Title:
重合可能な化合物、ポリマー、レジストおよびリソグラフィ方法
Document Type and Number:
Japanese Patent JP2006509845
Kind Code:
A
Abstract:
A polymerizable composition (I) for the production of a resist (II) contains at least one unsaturated polymerizable monomer having at least one silicon atom and at least one carbonyl group. Independent claims are included for: (1) a polymer (III) prepared by polymerization of the composition (I); (2) a resist (II) comprising 2-30% polymer (III), 70-98% solvent and 0.1 -10% of a photoacid initiator; (3) a lithographic process for the production of a structure on a substrate, preferably a lithographic mask for the production of semiconductor components by use of a resist (II).
Inventors:
Elian, Claus
Application Number:
JP2004528437A
Publication Date:
March 23, 2006
Filing Date:
July 21, 2003
Export Citation:
Assignee:
Infineon Technologies AG
International Classes:
C08F30/08; C07F7/04; C07F7/08; C07F7/10; G03F7/004; G03F7/039; G03F7/075; H01L21/027
Attorney, Agent or Firm:
Kenzo Hara
Ryuichi Kijima
Ichiro Kaneko
Ryuichi Kijima
Ichiro Kaneko