Title:
フォトレジスト除去のための動力学的な多目的組成物、および、その使用方法
Document Type and Number:
Japanese Patent JP2009514026
Kind Code:
A
Abstract:
Improved dry stripper solutions for removing one, two or more photoresist layers from substrates are provided. The stripper solutions comprise dimethyl sulfoxide, a quaternary ammonium hydroxide, and an alkanolamine, an optional secondary solvent and less than about 3 wt.% water and/or a dryness coefficient of at least about 1. Methods for the preparation and use of the improved dry stripping solutions are additionally provided.
Inventors:
Fenice, Michael Tee
Johnson, Lauri Lenny
Raymond, Chan
Schere, Diane Marie
Pollard, Kimberly Donna
Goebel, Gane
Johnson, Lauri Lenny
Raymond, Chan
Schere, Diane Marie
Pollard, Kimberly Donna
Goebel, Gane
Application Number:
JP2008537862A
Publication Date:
April 02, 2009
Filing Date:
October 24, 2006
Export Citation:
Assignee:
Dynaroy LLC
International Classes:
G03F7/42
Domestic Patent References:
| JP2003255565A | 2003-09-10 | |||
| JPH0728254A | 1995-01-31 | |||
| JP2004133153A | 2004-04-30 | |||
| JP2003255565A | 2003-09-10 | |||
| JPH0728254A | 1995-01-31 | |||
| JP2004133153A | 2004-04-30 | |||
| JP2001312074A | 2001-11-09 | |||
| JP2004093678A | 2004-03-25 |
Attorney, Agent or Firm:
Shinjiro Ono
Kazuo Shamoto
Yasushi Kobayashi
Akio Chiba
Hiroyuki Tomita
Minako Matsuyama
Kazuo Shamoto
Yasushi Kobayashi
Akio Chiba
Hiroyuki Tomita
Minako Matsuyama