Title:
ナノスケールのデバイスを製造するための干渉分析
Document Type and Number:
Japanese Patent JP2008522412
Kind Code:
A
Abstract:
The present invention features a method to determine relative spatial parameters between two coordinate systems, which may be a mold and a region of a substrate in which mold is employed to generate a pattern. The method includes sensing relative alignment between the two coordinate systems at multiple points and determines relative spatial parameters therebetween. The relative spatial parameters include a relative area and a relative shape.
Inventors:
Nimmacayara, Pawan Kay
Ruffati, Tom H
Agiri, Arlesa
Choi, Byung-jin
Shoemaker, Philip Di
Babs, Daniel A
Trusket, Van N
Ruffati, Tom H
Agiri, Arlesa
Choi, Byung-jin
Shoemaker, Philip Di
Babs, Daniel A
Trusket, Van N
Application Number:
JP2007543499A
Publication Date:
June 26, 2008
Filing Date:
November 21, 2005
Export Citation:
Assignee:
Molecular Imprints Incorporated
International Classes:
H01L21/027; G01B11/00; G03F7/20
Domestic Patent References:
| JP2006516065A | 2006-06-15 | |||
| JPH01107102A | 1989-04-25 | |||
| JPH09138110A | 1997-05-27 | |||
| JPH028704A | 1990-01-12 | |||
| JP2004335808A | 2004-11-25 | |||
| JP2006013400A | 2006-01-12 | |||
| JP2004335808A | 2004-11-25 | |||
| JP2006013400A | 2006-01-12 | |||
| JPH01107102A | 1989-04-25 | |||
| JPH09138110A | 1997-05-27 | |||
| JPH028704A | 1990-01-12 | |||
| JP2006516065A | 2006-06-15 |
Attorney, Agent or Firm:
Masaki Yamakawa
Shigeki Yamakawa
Shigeki Yamakawa
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