Title:
【発明の名称】フルオロシルセスキオキサン膜の堆積
Document Type and Number:
Japanese Patent JP2003512390
Kind Code:
A
Abstract:
There is provided an array of fluoro-substituted silsesquioxane thin film precursors having a structure wherein fluoro groups are bonded to the silicon atoms of a silsesquioxane cage. In a first aspect, the present invention provides a composition comprising a vaporized material having the formula [F-SiO1.5]x[H-SiO1.5]y, wherein x+y=n, n is an integer between 2 and 30, x is an integer between 1 and n and y is a whole number between 0 and n. Also provided are films made from these precursors and objects comprising these films.
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Inventors:
Hatsker, Niger P.
Application Number:
JP2001531931A
Publication Date:
April 02, 2003
Filing Date:
October 18, 2000
Export Citation:
Assignee:
Allied Signal, Inc.
International Classes:
B05D7/24; C01B33/113; C07F7/12; C08G77/24; C09D4/00; B05D5/12; C09D183/08; C23C16/40; H01L21/316; H01L21/312; (IPC1-7): C07F7/12; C08G77/24; C23C16/40
Attorney, Agent or Firm:
Yoshio Kawaguchi (4 outside)