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Patent Searching and Data


Title:
シリコーン樹脂の調製
Document Type and Number:
Japanese Patent JP2004531603
Kind Code:
A
Abstract:
In a process for the preparation of a solution of a stable silicone resin comprising SiO4/2 units and units selected from RSiO3/2, RR'SiO2/2, and RR'2SiO1/2 units, where R is an alkyl, alkenyl, substituted alkyl, cycloalkyl, aryl or aralkyl group imparting desired physical or chemical properties to the resin, for example a thermally labile group, and each R' is a different alkyl, substituted alkyl, cycloalkyl, aryl or aralkyl group, or a hydrogen atom, a hydrosiloxane resin comprising HSiO3/2 units and the said units selected from RSiO3/2, RR'SiO2/2, and RR'2SiO1/2 units is treated with a base to condense at least some of the HSiO3/2 units to form SiO4/2 units. The base is preferably a solution of an alkali metal salt of a weak acid, such as sodium acetate.

Inventors:
McKinnon, Ain
Oh, Duane Li
Chevalier, Pierre Maurice
Application Number:
JP2002579929A
Publication Date:
October 14, 2004
Filing Date:
March 22, 2002
Export Citation:
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Assignee:
DOW CORNING CORPORATION
International Classes:
C01B33/12; C08G77/04; C08G77/08; C08G77/12; C08G77/38; C08K5/098; C09D183/04; (IPC1-7): C08G77/38; C01B33/12; C09D183/04
Attorney, Agent or Firm:
Michiteru Soga
Michiharu Soga
Hidetoshi Furukawa
Suzuki Kenchi
Kajinami order