inventors:
Pickering, stephen
Jurisic, boro
Jurisic, boro
Application Number:
JP2000599686A
Publication Date:
November 05, 2002
Filing Date:
February 15, 2000
Export Citation:
Assignee:
European Communities Represented By The Commission Of The European Communities
International Classes:
C01G49/02; B01J20/28; B01J23/10; B01J35/02; C01B13/02; C01B13/32; C01B13/36; C01F17/235; C03C1/00; C03C19/00; C09K3/14; C09K11/08; (IPC1-7): C01B13/32; B01J20/28; B01J23/10; B01J35/02; C01F17/00; C01G49/02; C03C19/00; C09K3/14; C09K11/08
Attorney, Agent or Firm:
Fukami Hisaro (5 others)