Title:
ソース、ソースを取り付けるための構成、およびソースを取り付け取り出すための方法
Document Type and Number:
Japanese Patent JP2008537022
Kind Code:
A
Abstract:
The invention relates to an arrangement for installing a source into a gas deposition reactor. The arrangement comprises at least one source fitting for the source such that the source fitting is connected to a reaction space of the gas deposition reactor, and a source installable at least partly inside the source fitting or a source space connected to the source fitting. According to the invention, the arrangement further comprises reception means in the source fitting for receiving the source, and charging means for installing the source in place in the source fitting for use, and a chamber (1), provided in the source, for a solid or liquid source material (3), and isolating means (7, 19) for isolating the chamber (1) substantially from environment.
Inventors:
Soininen, Pecca
Application Number:
JP2008507108A
Publication Date:
September 11, 2008
Filing Date:
April 21, 2006
Export Citation:
Assignee:
Beneq Oy
International Classes:
C23C16/448; C23C14/24; C30B23/06; C30B25/14; C23C; H01L
Attorney, Agent or Firm:
Kazuo Shamoto
Shinjiro Ono
Yasushi Kobayashi
Akio Chiba
Hiroyuki Tomita
Takami Ito
Shinjiro Ono
Yasushi Kobayashi
Akio Chiba
Hiroyuki Tomita
Takami Ito