Title:
酸化膜電荷測定装置を監視ならびに較正するデバイスおよびその方法
Document Type and Number:
Japanese Patent JP2004507878
Kind Code:
A
Abstract:
A stabilized wafer for monitoring and calibrating oxide charge test equipment. The stabilized wafer comprises; a silicon wafer, a SiO2 layer of at least 100 angstroms upon the silicon wafer, and a phosphosilicate glass layer containing phosphorus formed in the SiO2 layer for providing the stabilized wafer by stabilizing an SiO2 interface and containing oxygen ions. The stabilized wafer is used for monitoring and calibrating oxide charge test equipment.
Inventors:
Ronald Koersh
Robert Coerche
Robert Coerche
Application Number:
JP2001568682A
Publication Date:
March 11, 2004
Filing Date:
March 20, 2000
Export Citation:
Assignee:
Ronald Koersh
Robert Coerche
Robert Coerche
International Classes:
H01L21/66; H01L23/544; G11B5/39; H01L21/316; (IPC1-7): H01L21/66
Attorney, Agent or Firm:
Hirotsugu Yoshioka
Tatsuyuki Unuma
Tatsuyuki Unuma