Title:
合成ガスから硫黄化合物を選択的に除去する方法
Document Type and Number:
Japanese Patent JP2005517744
Kind Code:
A
Abstract:
A process for the selective removal of sulphur compounds from synthesis gas being rich in carbon monoxide and containing hydrogen, carbon monoxide and containing hydrogen, carbon dioxide and steam comprising contacting the synthesis gas at a maximum contact temperature of 100° C. with an absorbent comprising Cu/ZnO compounds and being prepared by thermal decomposition of a corresponding carbonate and activation of the thermal decomposed carbonate with a reducing gas.
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Inventors:
Hansen Jens-Henrik Bak
Hammershore Birgitte
Ciguadall Dottier Inga Dora
Hammershore Birgitte
Ciguadall Dottier Inga Dora
Application Number:
JP2003567548A
Publication Date:
June 16, 2005
Filing Date:
February 15, 2003
Export Citation:
Assignee:
Haldor Topser Actiezer Scabet
International Classes:
B01D53/14; B01D53/02; B01J20/06; C01B3/58; C10K1/32; (IPC1-7): C10K1/32; B01D53/14; B01J20/06
Attorney, Agent or Firm:
Mitsufumi Esaki
Tsuneo Mihara
Okumura Yoshimichi
Blacksmith
Tsuneo Mihara
Okumura Yoshimichi
Blacksmith