ガスクラスタ・イオン・ビームを測定しかつ制御する方法とそのための装置

Japanese Patent JP2006519982

A

Methods and apparatus are disclosed for measuring controlling characteristics of clusters in a cluster ion beam, including average cluster ion velocity {overscore (v, average cluster ion mass {overscore (m, average cluster ion energy E, average cluster ion charge state {overscore (q, average cluster ion mass per charge ${\left(\frac{m}{q}\right)}_{\mathrm{average}},$ and average energy/charge ${\left(\frac{E}{q}\right)}_{\mathrm{average}}.$ The measurements are employed in gas cluster ion beam processing systems to monitor and control gas cluster ion beam characteristics that are critical for optimal processing of workpieces by gas cluster ion beam irradiation.

Swenson, David, Earl.

JP2006503056A

August 31, 2006

January 27, 2004

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Epion Corporation

G01N27/62; B01J19/08; C23C14/22; C23C14/32; C23C14/54; H01J37/304

Takenori Hiroe
Takanobu Takekawa
High Shinichi Ara
Nakamura Shigenori
Tsutomu Nishio

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