Title:
オーガに基づく薄膜測定法
Document Type and Number:
Japanese Patent JP2005539210
Kind Code:
A
Abstract:
Apparatus for analysis of a thin film formed over an underlying layer on a surface of a sample, the thin film including first elements, while the underlying layer includes second elements. The apparatus includes an electron gun, which directs a beam of electrons to impinge on a point on the surface of the sample at which the thin film is formed. An electron detector receives Auger electrons emitted by the first and second elements responsive to the impinging beam of electrons, and to output a signal indicative of a distribution of energies of the emitted electrons. A controller receives the signal and analyzes the distribution of the energies so as to determine a composition of the first elements in the thin film and a thickness of the thin film.
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Inventors:
Kadishevich, Alexander
Simon, avi
Simon, avi
Application Number:
JP2003566533A
Publication Date:
December 22, 2005
Filing Date:
February 04, 2003
Export Citation:
Assignee:
APPLIED MATERIALS,INCORPORATED
International Classes:
G01N23/203; G01N23/227; G01Q30/02; (IPC1-7): G01N23/203
Domestic Patent References:
| JP2003504609A | 2003-02-04 | |||
| JP2001201470A | 2001-07-27 | |||
| JPH11330187A | 1999-11-30 | |||
| JP2002016320A | 2002-01-18 |
Foreign References:
| WO2001004574A1 | 2001-01-18 |
Attorney, Agent or Firm:
Yoshiki Hasegawa
Yuichi Yamada
Yuichi Yamada