Title:
ノボラック型の構造を有する誘導体化されたポリヒドロキシスチレン、および、それらの製造方法
Document Type and Number:
Japanese Patent JP2007536398
Kind Code:
A
Abstract:
A process for preparing derivatized poly(4-hydroxystryrene) having a novolak type structure which comprises the steps of (i) supplying a solution of methanol containing 4-hydroxyphenylmethylcarbinol, (ii) subjecting said solution to an acid catalyzed displacement reaction for a sufficient period of time and under suitable conditions of temperature and pressure to convert substantially all of said carbinol to 4-hydroxyphenylmethylcarbinol methyl ether in solution, (iii) polymerizing said ether containing solution in the presence of a suitable acid catalyst for a sufficient period of time and under suitable conditions of temperature and pressure to form a novolak type polymer. New compositions of matter which comprise the derivatized poly(4-hydroxystyrene) prepared in the above manner and which have application in the electronic chemicals market such as in a photoresist composition, and in other areas such as in varnishes, printing inks, epoxy resins, copying paper, tackifiers for rubber, crude oil separators, and the like.
Inventors:
Sheehan, Michael Tea
Edward, Gee
Edward, Gee
Application Number:
JP2007511408A
Publication Date:
December 13, 2007
Filing Date:
April 22, 2005
Export Citation:
Assignee:
DuPont Electronic Polymers LP
International Classes:
C08G61/02; C07C41/09; C07C43/178; C08G59/62; C08G61/04; C08L65/00; C08L101/00; C09D7/12; C09D11/02; C09D125/18; C09D151/08; C09D161/06; C09J11/08; C09J151/08; C09J161/06; C09K15/08; G03C1/76; H05K3/28; C07B61/00; G03F7/023; G03F7/038
Domestic Patent References:
| JPS5653131A | 1981-05-12 | |||
| JPS6166709A | 1986-04-05 | |||
| JP2000502371A | 2000-02-29 | |||
| JP2002525304A | 2002-08-13 | |||
| JP2001500917A | 2001-01-23 | |||
| JP2001515526A | 2001-09-18 |
Attorney, Agent or Firm:
Kazuo Shamoto
Shinjiro Ono
Yasushi Kobayashi
Akio Chiba
Hiroyuki Tomita
Hiroaki Noya
Shinjiro Ono
Yasushi Kobayashi
Akio Chiba
Hiroyuki Tomita
Hiroaki Noya