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Title:
疎水性に変性されたカチオン性ポリマー及び洗浄補助剤としてのそれらの使用。
Document Type and Number:
Japanese Patent JP2008523184
Kind Code:
A
Abstract:
A cleaning composition for hard surfaces containing a polymeric compound comprising a main backbone derived from at least the following monomeric components: (I) 20 to 99.9% by weight of at least one cationic monomer according to formula (I) wherein R1 and R2 are, independently of one another, hydrogen or C1-C4 alkyl; R3 and R4 are, independently of one another, hydrogen or alkyl, hydroxyalkyl, carboxyl alkyl, carboxyamide alkyl or alkoxyalkyl having from 1 to 18 carbon atoms; and Y represents an anion, and (II) 0.1 to 80% by weight of a hydrophobic unsaturated nonionic monomer that polymerizes in the presence of an initiator; optionally up to 60% by weight of a water-soluble monomer (III) which is different from either monomer (I) or monomer (II); and optionally reactant (IV), a crosslinking agent in an amount between 0 to 10% by weight, gives improved soil removal properties, antimicrobial and biofilm suppression properties as well as resistance to resoiling and staining.

Inventors:
Son, Jikian
Jaynes, Bingham Scott
Mao, Jan Wen
Pleus, Andrea
Application Number:
JP2007544880A
Publication Date:
July 03, 2008
Filing Date:
November 28, 2005
Export Citation:
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Assignee:
Ciba Holding Inc.
International Classes:
C11D7/22; A01N33/12; A01N61/00; A01P3/00; A47L13/17; B08B3/08; C08F226/04; C11D3/37; C11D17/04
Domestic Patent References:
JP2003238991A2003-08-27
Foreign References:
WO2004056888A22004-07-08
Attorney, Agent or Firm:
Calyx
Miyazaki Yoshio
Mitsuo Tateishi
Toshio Nakamura
Tsutomu Kato
Kaoru Onozuka
High Masahiro