Title:
【発明の名称】統計的プロセス制御を使用してコントローラの性能を監視するための方法および装置
Document Type and Number:
Japanese Patent JP2003511750
Kind Code:
A
Abstract:
The present invention provides for a method and an apparatus for monitoring controller performance using statistical process control analysis. A manufacturing model is defined. A processing run of semiconductor devices is performed as defined by the manufacturing model and implemented by a process controller. A fault detection analysis is performed on the process controller. At least one control input signal generated by the process controller is updated. The apparatus of the present invention comprises: a processing controller; a processing tool coupled with the processing controller; a metrology tool interfaced with the processing tool; a control modification data calculation unit interfaced with the metrology and connected to the processing controller in a feedback manner; a predictor function interfaced with the processing controller; an statistical process control analysis unit interfaced with the predictor function and the processing tool; and a results versus prediction analysis unit interfaced with the statistical process control analysis unit and connected to the processing controller in a feedback manner.
More Like This:
Inventors:
Toplac, Anthony Jay
Campbell, William Jay
Campbell, William Jay
Application Number:
JP2001528761A
Publication Date:
March 25, 2003
Filing Date:
April 28, 2000
Export Citation:
Assignee:
ADVANCED MICRO DEVICES INCORPORATED
International Classes:
G05B13/04; G05B19/418; H01L21/027; (IPC1-7): G05B19/418; G05B13/04; H01L21/027
Domestic Patent References:
| JPH02206804A | 1990-08-16 | |||
| JPH05157449A | 1993-06-22 | |||
| JPH06244261A | 1994-09-02 |
Attorney, Agent or Firm:
Fukami Hisaro (5 others)