Title:
粘性前駆物質を用いた化学気相堆積による機能的に段階的な誘電体層の堆積方法
Document Type and Number:
Japanese Patent JP2008511758
Kind Code:
A
Abstract:
A method of forming a graded dielectric layer on an underlying layer including flowing a mixture of a silicon-carbon containing gas, an oxygen containing gas and a carrier gas through a showerhead comprising a blocking plate and a faceplate to form an oxide rich portion of the graded dielectric layer, where the silicon-carbon containing gas has an initial flow rate, flowing the silicon-carbon containing gas at a first intermediate flow rate for about 0.5 seconds or longer, where the first intermediate flow rate is higher than the initial flow rate, and flowing the silicon-carbon containing gas at a fastest flow rate higher than the first intermediate flow rate to form a carbon rich portion of the graded dielectric layer.
Inventors:
Paddy, Dinesh
Park, Seohyun
Barras Bramanian, Ganesh
Rocha-Alvarez, Juan Carlos
Sha, Lee Kun
Whitty, Derek, Earl.
Mathard, hichem
Park, Seohyun
Barras Bramanian, Ganesh
Rocha-Alvarez, Juan Carlos
Sha, Lee Kun
Whitty, Derek, Earl.
Mathard, hichem
Application Number:
JP2007530308A
Publication Date:
April 17, 2008
Filing Date:
August 29, 2005
Export Citation:
Assignee:
APPLIED MATERIALS,INCORPORATED
International Classes:
C23C16/42; C23C16/455; H01L21/316; H01L21/768; H01L23/522
Domestic Patent References:
| JP2002198366A | 2002-07-12 | |||
| JP2004172590A | 2004-06-17 |
Foreign References:
| WO2003052162A1 | 2003-06-26 |
Attorney, Agent or Firm:
Yoshiki Hasegawa
Yuichi Yamada
Yuichi Yamada