Title:
プラズマ処理システムとともに光学系を使用するための装置及び方法
Document Type and Number:
Japanese Patent JP2006501620
Kind Code:
A
Abstract:
A plasma processing system and method for operating an optical system in conjunction with a plasma processing system are provided. The plasma processing system includes an optical system in communication with a plasma processing chamber of the plasma processing system. The optical system has a window and is constructed and arranged to detect a plasma process condition through the window and a transmission condition of the window. The method includes detecting an optical emission from the plasma processing region and monitoring contamination of a window provided by the optical system.
More Like This:
Inventors:
Mitrovic, Andrei
Ludovicson, Audan
Ludovicson, Audan
Application Number:
JP2004541483A
Publication Date:
January 12, 2006
Filing Date:
August 21, 2003
Export Citation:
Assignee:
東京エレクトロン株式会社
International Classes:
H05H1/00; G01L21/30; H01J37/32; H01L21/3065
Domestic Patent References:
| JPH0936102A | 1997-02-07 | |||
| JPH0868754A | 1996-03-12 | |||
| JPH05259250A | 1993-10-08 | |||
| JPS63303086A | 1988-12-09 | |||
| JPH08106992A | 1996-04-23 | |||
| JPH08181104A | 1996-07-12 | |||
| JP2003524753A | 2003-08-19 |
Foreign References:
| US6077386A | 2000-06-20 | |||
| US5759424A | 1998-06-02 |
Attorney, Agent or Firm:
Takehiko Suzue
Satoshi Kono
Makoto Nakamura
Sadao Muramatsu
Ryo Hashimoto
Satoshi Kono
Makoto Nakamura
Sadao Muramatsu
Ryo Hashimoto