Title:
<200nmレーザリソグラフィーのための散乱のないUV光学フッ化物結晶素子および方法
Document Type and Number:
Japanese Patent JP2005534611
Kind Code:
A
Abstract:
The invention provides a scatter-free below 200 nm wavelength transmitting optical fluoride lithography crystal for use with below 200 nm laser light. The invention includes making below 200 nm wavelength transmitting optical fluoride lithography crystals with a calcium fluoride feedstock in a low-chlorine graphite optical fluoride crystal crucible having a chlorine content concentration less than 0.3 ppm Cl by weight. The method includes melting calcium fluoride feedstock in the <0.3 ppm Cl graphite crucible to form a low-chlorine calcium fluoride crystal from the melt in the crucible to provide a grown calcium fluoride scatter-free crystal having a chlorine concentration less than 0.25 Cl by weight.
Inventors:
Price, Michael W
Rodriguez, Gale A
Rodriguez, Gale A
Application Number:
JP2004527639A
Publication Date:
November 17, 2005
Filing Date:
July 24, 2003
Export Citation:
Assignee:
CORNING INCORPORATED
International Classes:
G02B1/02; C30B11/00; C30B29/12; (IPC1-7): C30B29/12; C30B11/00; G02B1/02
Attorney, Agent or Firm:
Yanagita Seiji
Go Sakuma
Go Sakuma