Title:
【発明の名称】フッ化水素ガスを用いる高純度溶液の調製方法
Document Type and Number:
Japanese Patent JP2002540257
Kind Code:
A
Abstract:
The invention relates to a method for producing a high-purity solution that contains hydrogen fluoride or a salt thereof or a mixture of two or more thereof. The inventive method comprises the following step (i): hydrogen fluoride is passed into at least one anhydrous solvant. The method is characterised in that hydrogen fluoride is passed into the at least one anhydrous solvant as a gas or liquid gas or as a mixture of gas and liquid gas.
Inventors:
Sievert, Wolfgang
Application Number:
JP2000607921A
Publication Date:
November 26, 2002
Filing Date:
March 29, 2000
Export Citation:
Assignee:
Honeywell Specialty Chemicals Zeerze Geembehr
International Classes:
C01B7/01; C01B7/09; C01B7/19; C09K13/08; H01L21/306; H01L21/311; (IPC1-7): C09K13/08; C01B7/19
Attorney, Agent or Firm:
Kazuo Shamoto (5 outside)