Title:
極紫外線放射の発生方法
Document Type and Number:
Japanese Patent JP2005524943
Kind Code:
A
Abstract:
A method of generating extreme ultraviolet radiation, wherein the radiant medium is a plasma generated by processing a basic material, and the basic material distribution of the radiant medium consists at least of one halogenide of the metals lithium (Li), indium (In), tin (Sn), antimony (Sb), tellurium (Te), aluminum (Al) and/or a halogen 5 and/or an inert gas, with the exception of halogenides on the basis of lithium (Li) and chlorine (Cl) as well as fluorine (F).
Inventors:
Della, Goonzel, Hans
Niemann, Ulrich
Niemann, Ulrich
Application Number:
JP2004502683A
Publication Date:
August 18, 2005
Filing Date:
April 22, 2003
Export Citation:
Assignee:
Koninklijke Philips Electronics N.V.
International Classes:
H01L21/027; H05G2/00; H05H1/24; (IPC1-7): H05H1/24; H01L21/027; H05G2/00
Domestic Patent References:
| JP2000346999A | 2000-12-15 | |||
| JP2001202910A | 2001-07-27 | |||
| JP2002020745A | 2002-01-23 | |||
| JP2004501491A | 2004-01-15 | |||
| JPS6366836A | 1988-03-25 | |||
| JPH02230601A | 1990-09-13 | |||
| JP2003297741A | 2003-10-17 |
Foreign References:
| DE10205189C | ||||
| WO2001099143A1 | 2001-12-27 |
Attorney, Agent or Firm:
Masao Sawada