Title:
【発明の名称】高純度硫酸の製法
Document Type and Number:
Japanese Patent JP2003519066
Kind Code:
A
Abstract:
The invention relates to a novel method for producing high-purity sulfuric acid for use in the semiconductor industry. The method comprises the addition of a hydrogen peroxide solution to an engineered oelum in order to reduce the SO2 concentration, evaporation of the SO3 and separation of acid traces. The high-purity SO3 is then enriched with inert gas and the SO3 is absorbed into sulfuric acid.
Inventors:
Hostalek, Martin
Bootnell, Vernell
Hafner, Rolf
Le, Qi-Peng
Kang, Ching-Jung
Zeitz, Ekehard
Friedel, Ernst
Bootnell, Vernell
Hafner, Rolf
Le, Qi-Peng
Kang, Ching-Jung
Zeitz, Ekehard
Friedel, Ernst
Application Number:
JP2001549288A
Publication Date:
June 17, 2003
Filing Date:
December 07, 2000
Export Citation:
Assignee:
Merck Patent Gesellschaft Mitt Beschlenktel Haftung
International Classes:
C01B17/69; C01B17/90; (IPC1-7): C01B17/90
Domestic Patent References:
| JPH11246207A | 1999-09-14 | |||
| JPS61122107A | 1986-06-10 | |||
| JPS60139319A | 1985-07-24 | |||
| JPH08337406A | 1996-12-24 | |||
| JPH11246207A | 1999-09-14 | |||
| JPS61122107A | 1986-06-10 | |||
| JPS60139319A | 1985-07-24 | |||
| JPH08337406A | 1996-12-24 |
Attorney, Agent or Firm:
Nobuyuki Kaneda (2 others)