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Title:
少なくとも1層の光触媒層と該層のヘテロエピタキシャル成長のための下地層とを備えた基材、特にガラス基材
Document Type and Number:
Japanese Patent JP2007508933
Kind Code:
A
Abstract:
A structure comprises a substrate carrying, on at least a part of its surface, a titanium oxide (TiO 2) based layer with anti-stain photocatalytic properties. The TiO 2 is at least in part crystallised in the form of anatase. It incorporates, immediately beneath the TiO 2 layer, a sub-layer with a crystallographic structure allowing an assistance to crystallisation by hetero-epitaxial growth in the form of anatase of the upper layer of the TiO 2 base, the photocatalytic property having been acquired without any heating stage. Independent claims are also included for: (a) the fabrication of this structure; (b) a single or multiple glazing incorporating this structure.

Inventors:
La Bruce, Laurent
Nado, Nikola
Application Number:
JP2006536150A
Publication Date:
April 12, 2007
Filing Date:
October 22, 2004
Export Citation:
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Assignee:
Saint-Gobain Glass France
International Classes:
B01J35/02; C03C17/34; C03C25/52; C04B41/52; E04F13/08
Domestic Patent References:
JP2007512154A2007-05-17
JP2005007295A2005-01-13
JP2004510051A2004-04-02
JP2001158606A2001-06-12
JP2001342022A2001-12-11
JP2001347162A2001-12-18
JP2002060300A2002-02-26
JP2000239047A2000-09-05
JP2002060300A2002-02-26
JP2000239047A2000-09-05
Foreign References:
WO2003009061A22003-01-30
WO2002040417A22002-05-23
WO2000018504A12000-04-06
WO2002024971A12002-03-28
WO2000018504A12000-04-06
WO2002024971A12002-03-28
Other References:
JPN7011000058; TAKAHASHI, T. et al: 'Influence of working gas pressure on structure and properties of WO3 films reactively deposited by r' JOURNAL OF VACUUM SCIENCE AND TECHNOLOGY A Vol.21, No.4, 20030702, p.1414-1418
JPN7011000061; CHEN, S. et al: 'Ultrahigh vacuum metalorganic chemical vapor deposition growth and in situ characterization of epita' JOURNAL OF VACUUM SCIENCE AND TECHNOLOGY A Vol.11, No.5, 199309, p.2419-2429
JPN6011000818; ZEMAN, P. et al: 'Nano-scaled photocatalytic TiO2 thin films prepared by magnetron sputtering' Thin Solid Films Vol.433, No.1-2, 20030602, p.57-62
JPN6010069163; W. Sugimura et al.: 'Anatase-type TiO2 thin films produced by lattice deformation' Jpn. J. Appl. Phys. Vol. 36, No. 12A, 199712, pp. 7358-7359, The Japan Society of Applied Physics
JPN6012019098; 苗蕾,外: '二酸化チタンスパッタ薄膜の光学特性  Optical properties of TiO2 thin films deposited by rf magnetron' 2002年(平成14年)秋季 第63回応用物理学会学術講演会講演予稿集 第2分冊  Extended Abstracts 第2巻, 27a-ZN-3, 20020924, p.526, (社)応用物理学会
JPN6012019101; 村上真,外: 'コンビナトリアルレーザーMBE法によるLaAlO3(001)上に作成したTiO2薄膜の評価' 応用物理学関係連合講演会講演予稿集2000春2  Extended Abstracts (The 47th Spring Meeting, 2000);T 28p-ZB-7, 20000328, p.582, (社)応用物理学会
JPN7011000056; TAKAHASHI, T. et al: 'Photocatalytic properties of TiO2/WO3 bilayers deposited by reactive sputtering' JOURNAL OF VACUUM SCIENCE AND TECHNOLOGY A Vol.21, No.4, 20030702, p.1409-1413
JPN7011000057; TAKAHASHI, T. et al: 'Effects of plasma exposure on structural and optical properties of TiO2 films deposited by off-axis' JOURNAL OF VACUUM SCIENCE AND TECHNOLOGY A Vol.20, No.6, 200211, p.1916-1920
JPN6011000814; TAKAHASHI, T. et al: 'Dependence of working gas pressure and ratio of Ar to O2 on properties of TiO2 films deposited by fa' Thin Solid Films Vol.420-421, 20021202, p.433-437
JPN7011000059; HSIEH, C. C. et al: 'Monophasic TiO2 films deposited on SrTiO3(100) by pulsed laser ablation' JOURNAL OF APPLIED PHYSICS Vol.92, No.5, 20020901, p.2518-2523
JPN6011000817; ZHANG, W. et al: 'Surface modification of TiO2 film by iron doping using reactive magnetron sputtering' Chemical Physics Letters Vol.373, No.3-4, 20030520, p.333-337
CSNC200758740253; 苗蕾,外: '二酸化チタンスパッタ薄膜の光学特性  Optical properties of TiO2 thin films deposited by rf magnetron' 2002年(平成14年)秋季 第63回応用物理学会学術講演会講演予稿集 第2分冊  Extended Abstracts 第2巻, 27a-ZN-3, 20020924, p.526, (社)応用物理学会
CSNC200758590241; 村上真,外: 'コンビナトリアルレーザーMBE法によるLaAlO3(001)上に作成したTiO2薄膜の評価' 応用物理学関係連合講演会講演予稿集2000春2  Extended Abstracts (The 47th Spring Meeting, 2000);T 28p-ZB-7, 20000328, p.582, (社)応用物理学会
Attorney, Agent or Firm:
Atsushi Aoki
Takashi Ishida
Tetsuji Koga
Nagasaka Tomoyasu
Hiroshi Kamematsu