Title:
光安定性の化粧用又は皮膚科学用組成物
Document Type and Number:
Japanese Patent JP2008514672
Kind Code:
A
Abstract:
Disclosed is the use of an effective photo-stabilizing amount of stabilizing agent (a) selected from a diphenylacrylate UV filter (a1), a benzylidene cmphor derivative (a2), an organosiloxane comprising benzalemalonate groups (a3), a fluoren derivative (a4), and a naphthalene dicarboxylic acid derivative (a5) for improving the stability with respect to UV radiation of a cosmetic or dermatological composition comprising a UV filter combination of at least one dibenzoylmethane derivative (b) and of at least one specific amino-substituted 2-hydroxybenzophenone derivative (c).
Inventors:
Mueller, Stefan
Herzog, Bernd
Quas, caccia
Herzog, Bernd
Quas, caccia
Application Number:
JP2007534002A
Publication Date:
May 08, 2008
Filing Date:
September 19, 2005
Export Citation:
Assignee:
Ciba Specialty Chemicals Holding Inc.
International Classes:
A61K8/37; A61K8/35; A61K8/44; A61K8/893; A61K8/97; A61Q17/04
Domestic Patent References:
JP2003192559A | 2003-07-09 | |||
JPH05504572A | 1993-07-15 | |||
JP2001240525A | 2001-09-04 |
Foreign References:
US20040166072A1 | 2004-08-26 | |||
US5605680A | 1997-02-25 | |||
US20040057912A1 | 2004-03-25 | |||
US5306486A | 1994-04-26 | |||
WO1999033439A1 | 1999-07-08 | |||
WO2003039506A2 | 2003-05-15 | |||
DE10157489B | ||||
WO2004069216A1 | 2004-08-19 | |||
EP1310236A1 | 2003-05-14 | |||
EP1310239A1 | 2003-05-14 | |||
DE10155865B | ||||
US20040166072A1 | 2004-08-26 | |||
US5605680A | 1997-02-25 | |||
US20040057912A1 | 2004-03-25 | |||
US5306486A | 1994-04-26 | |||
WO1999033439A1 | 1999-07-08 |
Attorney, Agent or Firm:
Calyx
Miyazaki Yoshio
Mitsuo Tateishi
Toshio Nakamura
Tsutomu Kato
Kaoru Onozuka
High Masahiro
Miyazaki Yoshio
Mitsuo Tateishi
Toshio Nakamura
Tsutomu Kato
Kaoru Onozuka
High Masahiro