Title:
低分子量側鎖を有するオレフィングラフトコポリマーを製造するための放射方法
Document Type and Number:
Japanese Patent JP2004513196
Kind Code:
A
Abstract:
Graft copolymers are prepared, in a non-oxidizing atmosphere, by (1) irradiating a particulate olefin polymer material with high energy ionizing radiation, (2) treating the irradiated olefin polymer material with at least one grafting monomer that is capable of forming side chains on the olefin polymer material, in the presence of at least one additive to control the molecular weight of the side chains of the polymerized grafting monomer selected from (a) at least one hydroxylamine derivative polymerization inhibitor, and (b) at least one thio-, nitro-, or halogen-substituted aliphatic or aromatic compound or an aliphatic or aromatic phosphine derivative, and (3) deactivating the residual free radicals in the resulting grafted olefin polymer material and removing any unreacted vinyl monomer from the material. Graft copolymers with low molecular weight side chains are produced that are easier to process and have improved internal and surface morphology.
Inventors:
Dan Vue A
Phantom Thiem
Smith Janine A
Song Chen Kew
Phantom Thiem
Smith Janine A
Song Chen Kew
Application Number:
JP2002539405A
Publication Date:
April 30, 2004
Filing Date:
October 26, 2001
Export Citation:
Assignee:
Basel Technology Company Besloten Fennaught Shap
International Classes:
C08F255/02; C08F255/00; (IPC1-7): C08F255/00
Attorney, Agent or Firm:
Minoru Nakamura
Fumiaki Otsuka
Sadao Kumakura
Shishido Kaichi
Hideto Takeuchi
Toshio Imajo
Nobuo Ogawa
Village shrine Atsuo
Takaki Nishijima
Atsushi Hakoda
Fumiaki Otsuka
Sadao Kumakura
Shishido Kaichi
Hideto Takeuchi
Toshio Imajo
Nobuo Ogawa
Village shrine Atsuo
Takaki Nishijima
Atsushi Hakoda