Title:
高純度フェノールの製造方法
Document Type and Number:
Japanese Patent JP2006517229
Kind Code:
A
Abstract:
A method of manufacturing a phenol product having a reduced concentration of a contaminating reaction by-product. The method includes contacting a phenol stream, having a concentration of the contaminating by-product, by contacting the phenol stream with an acidic catalyst under suitable purification reaction conditions. Also included is a composition comprising a sec-butyl benzene derived phenol product that has been purified by the removal of certain undesirable reaction by-products.
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Inventors:
Payne, Larry Wayne
Application Number:
JP2006503299A
Publication Date:
July 20, 2006
Filing Date:
February 04, 2004
Export Citation:
Assignee:
Ciel International Research Mart Shats Pay BV
International Classes:
C07C37/86; C07C37/08; C07C39/04
Domestic Patent References:
| JPS4730628A | ||||
| JPS4211932B1 | ||||
| JPH0859529A | 1996-03-05 | |||
| JPH05286879A | 1993-11-02 |
Attorney, Agent or Firm:
Yoshio Kawaguchi
Makoto Ono
Kenkyo Kanayama
Katsuma Osaki
Mitsuaki Tsubokura
Makoto Ono
Kenkyo Kanayama
Katsuma Osaki
Mitsuaki Tsubokura