Title:
【発明の名称】高圧高温反応システム
Document Type and Number:
Japanese Patent JP2003508222
Kind Code:
A
Abstract:
In a high pressure and high temperature reaction system suitable for oxidative waste treatment, particularly a reaction system for supercritical water oxidation (SCWO), a method is disclosed for injecting a first fluid of a first temperature at a first flow rate into a second fluid of a second temperature at a second flow rate, mixing the first and the second fluids within a mixing length ( 115, 215 ), and wherein the first and second temperatures and the first and second flow rates are selected such that a temperature of the mixed fluids downstream of said mixing length ( 115, 215 ) is obtained, at which said first fluid being substantially non-corrosive.
Inventors:
Guidner Anders
Stenmark, Lars
Elforth, Stefan
Abrahamshon, Yang
Carlshon, Kim
Stenmark, Lars
Elforth, Stefan
Abrahamshon, Yang
Carlshon, Kim
Application Number:
JP2001521665A
Publication Date:
March 04, 2003
Filing Date:
August 31, 2000
Export Citation:
Assignee:
KEMATURE ENGINEERING ACTIVOLAG
International Classes:
B01F5/04; B01F5/06; B01F15/06; B01J3/00; C02F1/74; B01J3/02; B01J3/04; B01J19/02; B01J19/26; C02F11/08; B01F13/10; C02F1/72; C02F1/76; (IPC1-7): C02F1/74; B01J3/00; B01J3/02; B01J3/04; B01J19/02
Domestic Patent References:
| JPH07313987A | 1995-12-05 | |||
| JPH11239722A | 1999-09-07 | |||
| JP2000189780A | 2000-07-11 |
Attorney, Agent or Firm:
Hironobu Onda (1 person outside)